Abstract: A method of controlling power output by a power supply configured to supply power to a plasma torch in a gas treatment system, the plasma torch being configured to treat effluent gas received from at least two processing chambers is disclosed, along with a controller and the gas treatment system. The method comprises: receiving at least one input signal, the at least one input signal comprising an indication of a number of processing chambers currently supplying an effluent gas stream to the plasma torch; and in response to the at least one input signal, controlling the power output by the power supply by outputting a control signal to control a rate of flow of the plasma source gas.

Abstract: A power supply configured to supply power to a plasma torch in a gas treatment system within a predetermined power limit by periodically receiving at least one input signal indicative of a current power output by the power supply; and in response to the at least one input signal indicating the power output has passed a predetermined value adjusting the power output such that the power output is within the predetermined power limit. Adjusting the power output includes: outputting a control signal to change a flow rate of a source gas supplied to the plasma torch where the change would maintain a source gas flow rate within predetermined gas flow limits; and where the change would not maintain the source gas flow rate within the predetermined gas flow limits, outputting a control signal to change one of a current or voltage output by the power supply unit.