Patents by Inventor Jinheng Wang

Jinheng Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10521546
    Abstract: An optical proximity correction method, comprising: dissecting an edge of a design pattern (120/220) to form a segment (Seg1/Seg2); setting target points of the segments (Seg1/Seg2), and if the segments (Seg1/Seg2) translate in a direction vertical to the segments (Seg1/Seg2), controlling tangent points (P1/P2) of the segments (Seg1/Seg2) tangent to a simulated pattern (110/210) to coincide with the target points; computing edge position differences of the target points; and correcting the design pattern (120/220) according to the edge position differences.
    Type: Grant
    Filed: May 11, 2016
    Date of Patent: December 31, 2019
    Assignee: CSMC TECHNOLOGIES FAB2 CO., LTD.
    Inventors: Jinyin Wan, Jinheng Wang, Lei Zhang, Jie Chen
  • Publication number: 20180252996
    Abstract: An optical proximity correction method, comprising: dissecting an edge of a design pattern (120/220) to form a segment (Seg1/Seg2); setting target points of the segments (Seg1/Seg2), and if the segments (Seg1/Seg2) translate in a direction vertical to the segments (Seg1/Seg2), controlling tangent points (P1/P2) of the segments (Seg1/Seg2) tangent to a simulated pattern (110/210) to coincide with the target points; computing edge position differences of the target points; and correcting the design pattern (120/220) according to the edge position differences.
    Type: Application
    Filed: May 11, 2016
    Publication date: September 6, 2018
    Applicant: CSMC TECHNOLOGIES FAB2 CO., LTD.
    Inventors: Jinyin Wan, Jinheng Wang, Lei Zhang, Jie Chen
  • Patent number: 7820346
    Abstract: This invention relates to a method for collecting an Optical Proximity Correction parameter, which includes: performing an Optical Proximity Correction for a test line containing a non-right turning-angle to generate a to-be-exposed pattern having an assistant line; obtaining, by way of simulation or actual exposure, a formed line generated from the to-be-exposed pattern being exposed; and comparing the formed line with the test line to determine a difference there between so as to determine whether there is a redundant part and/or a missing part in the assistant line at location of the turning-angle of the test line. Being compared with the prior art, this invention sets the non-right turning-angle in the to-be-exposed test line.
    Type: Grant
    Filed: October 5, 2009
    Date of Patent: October 26, 2010
    Assignee: Semiconductor Manufacturing International (Shanghai) Corporation
    Inventor: Jinheng Wang
  • Publication number: 20100129740
    Abstract: This invention relates to a method for collecting an Optical Proximity Correction parameter, which includes: performing an Optical Proximity Correction for a test line containing a non-right turning-angle to generate a to-be-exposed pattern having an assistant line; obtaining, by way of simulation or actual exposure, a formed line generated from the to-be-exposed pattern being exposed; and comparing the formed line with the test line to determine a difference there between so as to determine whether there is a redundant part and/or a missing part in the assistant line at location of the turning-angle of the test line. Being compared with the prior art, this invention sets the non-right turning-angle in the to-be-exposed test line.
    Type: Application
    Filed: October 5, 2009
    Publication date: May 27, 2010
    Applicant: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (Shanghai) CORPORATION
    Inventor: Jinheng Wang