Abstract: A mask plate for manufacturing an organic light-emitting diode (OLED) transparent display panel, the OLED transparent display panel and a manufacturing method thereof are disclosed. The mask plate includes a substrate and a plurality of hollowed-out areas and a plurality of opaque areas disposed on the substrate, and a pattern of the hollowed-out areas correspond to a pattern of a cathode of the OLED transparent display panel to be manufactured; and all the hollowed-out areas are communicated with each other.

Abstract: A method, an apparatus and an equipment of inspecting the quality of an LCD are provided, the method includes: obtaining optical parameters of the LCD; capturing images of the LCD; and determining that the LCD is defective after determining that the optical parameters are not in the range of the preset optical parameters and/or the captured images of the LCD are not consistent with the pre-stored images. Through the technical solution of the present invention, it can effectively differentiate the defect types of a product and record the defect position of the product, thereby it can effectively reduce misjudgment or miss test caused by the visual differences between operators to improve the quality and yield of manufactured LCD.

Abstract: A method for measuring a performance indicator of a service flow is disclosed. A sending-end device constructs a measurement packet. The measurement packet is used to trigger a receiving-end device to measure the performance indicator of the service flow. A forwarding attribute of the measurement packet is the same as a forwarding attribute of a packet in the service flow. The measurement packet is sent to the receiving-end device.

Abstract: A lighting jig for inspection of a liquid crystal panel, which includes: a base plate; a first supporting plate and a second supporting plate, which are respectively located on and orthogonal to the base plate; and an adsorption platform disposed between the first supporting plate and the second supporting plate and being able to move up and down along a direction orthogonal to the base plate. The adsorption platform has an adsorption surface for adsorbing probes, and the adsorption positions of the probes on the adsorption surface can be adjusted according to distributed locations of circuit test points of various liquid crystal panels to be inspected. The lighting jig provided by embodiments of the present invention can be used for lighting various types of liquid crystal panels, thereby improving the universality and use efficiency of the lighting jig.

Abstract: Provided are techniques for the identification and display of critical messages including displaying a default desktop on a computing system; detecting a first popup message; making a first determination that the first popup message conforms with user specified criteria; and in response to the first determination generating a first emergency desktop; populating the first emergency desktop with the first popup message; and displaying the first emergency desktop in place of the default desktop on the computing system.

Abstract: Methods for use of a composition comprising agents that increase pancreatic interleukin-22 production in the treatment of pancreatic inflammatory disorders including pancreatitis-associated acute lung injury.

Abstract: One embodiment of the present invention relates to a system that constructs and calibrates an etch-aware photolithography model. During operation, the system constructs an etch bias model which models a critical dimension (CD) difference between a measured CD value of a feature after the photolithography process and a measured CD value of the feature after the etch process. The system then fits the photolithography process model based at least on the post-lithography measured CD data and the etch bias model, thereby causing the photolithography process model to be aware of etch effects. The present techniques facilitate bridging the gap between the photolithography and the etch process in the OPC modeling flow. In particular, these techniques can be used to modify conventional staged OPC model or to construct a model based rule table for correcting a retarget model.

Abstract: The present invention relates to the communications field, and discloses a method for measuring network performance. With the method, a receiving end receives a performance measurement message corresponding to a data stream, obtains a performance measurement parameter corresponding to the data stream, so that stream-based network performance measurement can be implemented. The present invention also discloses an apparatus and a system for measuring network performance, and another method for measuring network performance.

Abstract: One embodiment of the present invention relates to a system that constructs and calibrates an etch-aware photolithography model. During operation, the system constructs an etch bias model which models a critical dimension (CD) difference between a measured CD value of a feature after the photolithography process and a measured CD value of the feature after the etch process. The system then fits the photolithography process model based at least on the post-lithography measured CD data and the etch bias model, thereby causing the photolithography process model to be aware of etch effects. The present techniques facilitate bridging the gap between the photolithography and the etch process in the OPC modeling flow. In particular, these techniques can be used to modify conventional staged OPC model or to construct a model based rule table for correcting a retarget model.