Abstract: Methods, systems, and devices for wireless communications are described. A transmitting device may perform a first transmission to one or more receiving devices, the first transmission associated with a transmission type. The transmitting device may determine a feedback response for the first transmission based on monitoring for feedback messages from the one or more receiving devices in response to the first transmission. The transmitting device may select a contention window size for performing one or more subsequent transmissions based at least in part on the feedback response and the transmission type. The transmitting device may perform the one or more subsequent transmissions in accordance with a clear channel assessment procedure using the selected contention window size.

Abstract: Provided are a response receiving and sending method, a retransmission method, a communication device, and a storage medium. The method includes: sending a transport block to a first communication device through a pre-configured period resource, and receiving a correct response corresponding to the transport block on a pre-configured correct response resource.

Abstract: Various aspects of the present disclosure generally relate to wireless communication. In some aspects, a first user equipment (UE) may transmit, to a set of second UEs, information indicating a duplexing pattern of the first UE, wherein the duplexing pattern indicates one or more reception intervals of the first UE and one or more transmission intervals of the first UE. The UE may communicate in accordance with the duplexing pattern. Numerous other aspects are described.

Abstract: Various aspects of the present disclosure generally relate to wireless communication. In some aspects, a user equipment (UE) may transmit, to another UE, a sidelink channel state information reference signal (S-CSI-RS) and an indication associated with triggering a non-codebook based precoded S-CSI-RS. The UE may receive, from the other UE, the non-codebook based precoded S-CSI-RS. The UE may transmit, to the other UE, a non-codebook based channel state information (CSI) report medium access control (MAC) control element (MAC-CE) that includes an indication of one or more selected precoding beams based at least in part on the non-codebook based precoded S-CSI-RS. Numerous other aspects are described.

Abstract: Aspects of the present disclosure include methods, apparatuses, and computer readable media for configuring, in a slot, a first code block group (CBG) occupying one or more first frequency resources, a second CBG occupying one or more second frequency resources different from the one or more first frequency resources, and sidelink control information (SCI) indicating the first CBG is frequency divisional multiplexed with the second CBG, and transmitting the first CBG, the second CBG, and the SCI via a physical sidelink shared channel (PSSCH) to a second UE.

Abstract: Disclosed herein is a material suitable for the adsorption, storage and release of volatile organic compounds comprising: a porous thin film layer formed from nanosheets of one or more MXenes.

Abstract: The present application relates to metal cutting, and more particularly to a cutting fluid and a preparation method and an application thereof, especially the application in the processing of niobium-tungsten alloy (NB521). The preparation method of the cutting fluid is simple and requires low production cost. In the mechanical processing of niobium-tungsten alloy (NB521), the cutting fluid has good cooling performance, lubricity, load-bearing capacity, friction reduction and vibration absorption, and long service life. It also can effectively avoid built-up edges, thereby improving the service life of cutting tools and the processibility of materials. Therefore, products of good quality are produced to improve the yield, especially in the deep hole machining, and thus the cutting fluid of the present application is suitable for a wide range of applications.

Abstract: A stored procedure call may be transmitted to a database to execute a database query. As a result of the stored procedure call, results including a result record satisfying the database query and a set of records related to the result record may be received. The results may be stored in a local cache.

Abstract: The present application relates to metal cutting, and more particularly to a cutting fluid and a preparation method and an application thereof, especially the application in the processing of niobium-tungsten alloy (NB521). The preparation method of the cutting fluid is simple and requires low production cost. In the mechanical processing of niobium-tungsten alloy (NB521), the cutting fluid has good cooling performance, lubricity, load-bearing capacity, friction reduction and vibration absorption, and long service life. It also can effectively avoid built-up edges, thereby improving the service life of cutting tools and the processibility of materials. Therefore, products of good quality are produced to improve the yield, especially in the deep hole machining, and thus the cutting fluid of the present application is suitable for a wide range of applications.

Abstract: The present disclosure relates to a display substrate comprising a substrate; a data line disposed over the substrate; a first insulating layer disposed on the data line; a second insulating layer disposed on the first insulating layer; a first transparent electrode disposed on the second insulating layer. The present disclosure further relates to a manufacturing method of a display substrate and a display device.

Abstract: An alignment method and an alignment system are provided. The alignment method includes: providing a wafer including an exposed surface, wherein an alignment mark and a reference point with a reference distance are provided on the exposed surface; placing the wafer on a reference plane; performing an alignment measurement on the exposed surface to obtain a projection distance, configured as a measurement distance, between the alignment mark and the reference point on the reference plane; performing a levelling measurement between the exposed surface and the reference plane to obtain levelling data of the exposed surface; obtaining a distance, configured as an expansion reference value, between the alignment mark and the reference point in the exposed surface; obtaining an expansion compensation value based on a difference between the expansion reference value and the reference distance; and adjusting parameters of a photolithography process based on the expansion compensation value for an alignment.

