Patents by Inventor Jing Mei Li

Jing Mei Li has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240099920
    Abstract: A method for controlling a device for automatically adjusting an airway opening body position is provided. The device includes a horizontal base plate, a head support block, a back support plate, a neck support apparatus, a head cover assembly, and a programmable logic controller (PLC). The neck support apparatus is positioned between the head support block and the back support plate. The PLC is configured to controls a stroke of an electric cylinder according to the following equations: ?=1.235?+?, and ?=KX+B+C, where ? is a body position angle, the body position angle is an angle between a positive projection line of a connecting line from a mandibular angle to an external acoustic meatus on a symmetrical surface of a human body and the back support plate, and ? is a preset value ranging from 90° to 100°.
    Type: Application
    Filed: November 14, 2022
    Publication date: March 28, 2024
    Inventors: XIANG-MEI YANG, MIN-YUE SUN, HONG-MEI CHEN, YAN LUO, JUN WU, JUAN HUANG, DONG-MEI LI, QING ZENG, JING ZHOU, JING WEN, JIN-JIN GUO
  • Patent number: 8540703
    Abstract: Methods of treating a portion of skin are disclosed. A carbon lotion is applied to a portion of skin comprising one or more enlarged pores or one or more indicators of aging. The carbon lotion is allowed to remain on the portion of skin for a period of time, and, upon expiration of the period of time, excess carbon lotion is removed from the portion of skin. The portion of skin is irradiated with one or more first laser pulses and one or more second laser pulses. A laser producing the first and second laser pulses has an oscillation wavelength of 1064 nm.
    Type: Grant
    Filed: October 24, 2011
    Date of Patent: September 24, 2013
    Assignee: Lutronic Corporation
    Inventors: Hae Lyung Hwang, Sung Huan Gong, Jing Mei Li
  • Publication number: 20120041522
    Abstract: Methods of treating a portion of skin are disclosed. A carbon lotion is applied to a portion of skin comprising one or more enlarged pores or one or more indicators of aging. The carbon lotion is allowed to remain on the portion of skin for a period of time, and, upon expiration of the period of time, excess carbon lotion is removed from the portion of skin. The portion of skin is irradiated with one or more first laser pulses and one or more second laser pulses. A laser producing the first and second laser pulses has an oscillation wavelength of 1064 nm.
    Type: Application
    Filed: October 24, 2011
    Publication date: February 16, 2012
    Applicant: LUTRONIC CORPORATION
    Inventors: Hae Lyung Hwang, Sung Huan Gong, Jing Mei Li
  • Patent number: 8048064
    Abstract: Disclosed is a method of curing inflammatory acne by applying a carbon lotion onto a face covered with acne, irradiating the applied carbon lotion with a laser pulse having a pulse width of microsecond, and irradiating the applied carbon lotion with a laser pulse having a pulse width of nanosecond to sterilize acne bacilli and open skin pores clogged with sebum, thereby entirely treating the inflammatory acne. The method includes applying the carbon lotion onto epidermis to be cured and pores, irradiating the carbon lotion with a laser pulse to heat and burst the applied carbon lotion. With the method, the inflammatory acne is simply cured without scar.
    Type: Grant
    Filed: May 29, 2006
    Date of Patent: November 1, 2011
    Assignee: Lutronic Corporation
    Inventors: Hae Lyung Hwang, Sung Huan Gong, Jing Mei Li
  • Publication number: 20080319431
    Abstract: Disclosed is a method of curing inflammatory acne by applying a carbon lotion onto a face covered with acne, irradiating the applied carbon lotion with a laser pulse having a pulse width of microsecond, and irradiating the applied carbon lotion with a laser pulse having a pulse width of nanosecond to sterilize acne bacilli and open skin pores clogged with sebum, thereby entirely treating the inflammatory acne. The method includes applying the carbon lotion onto epidermis to be cured and pores, irradiating the carbon lotion with a laser pulse to heat and burst the applied carbon lotion. With the method, the inflammatory acne is simply cured without scar.
    Type: Application
    Filed: May 29, 2006
    Publication date: December 25, 2008
    Applicant: LUTRONIC CORPORATION
    Inventors: Hae Lyung Hwang, Sung Huan Gong, Jing Mei Li