Patents by Inventor Jinmiao James Shen

Jinmiao James Shen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Treatment for reduction of line edge roughness
    Patent number: 7670760
    Abstract: A method for reducing line edge roughness (LER) in a layer of photoresist is provided. In accordance with the method, a layer of photoresist is applied to a substrate. The layer of photoresist is then patterned and annealed in an atmosphere comprising at least one gas selected from the group consisting of hydrogen, nitrogen and fluorine-containing materials. Preferably, the anneal is performed after patterning the photoresist, but either immediately after, or subsequent to, the trim.
    Type: Grant
    Filed: March 6, 2006
    Date of Patent: March 2, 2010
    Assignee: Freescale Semiconductor, Inc.
    Inventors: Jinmiao James Shen, Jonathan L. Cobb, William D. Darlington, Brian J. Fisher, Mark D. Hall, Vikas R. Sheth, Mehul D. Shroff, James E. Vasek