Patents by Inventor Jing Kong
Jing Kong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12203899Abstract: A sample mounting device for direct tensile test of rock mass is provided, which includes a first positioning stage, a second positioning stage, a first support piece, a second support piece, and a screw drive mechanism. The second positioning stage is arranged above the first positioning stage and capable of moving up and down, and cushion blocks for gluing with the rock mass are coaxially and detachably arranged at opposite ends of the first positioning stage and the second positioning stage, and a rock mass mounting area is formed between the two cushion blocks. A screw of the screw drive mechanism includes a first thread segment and a second thread segment with opposite thread directions. The first support piece is connected with the first thread segment through a nut seat, and the second support piece is connected with the second thread segment through a nut seat.Type: GrantFiled: August 28, 2024Date of Patent: January 21, 2025Assignees: INSTITUTE OF GEOLOGY AND GEOPHYSICS, CAS, Yunnan Dianzhong Water Diversion Engineering Co.Inventors: Ning Liang, Jing Xu, Shufang Li, Tao Wang, Shengwen Qi, Jianing Cong, Bowen Zheng, Songfeng Guo, Xin Wang, Lina Ma, Shuaihua Song, Yongchao Li, Yu Zou, Xiaokun Hou, Zan Wang, Weiwei Zhu, Chao Jin, Tianming Huang, Yanlong Kong, Yuran Zhang
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Patent number: 11935938Abstract: Devices, such as transistors, that use bismuth to create ohmic contacts are provided, as are methods of manufacturing the same. The transistors, such as field-effect transistors, can include one or more two-dimensional materials, and electrical contact areas can be created on the two-dimensional material(s) using bismuth. The bismuth can help to provide energy-barrier free, ohmic contacts, and the resulting devices can have performance levels that rival or exceed state-of-the-art devices that utilize three-dimensional materials, like silicon. The two-dimensional materials can include transition metal dichalcogenides, such as molybdenum disulfide.Type: GrantFiled: May 13, 2021Date of Patent: March 19, 2024Assignee: Massachusetts Institute of TechnologyInventors: Pin-Chun Shen, Jing Kong
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Publication number: 20230249974Abstract: Atomically thin layers including pores, their method of manufacture, and their use are disclosed. In some embodiments, pores may be formed in an atomically thin layer by growing the atomically thin layer on exposed portions of a substrate that includes islands comprising a material that is different than the material of the substrate. In some embodiments, pores and/or defects may be formed in an atomically thin layer by employing growth conditions that promote the formation of defects and/or pores. In certain embodiments, pores and/or defects may be etched to enlarge their size.Type: ApplicationFiled: November 3, 2022Publication date: August 10, 2023Applicants: Massachusetts Institute of Technology, King Fahd University of Petroleum & MineralsInventors: Piran Kidambi, Ahmed Ibrahim, Tahar Laoui, Jing Kong, Rohit N Karnik, Sui Zhang
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Patent number: 11524898Abstract: Atomically thin layers including pores, their method of manufacture, and their use are disclosed. In some embodiments, pores may be formed in an atomically thin layer by growing the atomically thin layer on exposed portions of a substrate that includes islands comprising a material that is different than the material of the substrate. In some embodiments, pores and/or defects may be formed in an atomically thin layer by employing growth conditions that promote the formation of defects and/or pores. In certain embodiments, pores and/or defects may be etched to enlarge their size.Type: GrantFiled: November 3, 2017Date of Patent: December 13, 2022Assignees: Massachusetts Institute of Technology, King Fahd University of Petroleum & MineralsInventors: Piran Kidambi, Ahmed Ibrahim, Tahar Laoui, Jing Kong, Rohit N. Karnik, Sui Zhang
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Publication number: 20210359099Abstract: Devices, such as transistors, that use bismuth to create ohmic contacts are provided, as are methods of manufacturing the same. The transistors, such as field-effect transistors, can include one or more two-dimensional materials, and electrical contact areas can be created on the two-dimensional material(s) using bismuth. The bismuth can help to provide energy-barrier free, ohmic contacts, and the resulting devices can have performance levels that rival or exceed state-of-the-art devices that utilize three-dimensional materials, like silicon. The two-dimensional materials can include transition metal dichalcogenides, such as molybdenum disulfide.Type: ApplicationFiled: May 13, 2021Publication date: November 18, 2021Inventors: Pin-Chun Shen, Jing Kong
