Patents by Inventor Jing-Hong Yang

Jing-Hong Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11966340
    Abstract: To automate time series forecasting machine learning pipeline generation, a data allocation size of time series data may be determined based on one or more characteristics of a time series data set. The time series data may be allocated for use by candidate machine learning pipelines based on the data allocation size. Features for the time series data may be determined and cached by the candidate machine learning pipelines. Predictions of each of the candidate machine learning pipelines using at least the one or more features may be evaluated. A ranked list of machine learning pipelines may be automatically generated from the candidate machine learning pipelines for time series forecasting based upon evaluating predictions of each of the one or more candidate machine learning pipelines.
    Type: Grant
    Filed: March 15, 2022
    Date of Patent: April 23, 2024
    Assignee: International Business Machines Corporation
    Inventors: Long Vu, Bei Chen, Xuan-Hong Dang, Peter Daniel Kirchner, Syed Yousaf Shah, Dhavalkumar C. Patel, Si Er Han, Ji Hui Yang, Jun Wang, Jing James Xu, Dakuo Wang, Gregory Bramble, Horst Cornelius Samulowitz, Saket K. Sathe, Wesley M. Gifford, Petros Zerfos
  • Patent number: 8268717
    Abstract: A manufacturing method of a bump structure with an annular support includes the following steps. A substrate including pads and a passivation layer is provided. The passivation has first openings exposing a portion of the pads. An UBM material layer is formed to cover the passivation layer and the pads. A patterned photoresist layer, having second openings respectively exposing the UBM material layer over the pads, is formed on the UBM material layer. A diameter of each second opening located on a lower surface of the patterned photoresist layer is less than that located on an upper surface of the patterned photoresist layer. Bumps are formed in the second openings. A portion of the patterned photoresist layer is removed to form an annular support at a periphery of each bump. The UBM material layer is patterned using the annular supports and the bumps as masks to form UBM layers.
    Type: Grant
    Filed: August 15, 2011
    Date of Patent: September 18, 2012
    Assignee: ChipMOS Technologies (Bermuda) Ltd.
    Inventor: Jing-Hong Yang
  • Publication number: 20110300705
    Abstract: A manufacturing method of a bump structure with an annular support includes the following steps. A substrate including pads and a passivation layer is provided. The passivation has first openings exposing a portion of the pads. An UBM material layer is formed to cover the passivation layer and the pads. A patterned photoresist layer, having second openings respectively exposing the UBM material layer over the pads, is formed on the UBM material layer. A diameter of each second opening located on a lower surface of the patterned photoresist layer is less than that located on an upper surface of the patterned photoresist layer. Bumps are formed in the second openings. A portion of the patterned photoresist layer is removed to form an annular support at a periphery of each bump. The UBM material layer is patterned using the annular supports and the bumps as masks to form UBM layers.
    Type: Application
    Filed: August 15, 2011
    Publication date: December 8, 2011
    Applicant: CHIPMOS TECHNOLOGIES (BERMUDA) LTD.
    Inventor: Jing-Hong Yang
  • Patent number: 8030767
    Abstract: A bump structure with an annular support suitable for being disposed on a substrate is provided. The substrate has at least one pad and a passivation layer that has at least one opening exposing a portion of the pad. The bump structure with the annular support includes an under ball metal (UBM) layer, a bump, and an annular support. The UBM layer is disposed on the passivation layer and covers the pad exposed by the passivation layer. The bump is disposed on the UBM layer over the pad, and a diameter of a lower surface of the bump is less than the diameter of an upper surface thereof. The annular support surrounds and contacts the bump, and a material of the annular support is photoresist. An under cut effect is not apt to happen on the bump structure.
    Type: Grant
    Filed: March 30, 2007
    Date of Patent: October 4, 2011
    Assignee: ChipMOS Technologies (Bermuda) Ltd.
    Inventor: Jing-Hong Yang
  • Publication number: 20080169559
    Abstract: A bump structure with an annular support suitable for being disposed on a substrate is provided. The substrate has at least one pad and a passivation layer that has at least one opening exposing a portion of the pad. The bump structure with the annular support includes an under ball metal (UBM) layer, a bump, and an annular support. The UBM layer is disposed on the passivation layer and covers the pad exposed by the passivation layer. The bump is disposed on the UBM layer over the pad, and a diameter of a lower surface of the bump is less than the diameter of an upper surface thereof. The annular support surrounds and contacts the bump, and a material of the annular support is photoresist. An under cut effect is not apt to happen on the bump structure.
    Type: Application
    Filed: March 30, 2007
    Publication date: July 17, 2008
    Applicant: CHIPMOS TECHNOLOGIES (BERMUDA) LTD.
    Inventor: Jing-Hong Yang