Abstract: A semiconductor device includes a magnetic tunneling junction (MTJ) on a substrate, a spacer adjacent to the MTJ, a liner adjacent to the spacer, and a first metal interconnection on the MTJ. Preferably, the first metal interconnection includes protrusions adjacent to two sides of the MTJ and a bottom surface of the protrusions contact the liner directly.

Abstract: A semiconductor device includes a magnetic tunneling junction (MTJ) on a substrate, a first spacer on one side of the of the MTJ, a second spacer on another side of the MTJ, a first metal interconnection on the MTJ, and a liner adjacent to the first spacer, the second spacer, and the first metal interconnection. Preferably, each of a top surface of the MTJ and a bottom surface of the first metal interconnection includes a planar surface and two sidewalls of the first metal interconnection are aligned with two sidewalls of the MTJ.

Abstract: A semiconductor device includes a magnetic tunneling junction (MTJ) on a substrate, a first spacer on one side of the of the MTJ, a second spacer on another side of the MTJ, a first metal interconnection on the MTJ, and a liner adjacent to the first spacer, the second spacer, and the first metal interconnection. Preferably, each of a top surface of the MTJ and a bottom surface of the first metal interconnection includes a planar surface and two sidewalls of the first metal interconnection are aligned with two sidewalls of the MTJ.

Abstract: A topical pharmaceutical composition containing diacerein and/or its analogs is provided. Also provided is a method for treating various diseases using this topical pharmaceutical composition.

Abstract: A method of correcting a layout pattern is provided in the present invention. The method includes the following steps. A layout pattern including at least two adjacent rectangular sub patterns is provided. The layout pattern is then input into a computer system. An optical proximity correction including a bevel correction is then performed. The bevel correction includes forming a bevel at a corner of at least one of the two adjacent rectangular sub patterns, wherein the bevel is formed by chopping the corner, and moving the bevel toward an interaction of two neighboring segments of the bevel if a distance between the bevel and the other rectangular sub pattern is larger than a minimum value. The angle between a surface of the bevel and a surface of the rectangular sub pattern is not rectangular. The layout pattern is output to a mask after the optical proximity correction.

Abstract: A topical pharmaceutical composition containing diacerein and/or its analogs is provided. Also provided is a method for treating various diseases using this topical pharmaceutical composition.

Abstract: Methods and compositions for inhibiting expression of ASC, expression of NLRP3, and/or formation of NLRP3 inflammasome complex by using diacerein or its analogs are provided. Also provided are methods and compositions for the treatment and/or prevention of a disorder mediated by ASC and/or NLRP3, and/or by formation of NLRP3 inflammasome complex by using diacerein or its analogs.

Abstract: A topical pharmaceutical composition containing diacerein and/or its analogs is provided. Also provided is a method for treating various diseases using this topical pharmaceutical composition.

Abstract: A method of correcting a layout pattern is provided in the present invention. The method includes the following steps. A layout pattern including at least two adjacent rectangular sub patterns is provided. The layout pattern is then input into a computer system. An optical proximity correction including a bevel correction is then performed. The bevel correction includes forming a bevel at a corner of at least one of the two adjacent rectangular sub patterns, wherein the bevel is formed by chopping the corner, and moving the bevel toward an interaction of two neighboring segments of the bevel if a distance between the bevel and the other rectangular sub pattern is larger than a minimum value. The angle between a surface of the bevel and a surface of the rectangular sub pattern is not rectangular. The layout pattern is output to a mask after the optical proximity correction.

Abstract: A topical pharmaceutical composition containing diacerein and/or its analogs is provided. Also provided is a method for treating various diseases using this topical pharmaceutical composition.

Abstract: A method of treating and/or preventing blood-associated disorders is provided. Also provided is a method of treating and/or preventing hemophilic arthropathy and/or hemochromatosis arthropathy in a subject.

Abstract: The present invention provides a pattern verifying method. First, a target pattern is decomposed into a first pattern and a second pattern. A first OPC process is performed for the first pattern to form a first revised pattern, and a second OPC process is performed for the second pattern to form a second revised pattern. An inspection process is performed, wherein the inspection process comprises an after mask inspection (AMI) process, which comprises considering the target pattern, the first pattern and the second pattern.

Abstract: A method for optimizing an integrated circuit layout design includes the following steps. A first integrated circuit layout design including a metal line feature having several metal lines and a second integrated circuit layout design including a hole feature having several holes are obtained. A line-end hole feature of the hole feature is selected by piecing the metal line feature with the hole feature. The line-end hole feature is classified into a single hole feature and a redundant hole feature by spacings between the adjacent holes by a computer system.

Abstract: A topical pharmaceutical composition containing diacerein and/or its analogs is provided. Also provided is a method for treating various diseases using this topical pharmaceutical composition.

Abstract: Methods and compositions for inhibiting expression of ASC, expression of NLRP3, and/or formation of NLRP3 inflammasome complex by using diacerein or its analogs are provided. Also provided are methods and compositions for the treatment and/or prevention of a disorder mediated by ASC and/or NLRP3, and/or by formation of NLRP3 inflammasome complex by using diacerein or its analogs.

Abstract: A method for optimizing an integrated circuit layout design includes the following steps. A first integrated circuit layout design including a metal line feature having several metal lines and a second integrated circuit layout design including a hole feature having several holes are obtained. A line-end hole feature of the hole feature is selected by piecing the metal line feature with the hole feature. The line-end hole feature is classified into a single hole feature and a redundant hole feature by spacings between the adjacent holes by a computer system.

Abstract: A topical pharmaceutical composition containing diacerein and/or its analogs is provided. Also provided is a method for treating various diseases using this topical pharmaceutical composition.

Abstract: The present invention provides a pattern verifying method. First, a target pattern is decomposed into a first pattern and a second pattern. A first OPC process is performed for the first pattern to form a first revised pattern, and a second OPC process is performed for the second pattern to form a second revised pattern. An inspection process is performed, wherein the inspection process comprises an after mask inspection (AMI) process, which comprises considering the target pattern, the first pattern and the second pattern.

Abstract: A method for IC design is provided. Firstly, an IC design layout having a main feature with an original margin is received. Then, a first modified margin of the main feature is generated; and a first photolithography simulation procedure of the main feature with the first modified margin is performed to generate a first contour having a plurality of curves. Next, an equation of each of the curves is obtained; each equation of the curves is manipulated to obtain a vertex of each of the curves. After that, a first group of target points are assigned to the original margin. Each of the first group of target points respectively corresponds to one of the vertices. Finally, an optical proximity correction (OPC) procedure is performed by using the first group of target points to generate a second modified margin. An apparatus for IC design is also provided.

Abstract: A method for IC design is provided. Firstly, an IC design layout having a main feature with an original margin is received. Then, a first modified margin of the main feature is generated; and a first photolithography simulation procedure of the main feature with the first modified margin is performed to generate a first contour having a plurality of curves. Next, an equation of each of the curves is obtained; each equation of the curves is manipulated to obtain a vertex of each of the curves. After that, a first group of target points are assigned to the original margin. Each of the first group of target points respectively corresponds to one of the vertices. Finally, an optical proximity correction (OPC) procedure is performed by using the first group of target points to generate a second modified margin. An apparatus for IC design is also provided.