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Patent number: 11060186Abstract: In a method provided herein for forming a chalcogenide film on a substrate, an elemental solid is exposed to a hydrogen halide gas in a heated reaction environment at a temperature at which the hydrogen halide gas promotes the elemental solid to evolve into an elemental halide-based gas. The elemental halide-based gas is then exposed to a chalcogen gas provided in the heated reaction environment, at a temperature at which the elemental halide-based gas is reactive with the chalcogen gas to produce a solid chalcogenide reaction product. A substrate is provided in the heated reaction environment for deposition thereon of a solid film of the solid chalcogenide reaction product that results from exposure of the elemental halide-based gas to the chalcogen gas in the heated reaction environment.Type: GrantFiled: April 12, 2019Date of Patent: July 13, 2021Assignee: Massachusetts Institute of TechnologyInventors: Jing Kong, Qingqing Ji, Zhenfei Gao
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Publication number: 20210187161Abstract: The present invention provides a device or medical device comprising a graphene coating. Particularly, the graphene coating features substantially high transmittance, biointegrity and biocompatibility.Type: ApplicationFiled: April 13, 2017Publication date: June 24, 2021Applicants: Massachusetts Eye and Ear Infirmary, Massachusetts Institute of TechnologyInventors: Miguel Gonzalez ANDRADES, Paraskevi Evi KOLOVOU, Mahomed Mehdi GOULAMALY, Jing KONG, Tian MING
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Patent number: 10988842Abstract: A two-dimensional transition-metal dichalcogenide layer is grown by reacting a non- or low-volatile source material with a volatilized halogen or halide compound to produce a volatilized composition comprising at least one reaction product. The volatilized composition is flowed through an open chamber of a tube furnace with a temperature gradient, wherein the temperature changes along a path through which the volatilized composition flows through the open chamber of the tube furnace. Where the temperature along the path in the open chamber is in a reaction-temperature range, the volatilized composition is deposited as a two-dimensional crystalline transition-metal dichalcogenide layer.Type: GrantFiled: April 17, 2018Date of Patent: April 27, 2021Assignee: Massachusetts Institute of TechnologyInventors: Brian J. Modtland, Jing Kong, Marc A. Baldo, Efren Navarro-Moratalla, Xiang Ji
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Patent number: 10914637Abstract: A thermo-mechanical bolometer includes a substrate and a sensing component mounted on the substrate. The sensing element comprises (a) at least one thermal-actuation component mounted in parallel with the substrate and (b) a strain sensor mounted on the at least one layer of thermal-actuation component. The at least one thermal-actuation component alone or in combination (a) absorbs electromagnetic waves and converts energy from absorbed electromagnetic waves into a change in temperature and (b) converts the change in temperature into a deformation of the at least one layer. The strain sensor comprises a layer of fragments with a gap space between the fragments, wherein the strain sensor senses the deformation or mechanical movement and exhibits a change in electrical resistance in response to the sensed deformation or mechanical movement.Type: GrantFiled: June 23, 2019Date of Patent: February 9, 2021Assignee: Massachusetts Institute of TechnologyInventors: Yuxuan Lin, Xiang Ji, Tomas Palacios, Jing Kong
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Publication number: 20200062600Abstract: Atomically thin layers including pores, their method of manufacture, and their use are disclosed. In some embodiments, pores may be formed in an atomically thin layer by growing the atomically thin layer on exposed portions of a substrate that includes islands comprising a material that is different than the material of the substrate. In some embodiments, pores and/or defects may be formed in an atomically thin layer by employing growth conditions that promote the formation of defects and/or pores. In certain embodiments, pores and/or defects may be etched to enlarge their size.Type: ApplicationFiled: November 3, 2017Publication date: February 27, 2020Applicants: Massachusetts Institute of Technology, King Fahd University of Petroleum & MineralsInventors: Piran Kidambi, Ahmed Ibrahim, Tahar Laoui, Jing Kong, Rohit N. Karnik, Sui Zhang
