Patents by Inventor Jingping Peng

Jingping Peng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patterned atomic layer epitaxy
    Patent number: 7799132
    Abstract: A patterned layer is formed by removing nanoscale passivating particle from a first plurality of nanoscale structural particles or by adding nanoscale passivating particles to the first plurality of nanoscale structural particles. Each of a second plurality of nanoscale structural particles is deposited on each of corresponding ones of the first plurality of nanoscale structural particles that is not passivated by one of the plurality of nanoscale passivating particles.
    Type: Grant
    Filed: December 13, 2007
    Date of Patent: September 21, 2010
    Assignee: Zyvex Labs, LLC
    Inventors: John N. Randall, Jingping Peng, Jun-Fu Liu, George D. Skidmore, Christof Baur, Richard E. Stallcup, Robert J. Folaron
  • PATTERNED ATOMIC LAYER EPITAXY
    Publication number: 20080092803
    Abstract: A patterned layer is formed by removing nanoscale passivating particle from a first plurality of nanoscale structural particles or by adding nanoscale passivating particles to the first plurality of nanoscale structural particles. Each of a second plurality of nanoscale structural particles is deposited on each of corresponding ones of the first plurality of nanoscale structural particles that is not passivated by one of the plurality of nanoscale passivating particles.
    Type: Application
    Filed: December 13, 2007
    Publication date: April 24, 2008
    Applicant: ZYVEX LABS, LLC
    Inventors: John Randall, Jingping Peng, Jun-Fu Liu, George Skidmore, Christof Baur, Richard Stallcup, Robert Folaron
  • Patterned atomic layer epitaxy
    Patent number: 7326293
    Abstract: A patterned layer is formed by removing nanoscale passivating particle from a first plurality of nanoscale structural particles or by adding nanoscale passivating particles to the first plurality of nanoscale structural particles. Each of a second plurality of nanoscale structural particles is deposited on each of corresponding ones of the first plurality of nanoscale structural particles that is not passivated by one of the plurality of nanoscale passivating particles.
    Type: Grant
    Filed: March 25, 2005
    Date of Patent: February 5, 2008
    Assignee: Zyvex Labs, LLC
    Inventors: John N. Randall, Jingping Peng, Jun-Fu Liu, George D. Skidmore, Christof Baur, Richard E. Stallcup, II, Robert J. Folaron
  • Patterned atomic layer epitaxy
    Publication number: 20050223968
    Abstract: A patterned layer is formed by removing nanoscale passivating particle from a first plurality of nanoscale structural particles or by adding nanoscale passivating particles to the first plurality of nanoscale structural particles. Each of a second plurality of nanoscale structural particles is deposited on each of corresponding ones of the first plurality of nanoscale structural particles that is not passivated by one of the plurality of nanoscale passivating particles.
    Type: Application
    Filed: March 25, 2005
    Publication date: October 13, 2005
    Applicant: Zyvex Corporation
    Inventors: John Randall, Jingping Peng, Jun-Fu Liu, George Skidmore, Christof Baur, Richard Stallcup, Robert Folaron