Abstract: The present disclosure relates to a display substrate comprising a substrate; a data line disposed over the substrate; a first insulating layer disposed on the data line; a second insulating layer disposed on the first insulating layer; a first transparent electrode disposed on the second insulating layer. The present disclosure further relates to a manufacturing method of a display substrate and a display device.

Abstract: An alignment method and an alignment system are provided. The alignment method includes: providing a wafer including an exposed surface, wherein an alignment mark and a reference point with a reference distance are provided on the exposed surface; placing the wafer on a reference plane; performing an alignment measurement on the exposed surface to obtain a projection distance, configured as a measurement distance, between the alignment mark and the reference point on the reference plane; performing a levelling measurement between the exposed surface and the reference plane to obtain levelling data of the exposed surface; obtaining a distance, configured as an expansion reference value, between the alignment mark and the reference point in the exposed surface; obtaining an expansion compensation value based on a difference between the expansion reference value and the reference distance; and adjusting parameters of a photolithography process based on the expansion compensation value for an alignment.

Abstract: Polymers produced by ring opening polymerization which comprises an amino group that can be used in compositions to deliver a nucleic acid such as a miRNA or a siRNA. In some embodiments, compositions which comprise the polymers described herein and a nucleic acid are also provided herein. In some embodiments, these compositions are used to silence one or more genes in vivo or treat a disease or disorder.

Abstract: In some embodiments, an interconnection structure, an exposure alignment system, and a fabricating method thereof are provided. The method comprises: providing a wafer, forming a first to-be-connected member and multiple first alignment members in a first conductive layer; form a first opening and multiple second alignment members in a first mask layer, the first opening is used to define a position of a second to-be-connected member; based on reference and measurement coordinates of the first alignment members, and reference coordinates and measurement coordinates of the second alignment members, obtaining wafer coordinates for characterizing a position deviation of the wafer; obtaining adjustment compensation values according to stacking offsets of a preceding wafer; adjusting a position of the wafer; forming the interconnection structure in a first dielectric layer and a second dielectric layer to electrically interconnect the first to-be-connected member and the second to-be-connected member.

Abstract: In some embodiments, an interconnection structure, an exposure alignment system, and a fabricating method thereof are provided. The method comprises: providing a wafer, forming a first to-be-connected member and multiple first alignment members in a first conductive layer; form a first opening and multiple second alignment members in a first mask layer, the first opening is used to define a position of a second to-be-connected member; based on reference and measurement coordinates of the first alignment members, and reference coordinates and measurement coordinates of the second alignment members, obtaining wafer coordinates for characterizing a position deviation of the wafer; obtaining adjustment compensation values according to stacking offsets of a preceding wafer; adjusting a position of the wafer; forming the interconnection structure in a first dielectric layer and a second dielectric layer to electrically interconnect the first to-be-connected member and the second to-be-connected member.

Abstract: Polymers produced by ring opening polymerization which comprises an amino group that can be used in compositions to deliver a nucleic acid such as a miRNA or a siRNA. In some embodiments, compositions which comprise the polymers described herein and a nucleic acid are also provided herein. In some embodiments, these compositions are used to silence one or more genes in vivo or treat a disease or disorder.

Abstract: An exposure apparatus is provided for performing a column scan-exposure process. The exposure apparatus includes a base for supporting the exposure apparatus; and a reticle stage configured for holding a reticle having at two mask pattern regions and carrying the reticle to move reciprocally along a scanning direction. The exposure apparatus also includes a wafer stage configured for holding a wafer and carrying the wafer to move reciprocally along the scanning direction. Further, the exposure apparatus includes a control unit configured to control the reticle stage and the wafer stage to cooperatively move to cause the at least two mask pattern regions of the reticle on the reticle stage to be continuously and sequentially projected on at least two corresponding exposure shots of the wafer on the wafer stage along the scanning direction to perform a column scan-exposure process.

Abstract: A stored procedure call may be transmitted to a database to execute a database query. As a result of the stored procedure call, results including a result record satisfying the database query and a set of records related to the result record may be received. The results may be stored in a local cache.

Abstract: Polymers produced by ring opening polymerization which comprises an amino group that can be used in compositions to deliver a nucleic acid such as a miRNA or a siRNA. In some embodiments, compositions which comprise the polymers described herein and a nucleic acid are also provided herein. In some embodiments, these compositions are used to silence one or more genes in vivo or treat a disease or disorder.