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Publication number: 20190390950Abstract: A thermo-mechanical bolometer includes a substrate and a sensing component mounted on the substrate. The sensing element comprises (a) at least one thermal-actuation component mounted in parallel with the substrate and (b) a strain sensor mounted on the at least one layer of thermal-actuation component. The at least one thermal-actuation component alone or in combination (a) absorbs electromagnetic waves and converts energy from absorbed electromagnetic waves into a change in temperature and (b) converts the change in temperature into a deformation of the at least one layer. The strain sensor comprises a layer of fragments with a gap space between the fragments, wherein the strain sensor senses the deformation or mechanical movement and exhibits a change in electrical resistance in response to the sensed deformation or mechanical movement.Type: ApplicationFiled: June 23, 2019Publication date: December 26, 2019Applicant: Massachusetts Institute of TechnologyInventors: Yuxuan Lin, Xiang Ji, Tomas Palacios, Jing Kong
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Publication number: 20190338416Abstract: In a method provided herein for forming a chalcogenide film on a substrate, an elemental solid is exposed to a hydrogen halide gas in a heated reaction environment at a temperature at which the hydrogen halide gas promotes the elemental solid to evolve into an elemental halide-based gas. The elemental halide-based gas is then exposed to a chalcogen gas provided in the heated reaction environment, at a temperature at which the elemental halide-based gas is reactive with the chalcogen gas to produce a solid chalcogenide reaction product. A substrate is provided in the heated reaction environment for deposition thereon of a solid film of the solid chalcogenide reaction product that results from exposure of the elemental halide-based gas to the chalcogen gas in the heated reaction environment.Type: ApplicationFiled: April 12, 2019Publication date: November 7, 2019Applicant: Massachusetts Institute of TechnologyInventors: Jing Kong, Qingqing Ji, Zhenfei Gao
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Publication number: 20190330735Abstract: A two-dimensional transition-metal dichalcogenide layer is grown by reacting a non- or low-volatile source material with a volatilized halogen or halide compound to produce a volatilized composition comprising at least one reaction product. The volatilized composition is flowed through an open chamber of a tube furnace with a temperature gradient, wherein the temperature changes along a path through which the volatilized composition flows through the open chamber of the tube furnace. Where the temperature along the path in the open chamber is in a reaction-temperature range, the volatilized composition is deposited as a two-dimensional crystalline transition-metal dichalcogenide layer.Type: ApplicationFiled: April 17, 2018Publication date: October 31, 2019Applicant: Massachusetts Institute of TechnologyInventors: Brian J. Modtland, Jing Kong, Marc A. Baldo, Efren Navarro-Moratalla, Xiang Ji
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Patent number: 10246637Abstract: A method for preparing a core-shell nanocrystal can include mixing an M-containing precursor solution, an X-containing precursor solution, and an acid or alcohol in an inert atmosphere at a first temperature to form a reaction mixture; maintaining the reaction mixture at the first temperature to grow the MX core of the nanocrystal; raising the temperature of the reaction mixture to a second temperature; and maintaining the reaction mixture at the second temperature to grow a shell of the nanocrystal.Type: GrantFiled: May 7, 2016Date of Patent: April 2, 2019Assignee: Massachusetts Institute of TechnologyInventors: Zhengtao Deng, Tian Ming, He Dong, Aishuang Xiang, Jing Kong
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Patent number: 10109752Abstract: A transparent electrode can include a graphene sheet on a substrate, a layer including a conductive polymer disposed over the graphene sheet, and a plurality of semiconducting nanowires, such as ZnO nanowires, disposed over the layer including the conductive polymer.Type: GrantFiled: November 26, 2013Date of Patent: October 23, 2018Assignee: MASSACHUSETTS INSTITUTE OF TECHNOLOGYInventors: Hyesung Park, Sehoon Chang, Jing Kong, Silvija Gradecak
