Patents by Inventor Jin Chul Park

Jin Chul Park has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250092998
    Abstract: A system for supplying liquefied hydrogen includes: liquefied hydrogen storage tanks each comprising a temperature control unit controlling an internal temperature of the liquefied hydrogen storage tank to maintain an inside of the liquefied hydrogen storage tank at a low pressure; pressure tanks receiving and storing liquefied hydrogen to be supplied to a liquefied hydrogen demand site from the liquefied hydrogen storage tanks, the pressure tanks having a smaller capacity than the liquefied hydrogen storage tanks and maintained at a higher pressure than the liquefied hydrogen storage tanks; a liquefied hydrogen supply line through which liquefied hydrogen is transferred from the pressure tanks to the liquefied hydrogen demand site; and a compressor compressing boil-off hydrogen gas generated in the liquefied hydrogen storage tanks and supplying the compressed boil-off hydrogen gas to the pressure tanks to generate a pressure required for delivery.
    Type: Application
    Filed: August 11, 2022
    Publication date: March 20, 2025
    Inventors: Jong Yeol Yi, Yong Seong Jeon, Jae Hyun Ma, Ji Hoon Joung, Hae Chul Han, Eun Young Yun, Jin Yeong PARK
  • Patent number: 12251195
    Abstract: A core body temperature measurement device includes a body and an operation unit. The body is fixed to an ear canal of user. The operation unit is combined with a front side of the body, and is configured to be exposed to the ear canal or to be concealed inside, and has a sensor part. the sensor part measures a core body temperature of user when the operation unit is exposed to the ear canal.
    Type: Grant
    Filed: November 27, 2018
    Date of Patent: March 18, 2025
    Assignee: OSONG MEDICAL INNOVATION FOUNDATION
    Inventors: Jin Woo Ahn, Young Hoon Roh, Ha Chul Jung, Young Jin Kim, Kang Moo Lee, Seung A Lee, Da Hye Kwon, Ha Na Park, A Hee Kim, Song Woo Yoon, Won Jung Choi
  • Patent number: 12245389
    Abstract: A display apparatus including a display and a supporter. The supporter being mounted on the display and configured to support the display and rotate the display module between a first position and a second position. The supporter including a drive motor, a first gear, and a detection sensor. The drive motor configured to supply a driving force to rotate the display. The first gear configured to rotate together with the display by receiving the driving force from the drive motor. The detection sensor configured to detect a rotation amount of a second gear configured to rotate in with the first gear.
    Type: Grant
    Filed: January 19, 2024
    Date of Patent: March 4, 2025
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Hyun Yong Choi, Young Chul Kim, Ji Su Kim, Hun Sung Kim, Sung Yong Park, Jin Soo Shin, Dae Sik Yoon, Yong Yeon Hwang
  • Publication number: 20250071294
    Abstract: The present invention relates to an image encoding and decoding technique, and more particularly, to an image encoder and decoder using unidirectional prediction. The image encoder includes a dividing unit to divide a macro block into a plurality of sub-blocks, a unidirectional application determining unit to determine whether an identical prediction mode is applied to each of the plurality of sub-blocks, and a prediction mode determining unit to determine a prediction mode with respect to each of the plurality of sub-blocks based on a determined result of the unidirectional application determining unit.
    Type: Application
    Filed: November 14, 2024
    Publication date: February 27, 2025
    Applicants: Electronics and Telecommunications Research Institute, Kwangwoon University Industry-Academic Collaboration Foundation, University-Industry Cooperation Group of Kyung Hee University
    Inventors: Hae Chul CHOI, Se Yoon JEONG, Sung-Chang LIM, Jin Soo CHOI, Jin Woo HONG, Dong Gyu SIM, Seoung-Jun OH, Chang-Beom AHN, Gwang Hoon PARK, Seung Ryong KOOK, Sea-Nae PARK, Kwang-Su JEONG
  • Publication number: 20250072019
    Abstract: Disclosed herein are a Schottky barrier diode (SBD) and a method of manufacturing the same. The SBD includes a substrate, an ohmic layer formed on a portion of an upper portion of the substrate, a Schottky layer formed on a portion of an upper portion of the ohmic layer, an insulating layer formed on a portion of the upper portion of the ohmic layer, a low-k material layer formed on a portion of the upper portion of the substrate, and a Schottky metal layer formed on portions of upper portions of the low-k material layer and the insulating layer.
