Patents by Inventor Jing-Ran Chen

Jing-Ran Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Fused-silica capillaries with photopolymer components
    Patent number: 6986841
    Abstract: A separation column is provided with a photopolymer component which, when irradiated, causes controlled porosity polymerization. A particularly preferred embodiment is wherein the separation medium is retained by a photopolymer frit, which can be reliably and reproducibly generated with controlled porosity.
    Type: Grant
    Filed: September 29, 2003
    Date of Patent: January 17, 2006
    Inventors: Richard N. Zare, Maria T. Dulay, Jing-Ran Chen
  • Fused-silica capillaries with photopolymer components
    Publication number: 20040055940
    Abstract: A separation column is provided with a photopolymer component which, when irradiated, causes controlled porosity polymerization. A particularly preferred embodiment is wherein the separation medium is retained by a photopolymer frit, which can be reliably and reproducibly generated with controlled porosity.
    Type: Application
    Filed: September 29, 2003
    Publication date: March 25, 2004
    Inventors: Richard N. Zare, Maria T. Dulay, Jing-Ran Chen
  • Fused-silica capillaries with photopolymer components
    Publication number: 20020079257
    Abstract: A separation column is provided with a photopolymer component which, when irradiated, causes controlled porosity polymerization. A particularly preferred embodiment is wherein the separation medium is retained by a photopolymer frit, which can be reliably and reproducibly generated with controlled porosity.
    Type: Application
    Filed: November 13, 2001
    Publication date: June 27, 2002
    Inventors: Richard N. Zare, Maria T. Dulay, Jing-Ran Chen