Patents by Inventor Jing S. Shu

Jing S. Shu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Antistatic solution for microlithic measurement
    Patent number: 5378498
    Abstract: An antistatic solution is disclosed to aid in the measurement of patterned resists by scanning electronic microscopes. The solution comprises a quaternary ammonium salt and a suitable solvent. The anion of the salt is selected from the group consisting of saccharinate, nitrate, sulfates, alkyl sulfates and alkoxylate. The four groups of the cation are selected from the group consisting of alkyl and alkyl derivatives.
    Type: Grant
    Filed: February 18, 1994
    Date of Patent: January 3, 1995
    Assignee: Texas Instruments Incorporated
    Inventors: Jing S. Shu, Chien S. Liang, Grover W. Trytten, Yvonne D. Satterfield
  • Plasma developable negative resist compositions for electron beam, X-ray and optical lithography
    Patent number: 4657844
    Abstract: A negative resist composition including a polymeric matrix material, a polymerizable monomer, and an onium salt radiation sensitive initiator. The monomer is polymerized by irradiating the resist with an e-beam, x-ray, or ultraviolet source and heating the exposed resist. The resist is developed by a dry etchant such as plasma or a reactive ion etchant.
    Type: Grant
    Filed: May 14, 1985
    Date of Patent: April 14, 1987
    Assignee: Texas Instruments Incorporated
    Inventors: Jing S. Shu, Johnny B. Covington, Wei Lee, Larry G. Venable, Gilbert L. Varnell
  • High gel rigidity, negative electron beam resists
    Patent number: 4318976
    Abstract: A negative, high energy radiation resist based on styrene-allyl methacrylate copolymers and substitutional modifications thereof, yielding a linear copolymer with highly sensitive allyl pendant groups together with a thermally stable, solvent resistant backbone. This resist exhibits improved e-beam sensitivity without the attendant problems of swelling during development and flow during heat processing.
    Type: Grant
    Filed: October 27, 1980
    Date of Patent: March 9, 1982
    Assignee: Texas Instruments Incorporated
    Inventors: Jing S. Shu, Wei Lee, Gilbert L. Varnell, John L. Bartelt