Patents by Inventor Jingmin ZHAO

Jingmin ZHAO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190285648
    Abstract: The invention relates to the field of diagnosis and treatment of cirrhosis and liver fibrosis. Specifically, the invention relates to the use of Golgi protein 73 (GP73) and a substance of detecting the level of Golgi protein 73 (GP73) for preparing the products for screening, auxiliarily diagnosing liver diseases or auxiliarily determining the prognosis of liver diseases. The invention proves that Golgi protein 73 (GP73) can be used as a novel marker of cirrhosis, and has diagnostic value especially for cirrhosis resulting from non-hepatitis B virus infection, but has no diagnostic value for primary hepatocellular carcinoma.
    Type: Application
    Filed: August 30, 2017
    Publication date: September 19, 2019
    Inventors: Fengmin LU, Mingjie YAO, Jingmin ZHAO
  • Patent number: 8455362
    Abstract: A chemical mechanical polishing method includes providing a device layer having a surface to be polished, polishing the surface using an alkaline grinding slurry, removing a residual layer that is been formed on the polished surface using an acid buffer, forming a passivation layer covering the polished surface of the device layer after the residual layer has been removed, and cleaning the passivation layer using deionized water. A semiconductor device thus fabricated has surfaces with excellent flatness, good manufacturing yield and long-term reliability.
    Type: Grant
    Filed: October 5, 2011
    Date of Patent: June 4, 2013
    Assignee: Semiconductor Manufacturing International Corp.
    Inventors: Feng Zhao, Wufeng Deng, Jingmin Zhao, Feng Chen, Chunliang Liu
  • Publication number: 20120244706
    Abstract: A chemical mechanical polishing method includes providing a device layer having a surface to be polished, polishing the surface using an alkaline grinding slurry, removing a residual layer that is been formed on the polished surface using an acid buffer, forming a passivation layer covering the polished surface of the device layer after the residual layer has been removed, and cleaning the passivation layer using deionized water. A semiconductor device thus fabricated has surfaces with excellent flatness, good manufacturing yield and long-term reliability.
    Type: Application
    Filed: October 5, 2011
    Publication date: September 27, 2012
    Applicant: Semiconductor Manufacturing International (Shanghai) Corporation
    Inventors: Feng ZHAO, Wufeng DENG, Jingmin ZHAO, Feng CHEN, Chunliang LIU