Abstract: The present disclosure provides a display panel and a manufacturing method of the display panel, and a display apparatus, and belongs to the field of display technology. The display panel of the present disclosure includes a flexible substrate and a support substrate, wherein the support substrate supports the flexible substrate; a plurality of display units are provided on the flexible substrate; the display panel further includes: a first magnetic unit; a second magnetic unit; the first magnetic unit and the second magnetic unit are used for jointing the flexible substrate to the support substrate through a magnetic field therebetween.

Abstract: A touch panel, a manufacturing method thereof and a display device are provided. The touch panel includes a first touch electrode, a second touch electrode and a one-piece insulating element. The second touch electrode includes an electrode section disposed in a same layer as the first touch electrode and a connecting section under the electrode section. The electrode section includes a first electrode section and a second electrode section, which are electrically connected by the connecting section, and the connecting section is spaced apart from the first touch electrode. The insulating element includes a first insulating section between the connecting section and the first touch electrode and a second insulating section between the first electrode section and the first touch electrode and also between the second electrode section and the first touch electrode. The insulating sections can be obtained by performing a patterning process, so that the manufacturing method of the touch panel is simplified.

Abstract: Embodiments of the disclosure provide an array substrate and a manufacturing method thereof, and a display device. The method includes: forming a semiconductor material film, a first insulation material film and a first conductive material film successively on a base substrate, and processing these films through a single patterning process to form an active pattern, a gate insulation pattern and a gate electrode; forming a second insulation layer and forming two contact holes in the second insulation layer and gate insulation pattern; forming a second conductive material film and forming two contact structures from portions of this layer; and forming a third conductive material film, and processing this layer through a single patterning process to form a pixel electrode, and source and drain electrodes being in direct contact with the two contact structures respectively, the pixel electrode and one contact structure being integrated into one piece.

Abstract: Disclosed is a display substrate, which includes a base substrate and a polarization layer, wherein the polarization layer includes grid polarizer (GPs) and light-shielding matrixes arranged in a same layer and made from a same material. The display substrate simplifies the production process, reduces the cost and reduces the thickness of a liquid crystal display (LCD) device.

Abstract: The present disclosure provides an array substrate, its manufacturing method, and a display device. The method includes steps of forming a passivation layer on a base substrate, and forming a contact layer and a pixel electrode on the base substrate with the passivation layer through a single patterning process. The contact layer is made of an identical transparent conductive material to the pixel electrode.

Abstract: A dual-gate TFT array substrate and manufacturing method thereof and a display device are provided. The manufacturing method includes: forming a common electrode and a top-gate electrode through one patterning process. The manufacturing method reduces the times of patterning process and simplifies the process flow.

Abstract: Embodiments of the disclosure provide an array substrate and a manufacturing method thereof, and a display device. The method includes: forming a semiconductor material film, a first insulation material film and a first conductive material film successively on a base substrate, and processing these films through a single patterning process to form an active pattern, a gate insulation pattern and a gate electrode; forming a second insulation layer and forming two contact holes in the second insulation layer and gate insulation pattern; forming a second conductive material film and forming two contact structures from portions of this layer; and forming a third conductive material film, and processing this layer through a single patterning process to form a pixel electrode, and source and drain electrodes being in direct contact with the two contact structures respectively, the pixel electrode and one contact structure being integrated into one piece.

Abstract: The present invention has disclosed a touch screen, comprising: a substrate; at least one first electrode formed on the substrate; at least one second electrode formed on the substrate, the first electrode and the second electrode having different extending directions, and there being an intersecting area between a vertical projection of the first electrode on the substrate and a vertical projection of the second electrode on the substrate; and a first protection layer formed at least at the intersecting area between the first electrode and the second electrode; wherein, the substrate is provided with a groove at the intersecting area between the first electrode and the second electrode so as to at least receive therein a portion of the first electrode located within the intersecting area. The present invention has also disclosed a display device and a method for manufacturing the touch screen.

Abstract: The present invention provides an array substrate and a manufacturing method thereof and a display device. The manufacturing method comprises: forming a pattern including a pixel electrode and a source of a thin film transistor on a base substrate through a single patterning process, the pixel electrode is provided in a layer under a layer in which the source is located; forming a pattern including a drain, an active layer, a gate insulation layer and a gate of the thin film transistor through a single patterning process, the active layer covers the source and the drain, and is separated from the gate through the gate insulation layer; and forming a pattern including a passivation layer, a common electrode and a gate line through a single patterning process, the common electrode is a slit electrode and separated from the active layer and the pixel electrode through the passivation layer.

Abstract: The present disclosure provides an array substrate, its manufacturing method, and a display device. The method includes steps of forming a passivation layer on a base substrate, and forming a contact layer and a pixel electrode on the base substrate with the passivation layer through a single patterning process. The contact layer is made of an identical transparent conductive material to the pixel electrode.

Abstract: Disclosed is a display substrate, which includes a base substrate and a polarization layer, wherein the polarization layer includes grid polarizer (GPs) and light-shielding matrixes arranged in a same layer and made from a same material. The display substrate simplifies the production process, reduces the cost and reduces the thickness of a liquid crystal display (LCD) device.