    Type: Application
    Filed: July 11, 2024
    Publication date: February 27, 2025
    Inventors: Jun Hwan SHIN, Young Ho Kim, Eui Su Lee, Jin Chul Cho, Soo Cheol Kang, Dong Woo Park, II Min Lee
  • Publication number: 20250065996
    Abstract: A method of calculating a collision risk of a ship according to an embodiment of the present disclosure may include: calculating an available velocity area based on maneuvering performance of a host ship; calculating a velocity obstacle area where there is a possibility of collision between an object and the host ship; and calculating a collision risk based on at least one of the available velocity area, the velocity obstacle area, and a preset weight.
    Type: Application
    Filed: October 30, 2024
    Publication date: February 27, 2025
    Inventors: Kwang Sung KO, In Beom KIM, Jin Mo PARK, Hui Yong CHOI, Hu Jae CHOI, Su Rim KIM, Gwang Hyeok CHOI, Do Yeop LEE, Do Yeon JUNG, Jin Young OH, Je Hyun CHA, Ji Yoon PARK, Won Chul YOO
  • Patent number: 11703232
    Abstract: A heating panel includes a lower panel mounted on the floor and an upper panel serving as a cover of the lower panel. The lower panel includes: a plurality of first guides protruding upward from the bottom surface to guide installation of a heating hose; and a first air passage formed as a groove on the bottom surface and the surface of the first guide, and further includes a plurality of second guides protruding upward from the bottom surface, having the first air passage on the surface thereof, and disposed between the plurality of first guides to guide installation of the heating hose. The upper panel is coupled to the lower panel and includes: a second air passage formed on the bottom surface in a groove form; and a second fastening member coupled with the first fastening member.
    Type: Grant
    Filed: May 25, 2022
    Date of Patent: July 18, 2023
    Assignee: HOYAHOMETECH CO., LTD
    Inventors: Soo-hwan Kwak, Jin-chul Park, Hae-sung Hwang
  • Publication number: 20220357052
    Abstract: A heating panel includes a lower panel mounted on the floor and an upper panel serving as a cover of the lower panel. The lower panel includes: a plurality of first guides protruding upward from the bottom surface to guide installation of a heating hose; and a first air passage formed as a groove on the bottom surface and the surface of the first guide, and further includes a plurality of second guides protruding upward from the bottom surface, having the first air passage on the surface thereof, and disposed between the plurality of first guides to guide installation of the heating hose. The upper panel is coupled to the lower panel and includes: a second air passage formed on the bottom surface in a groove form; and a second fastening member coupled with the first fastening member.
    Type: Application
    Filed: May 25, 2022
    Publication date: November 10, 2022
    Inventors: Soo-hwan KWAK, Jin-chul PARK, Hae-sung HWANG
  • Patent number: 10910224
    Abstract: A method for fabricating a semiconductor device includes: forming a gate trench in a semiconductor substrate; forming a gate dielectric layer over a bottom surface and sidewalls of the gate trench; forming a first work function layer over the gate dielectric layer; doping a work function adjustment element to form a second work function layer which overlaps with the sidewalls of the gate trench; forming a gate conductive layer that partially fills the gate trench; and forming doped regions inside the semiconductor substrate on both sides of the gate trench.
    Type: Grant
    Filed: September 14, 2020
    Date of Patent: February 2, 2021
    Assignee: SK hynix Inc.
