Patents by Inventor Jing-Shing Shu

Jing-Shing Shu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mask and method for forming dynamic random access memory (DRAM) contacts
    Patent number: 6417091
    Abstract: A mask (10) includes a pattern (14) having a plurality of substantially rectangular shapes (20) arranged longitudinally in each of a plurality of substantially parallel rows (22). The rows (22) are evenly spaced apart from each other. The substantially rectangular shapes (20) in each row (22) are evenly spaced apart from each other and offset from the substantially rectangular shapes (20) in neighboring rows (22). The substantially rectangular shapes (20) define a plurality of T-shapes (24) connected to and offset from each other.
    Type: Grant
    Filed: January 4, 2001
    Date of Patent: July 9, 2002
    Assignee: Texas Instruments Incorporated
    Inventors: Michael P. Keleher, Jeffrey A. McKee, Troy H. Herndon, Jing-Shing Shu
  • Mask and method for forming dynamic random access memory (DRAM) contacts
    Publication number: 20010002332
    Abstract: A mask (10) includes a pattern (14) having a plurality of substantially rectangular shapes (20) arranged longitudinally in each of a plurality of substantially parallel rows (22). The rows (22) are evenly spaced apart from each other. The substantially rectangular shapes (20) in each row (22) are evenly spaced apart from each other and offset from the substantially rectangular shapes (20) in neighboring rows (22). The substantially rectangular shapes (20) define a plurality of T-shapes (24) connected to and offset from each other.
    Type: Application
    Filed: January 4, 2001
    Publication date: May 31, 2001
    Inventors: Michael P. Keleher, Jeffrey A. McKee, Troy H. Herndon, Jing-Shing Shu
  • Mask and method for forming dynamic random access memory (DRAM) contacts
    Patent number: 6194306
    Abstract: A mask (10) includes a pattern (14) having a plurality of substantially rectangular shapes (20) arranged longitudinally in each of a plurality of substantially parallel rows (22). The rows (22) are evenly spaced apart from each other. The substantially rectangular shapes (20) in each row (22) are evenly spaced apart from each other and offset from the substantially rectangular shapes (20) in neighboring rows (22). The substantially rectangular shapes (20) define a plurality of T-shapes (24) connected to and offset from each other.
    Type: Grant
    Filed: December 22, 1998
    Date of Patent: February 27, 2001
    Assignee: Texas Instruments Incorporated
    Inventors: Michael P. Keleher, Jeffrey A. McKee, Troy H. Herndon, Jing-Shing Shu
  • Method and system for improved optical imaging in microlithography
    Patent number: 6151103
    Abstract: An improved microlithographic imaging system (100) is disclosed. The system comprises a filter (183) substantially aligned with a first image plane, adjacent to an aperture (185). The filter is formed in response to an image projected by a light source (110) through a reticle (160) onto the first image plane. The improved microlithographic imaging system has higher resolution and depth of focus than prior art imaging systems, due to the additional filtering performed by the filter (183). A filter in accordance with the invention can be fabricated easily and inexpensively, using conventional microlithography techniques. A filter in accordance with the invention can also be used to detect or correct flaws in the reticle (160).
    Type: Grant
    Filed: March 30, 1999
    Date of Patent: November 21, 2000
    Assignee: Texas Instruments Incorporated
    Inventors: Jing-Shing Shu, Anthony Yen
  • High throughput optical curing process for semiconductor device manufacturing
    Patent number: 5972803
    Abstract: This is a curing method of low-k dielectric material in a semiconductor device and system for such. The method may comprise: depositing metal interconnection lines; depositing the low-k dielectric material layer over the lines; and curing the low-k dielectric material layer with a heating lamp for less than 10 minutes, wherein the heating lamp provides optical radiation energy in the infrared spectral range of about 1 micron to 3.5 microns in wavelength. The heating lamp may be a tungsten-halogen lamp.
    Type: Grant
    Filed: October 22, 1997
    Date of Patent: October 26, 1999
    Assignee: Texas Instruments Incorporated
    Inventors: Jing Shing Shu, Ming-Jang Hwang, Mehrdad M. Moslehi, Cecil J. Davis
  • Dimension measurement of a semiconductor device
    Patent number: 5780852
    Abstract: A feature (24) of a semiconductor device (10) is formed in a photoresist (14). To accurately measure a dimension (26) of the feature (24), portions of the photoresist (14) are removed to provide a reduced thickness (34) of the photoresist (14). The ratio between the reduced thickness (34) and the dimension (26) allows for more accurate dimension measurement of the feature (24) of the semiconductor device (10).
    Type: Grant
    Filed: March 26, 1997
    Date of Patent: July 14, 1998
    Assignee: Texas Instruments Incorporated
    Inventor: Jing-Shing Shu