Abstract: A dual-gate TFT array substrate and manufacturing method thereof and a display device are provided. The manufacturing method includes: forming a common electrode and a top-gate electrode through one patterning process. The manufacturing method reduces the times of patterning process and simplifies the process flow.

Abstract: A preparation method of a poly-silicon thin film transistor (TFT) array substrate and an array substrate thereof are provided. The preparation method includes: forming a photoresist layer on a poly-silicon layer, and exposing and developing the photoresist layer with a gray tone mask to form patterns of a photoresist completely-reserved region, a photoresist partially-reserved regions and a photoresist completely-removed region; removing part of the poly-silicon layer located in the photoresist completely-removed region, to form patterns of active layers; ashing the photoresist so as to expose part of the active layer located in the photoresist partially-reserved regions and inject P+ ions of high concentration into the part of the active layer, to form doping regions of patterns of source-drain electrodes of a P-type TFT; and stripping off remaining photoresist.

Abstract: A preparation method of a poly-silicon thin film transistor (TFT) array substrate and an array substrate thereof are provided. The preparation method includes: forming a photoresist layer on a poly-silicon layer, and exposing and developing the photoresist layer with a gray tone mask to form patterns of a photoresist completely-reserved region, a photoresist partially-reserved regions and a photoresist completely-removed region; removing part of the poly-silicon layer located in the photoresist completely-removed region, to form patterns of active layers; ashing the photoresist so as to expose part of the active layer located in the photoresist partially-reserved regions and inject P+ions of high concentration into the part of the active layer, to form doping regions of patterns of source-drain electrodes of a P-type TFT; and stripping off remaining photoresist.

Abstract: An array substrate and manufacturing method thereof and a display device. The display device includes a pixel electrode (8), including a first portion (b) in a non-display region and a second portion (a) in a display region; a first electrode (6) formed on the first portion (b) of the pixel electrode (8); a passivation layer (9) formed on the pixel electrode (8) and the first electrode (6), the passivation layer (9) includes a via hole (11) located over the first electrode (6); an active layer (4) and a second electrode (7) that are formed on the passivation layer (9), the active layer (4) being connected to the first electrode (6) through the via hole (11) of the passivation layer (9). With the array substrate and the manufacturing method thereof, the manufacturing cost is reduced, materials of the electrodes are less subjected to corrosion, and quality of the array substrate is enhanced.

Abstract: The present invention has disclosed a touch screen, comprising: a substrate; at least one first electrode formed on the substrate; at least one second electrode formed on the substrate, the first electrode and the second electrode having different extending directions, and there being an intersecting area between a vertical projection of the first electrode on the substrate and a vertical projection of the second electrode on the substrate; and a first protection layer formed at least at the intersecting area between the first electrode and the second electrode; wherein, the substrate is provided with a groove at the intersecting area between the first electrode and the second electrode so as to at least receive therein a portion of the first electrode located within the intersecting area. The present invention has also disclosed a display device and a method for manufacturing the touch screen.

Abstract: An array substrate, a manufacturing method thereof, and a display device are provided. The array substrate includes a thin film transistor on a base substrate, and an electrode structure on the thin film transistor, and the electrode structure includes a pixel electrode and a common electrode insulated from each other. The array substrate further includes: a black matrix disposed on the thin film transistor, an orthographic projection of the thin film transistor on the base substrate is located within an orthographic projection of the black matrix on the base substrate, and the black matrix is electrically connected with the common electrode for providing common electrode signals to the common electrode.

Abstract: The present disclosure discloses a thin film transistor assembly, an array substrate and a method of manufacturing the same, and a display device including the array substrate. The array substrate includes a substrate; a plurality of thin film transistors formed on the substrate; and a plurality of light shielding layers, each of the light shielding layers being arranged between a source electrode and a drain electrode of the thin film transistor and configured to block light from the exterior from illuminating an active layer of the thin film transistor. The light shielding layer and the source electrode and the drain electrode of the thin film transistor are formed in the same layer on the substrate.

Abstract: The present disclosure provides an array substrate, including a plurality of sub-pixel regions arranged in a matrix form. Each sub-pixel region may at least include a first thin film transistor (TFT) and a second thin film transistor. The first thin film transistor may include a first gate electrode, a first source electrode and a first drain electrode. The second thin film transistor may include a second gate electrode, a second source electrode and a second drain electrode. The first gate electrode and at least one of the second source electrode and the second drain electrode may be provided on a same layer. The second gate electrode and at least one of the first source electrode and the first drain electrode may be provided on a same layer. The second gate electrode and the first source electrode may be integrated together.

Abstract: An array substrate and manufacturing method thereof and a display device. The display device includes a pixel electrode, including a portion in a display region and a portion in a non-display region; a first electrode formed on the non-display region of the pixel electrode; a passivation layer formed on the pixel electrode and the first electrode, which includes a via hole located over the first electrode; an active layer and a second electrode that are formed on the passivation layer, the active layer being connected to the first electrode through the via hole of the passivation layer. With the array substrate and the manufacturing method thereof, the manufacturing cost is reduced, the corrosion to an electrode material is lessened, and quality of the array substrate is enhanced.