Patents by Inventor Jinggao Li

Jinggao Li has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and method for exchanging CAD data
    Patent number: 10198446
    Abstract: A CAD file converting device for applying CAD files created in a CAD system for machines to a CAD system for ships maps modeling units that the CAD files created in the CAD system for machines and those applied in the CAD system for ships, and converts parameter values determining feature shapes in the mapped modeling units into parameter values proper to the CAD files of the CAD system for ship design. Accordingly, CAD files of a CAD system for machines can be accurately converted into CAD files of a CAD system for ships.
    Type: Grant
    Filed: July 31, 2012
    Date of Patent: February 5, 2019
    Assignee: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Soon Hung Han, Jinggao Li
  • APPARATUS AND METHOD FOR EXCHANGING CAD DATA
    Publication number: 20150205806
    Abstract: A CAD file converting device for applying CAD files created in a CAD system for machines to a CAD system for ships maps modeling units that the CAD files created in the CAD system for machines and those applied in the CAD system for ships, and converts parameter values determining feature shapes in the mapped modeling units into parameter values proper to the CAD files of the CAD system for ship design. Accordingly, CAD files of a CAD system for machines can be accurately converted into CAD files of a CAD system for ships.
    Type: Application
    Filed: July 31, 2012
    Publication date: July 23, 2015
    Applicant: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Soon Hung Han, Jinggao Li
  • Lithographic apparatus and device manufacturing method
    Patent number: 9081311
    Abstract: An apparatus, in an embodiment, having a patterning device support including a first planar element having a first flow-restricting surface; a second planar element including a second flow-restricting surface facing the first flow-restricting surface; a support driver to linearly move the support along a certain direction relative to the second planar element, wherein the first and/or second flow-restricting surface has one or more projections and/or recesses between the first and second flow-restricting surfaces, and wherein the projection and/or recess on the first and/or second flow-restricting surface is arranged to provide a flow resistance, per unit width of the first and/or second flow-restricting surface perpendicular to the flow, that is lower against flow that is parallel to the certain direction than against flow that is perpendicular to the certain direction. The flow-restricting surfaces may direct gas flow onto a driver part that generates heat.
    Type: Grant
    Filed: March 26, 2012
    Date of Patent: July 14, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Herman Vogel, Jeroen Gerard Gosen, Bart Dinand Paarhuis, Frank Johannes Jacobus Van Boxtel, Jinggao Li
  • Lithographic apparatus, an illumination system, a projection system and a method of manufacturing a device using a lithographic apparatus
    Patent number: 8810769
    Abstract: A gas curtain is provided to separate a component of a lithographic apparatus from contaminated gas. The gas curtain is supplied by an opening. The opening is at a boundary of a protection environment with which a surface of the component comes into contact. The gas curtain may separate the component from a moving part of the apparatus.
    Type: Grant
    Filed: March 17, 2011
    Date of Patent: August 19, 2014
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Jeroen Gerard Gosen, Antonius Johannus Van Der Net, Bart Dinand Paarhuis, Frank Johannes Jacobus Van Boxtel, Jinggao Li
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20120249983
    Abstract: An apparatus, in an embodiment, having a patterning device support including a first planar element having a first flow-restricting surface; a second planar element including a second flow-restricting surface facing the first flow-restricting surface; a support driver to linearly move the support along a certain direction relative to the second planar element, wherein the first and/or second flow-restricting surface has one or more projections and/or recesses between the first and second flow-restricting surfaces, and wherein the projection and/or recess on the first and/or second flow-restricting surface is arranged to provide a flow resistance, per unit width of the first and/or second flow-restricting surface perpendicular to the flow, that is lower against flow that is parallel to the certain direction than against flow that is perpendicular to the certain direction. The flow-restricting surfaces may direct gas flow onto a driver part that generates heat.
    Type: Application
    Filed: March 26, 2012
    Publication date: October 4, 2012
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Herman Vogel, Jeroen Gerard Gosen, Bart Dinand Paarhuis, Frank Johannes Jacobus Van Boxtel, Jinggao Li
  • LITHOGRAPHIC APPARATUS, AN ILLUMINATION SYSTEM, A PROJECTION SYSTEM AND A METHOD OF MANUFACTURING A DEVICE USING A LITHOGRAPHIC APPARATUS
    Publication number: 20110228239
    Abstract: A gas curtain is provided to separate a component of a lithographic apparatus from contaminated gas. The gas curtain is supplied by an opening. The opening is at a boundary of a protection environment with which a surface of the component comes into contact. The gas curtain may separate the component from a moving part of the apparatus.
    Type: Application
    Filed: March 17, 2011
    Publication date: September 22, 2011
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Jeroen Gerard GOSEN, Antonius Johannus Van Der Net, Bart Dinand Paarhuis, Frank Johannes Jacobus Van Boxtel, Jinggao Li