    Inventors: Tae-Su Jang, Jin-Chul Park, Ji-Hwan Park, Il-Sik Jang, Seong-Wan Ryu, Se-In Kwon, Jung-Ho Shin, Dae-Jin Ham
  • Publication number: 20200411323
    Abstract: A method for fabricating a semiconductor device includes: forming a gate trench in a semiconductor substrate; forming a gate dielectric layer over a bottom surface and sidewalls of the gate trench; forming a first work function layer over the gate dielectric layer; doping a work function adjustment element to form a second work function layer which overlaps with the sidewalls of the gate trench; forming a gate conductive layer that partially fills the gate trench; and forming doped regions inside the semiconductor substrate on both sides of the gate trench.
    Type: Application
    Filed: September 14, 2020
    Publication date: December 31, 2020
    Inventors: Tae-Su JANG, Jin-Chul PARK, Ji-Hwan PARK, Il-Sik JANG, Seong-Wan RYU, Se-In KWON, Jung-Ho SHIN, Dae-Jin HAM
  • Patent number: 10811260
    Abstract: A method for fabricating a semiconductor device includes: forming a gate trench in a semiconductor substrate; forming a gate dielectric layer over a bottom surface and sidewalls of the gate trench; forming a first work function layer over the gate dielectric layer; doping a work function adjustment element to form a second work function layer which overlaps with the sidewalls of the gate trench; forming a gate conductive layer that partially fills the gate trench; and forming doped regions inside the semiconductor substrate on both sides of the gate trench.
    Type: Grant
    Filed: April 12, 2019
    Date of Patent: October 20, 2020
    Assignee: SK hynix Inc.
    Inventors: Tae-Su Jang, Jin-Chul Park, Ji-Hwan Park, Il-Sik Jang, Seong-Wan Ryu, Se-In Kwon, Jung-Ho Shin, Dae-Jin Ham
  • Publication number: 20190244820
    Abstract: A method for fabricating a semiconductor device includes: forming a gate trench in a semiconductor substrate; forming a gate dielectric layer over a bottom surface and sidewalls of the gate trench; forming a first work function layer over the gate dielectric layer; doping a work function adjustment element to form a second work function layer which overlaps with the sidewalls of the gate trench; forming a gate conductive layer that partially fills the gate trench; and forming doped regions inside the semiconductor substrate on both sides of the gate trench.
    Type: Application
    Filed: April 12, 2019
    Publication date: August 8, 2019
    Inventors: Tae-Su JANG, Jin-Chul PARK, Ji-Hwan PARK, Il-Sik JANG, Seong-Wan RYU, Se-In KWON, Jung-Ho SHIN, Dae-Jin HAM
  • Patent number: 10347576
    Abstract: A semiconductor package includes a package substrate, the package substrate including a conductive plate, an insulating plate on the conductive plate, the insulating plate including a mounting region and a peripheral region surrounding the mounting region, and at least one capillary channel in the peripheral region, a semiconductor chip on the mounting region of the insulating plate, and a molding member on the insulating plate to cover the semiconductor chip, a portion of the molding member being in the at least one capillary channel.
    Type: Grant
    Filed: September 20, 2017
    Date of Patent: July 9, 2019
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Kwang-Won Choi, Sang-Woo Pae, Seong-Won Jeong, Min-Jae Kwon, Da-Hye Min, Jin-Chul Park, Jae-Won Chang
  • Patent number: 10304684
    Abstract: A method for fabricating a semiconductor device includes: forming a gate trench in a semiconductor substrate; forming a gate dielectric layer over a bottom surface and sidewalls of the gate trench; forming a first work function layer over the gate dielectric layer; doping a work function adjustment element to form a second work function layer which overlaps with the sidewalls of the gate trench; forming a gate conductive layer that partially fills the gate trench; and forming doped regions inside the semiconductor substrate on both sides of the gate trench.
    Type: Grant
    Filed: September 25, 2017
    Date of Patent: May 28, 2019
    Assignee: SK hynix Inc.