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Patent number: 9833740Abstract: A process of removing SO2 from a flue gas with a trickling filter using modified ceramsite packing is described. The biological flue gas desulfurization process includes: feeding the flue gas containing sulfur dioxide through the column bottom into the biomembrane trickling filter at certain temperature, contacting with the modified ceramsite biomembrane packing and purifying, which purified flue gas is discharged via the column top; and spraying the nutrient fluid rich in high concentration of the desulfurization strain through the top to the modified ceramsite biomembrane packing, thereby the sulfur-bearing pollution source in the flue gas is degraded, so as to discharge a purified flue gas satisfying the environmental requirements.Type: GrantFiled: June 18, 2014Date of Patent: December 5, 2017Assignees: CHINA PETROLEUM & CHEMICAL CORPORATION, RESEARCH INSTITUTE OF NANJING CHEMICAL INDUSTRIAL GROUPInventors: Aixiang Hao, Songbai Mao, Jing Kong
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Publication number: 20170331069Abstract: A transfer stamp comprising a nano-film layer is formed on a substantially transparent polymeric substrate, wherein the substantially transparent polymeric substrate comprises an indirect adhesion layer adhered to the nano-film. The nano-film layer of the transfer stamp is applied to a surface of a target substrate; the nano-film layer is positioned between the indirect adhesion layer and the target substrate.Type: ApplicationFiled: May 12, 2017Publication date: November 16, 2017Applicant: Massachusetts Institute of TechnologyInventors: Yi Song, Jin-Yong Hong, Jing Kong
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Patent number: 9812525Abstract: A two-dimensional heterostructure is synthesized by producing a patterned first two-dimensional material on a growth substrate. The first two-dimensional material is patterned to define at least one void through which an exposed region of the growth substrate is exposed. Seed molecules are selectively deposited either on the exposed region of the growth substrate or on the patterned first two-dimensional material. A second two-dimensional material that is distinct from the first two-dimensional material is then grown from the deposited seed molecules.Type: GrantFiled: December 9, 2016Date of Patent: November 7, 2017Assignee: Massachusetts Institute of TechnologyInventors: Mildred S. Dresselhaus, Jing Kong, Tomas A. Palacios, Xi Ling, Yuxuan Lin
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Publication number: 20170217777Abstract: A two-dimensional film (such as graphene) is formed on a surface of a growth substrate. A first surface of the two-dimensional film adheres to the growth substrate, and a second surface of the two-dimensional film is then coated with a conforming carrier layer comprising ethylene vinyl acetate. The surface of the growth substrate is etched to release the two-dimensional film with the conforming carrier layer from the growth substrate, wherein the conforming carrier layer maintains the integrity of the two-dimensional film during and after its release from the growth substrate. The first surface of the two-dimensional film with the conforming carrier layer coating is then applied onto a target substrate to form a graphene coating on the target substrate. The conforming carrier layer is then removed from the two-dimensional film by exposing the conforming carrier layer to a solvent while the two-dimensional film is coating the target substrate.Type: ApplicationFiled: January 30, 2017Publication date: August 3, 2017Applicant: Massachusetts Institute of TechnologyInventors: Jin-Yong Hong, Jing Kong
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Publication number: 20170170260Abstract: A two-dimensional heterostructure is synthesized by producing a patterned first two-dimensional material on a growth substrate. The first two-dimensional material is patterned to define at least one void through which an exposed region of the growth substrate is exposed. Seed molecules are selectively deposited either on the exposed region of the growth substrate or on the patterned first two-dimensional material. A second two-dimensional material that is distinct from the first two-dimensional material is then grown from the deposited seed molecules.Type: ApplicationFiled: December 9, 2016Publication date: June 15, 2017Applicant: Massachusetts Institute of TechnologyInventors: Mildred S. Dresselhaus, Jing Kong, Tomas A. Palacios, Xi Ling, Yuxuan Lin