    Inventors: Tae-Su Jang, Jin-Chul Park, Ji-Hwan Park, Il-Sik Jang, Seong-Wan Ryu, Se-In Kwon, Jung-Ho Shin, Dae-Jin Ham
  • Publication number: 20180174845
    Abstract: A method for fabricating a semiconductor device includes: forming a gate trench in a semiconductor substrate; forming a gate dielectric layer over a bottom surface and sidewalls of the gate trench; forming a first work function layer over the gate dielectric layer; doping a work function adjustment element to form a second work function layer which overlaps with the sidewalls of the gate trench; forming a gate conductive layer that partially fills the gate trench; and forming doped regions inside the semiconductor substrate on both sides of the gate trench.
    Type: Application
    Filed: September 25, 2017
    Publication date: June 21, 2018
    Inventors: Tae-Su JANG, Jin-Chul PARK, Ji-Hwan PARK, Il-Sik JANG, Seong-Wan RYU, Se-In KWON, Jung-Ho SHIN, Dae-Jin HAM
  • Publication number: 20180090430
    Abstract: A semiconductor package includes a package substrate, the package substrate including a conductive plate, an insulating plate on the conductive plate, the insulating plate including a mounting region and a peripheral region surrounding the mounting region, and at least one capillary channel in the peripheral region, a semiconductor chip on the mounting region of the insulating plate, and a molding member on the insulating plate to cover the semiconductor chip, a portion of the molding member being in the at least one capillary channel.
    Type: Application
    Filed: September 20, 2017
    Publication date: March 29, 2018
    Inventors: Kwang-Won CHOI, Sang-Woo PAE, Seong-Won JEONG, Min-Jae KWON, Da-Hye MIN, Jin-Chul PARK, Jae-Won CHANG
  • Patent number: 9573468
    Abstract: The disclosure is related to an audio/video processing apparatus for a car such as a car audio system, which allows various applications installed at a mobile communication device of a user (for example, a smart phone, a tablet PC or the like) to be implemented using car equipment, by executing or implementing various applications installed at a mobile communication device through a car audio/video control module or an application for a car (App-C) installed at the car.
    Type: Grant
    Filed: March 26, 2014
    Date of Patent: February 21, 2017
    Assignee: GM Global Technology Operations LLC
    Inventors: Jin Chul Park, Jong Uk Park, Sang Hoon Park
  • Publication number: 20140297064
    Abstract: The disclosure is related to an audio/video processing apparatus for a car such as a car audio system, which allows various applications installed at a mobile communication device of a user (for example, a smart phone, a tablet PC or the like) to be implemented using car equipment, by executing or implementing various applications installed at a mobile communication device through a car audio/video control module or an application for a car (App-C) installed at the car.
    Type: Application
    Filed: March 26, 2014
    Publication date: October 2, 2014
    Applicant: GM Global Technology Operations LLC
    Inventors: Jin Chul Park, Jong Uk Park, Sang Hoon Park
  • Patent number: 8779508
    Abstract: A semiconductor device includes a semiconductor substrate with a cell region, a second pad region, and a first pad region between the second pad region and the cell region, a first buried gate buried in a trench of the semiconductor substrate, and extended from the cell region to the second pad region, and a second buried gate buried in the trench of the semiconductor substrate, disposed over and spaced apart from an upper part of the first buried gate, and extended from the cell region to the first pad region.
    Type: Grant
    Filed: December 18, 2012
    Date of Patent: July 15, 2014
    Assignee: SK Hynix Inc.
    Inventor: Jin Chul Park
  • Publication number: 20140054689
    Abstract: A semiconductor device includes a semiconductor substrate with a cell region, a second pad region, and a first pad region between the second pad region and the cell region, a first buried gate buried in a trench of the semiconductor substrate, and extended from the cell region to the second pad region, and a second buried gate buried in the trench of the semiconductor substrate, disposed over and spaced apart from an upper part of the first buried gate, and extended from the cell region to the first pad region.
    Type: Application
    Filed: December 18, 2012
    Publication date: February 27, 2014
    Applicant: SK HYNIX INC.
    Inventor: Jin Chul PARK