Abstract: Disclosed are an X-ray target having a micro focus size and capable of producing X-rays of high intensity, and apparatuses using such an X-ray target. The X-ray target (1) has a structure in which a first cap layer (21), a target layer (22), and a second cap layer (23) are successively laminated, wherein the first and second cap layers (21 and 23) are each composed of a material which is lower in electron beam absorptivity than that of which the target layer (22) is composed. An X-ray generator using the X-ray target (1) can generate highly intense and nanofocus (several nm) X-rays (17). Using the X-ray generator, an X-ray microscope allows obtaining a high resolution transmission image, an X-ray diffraction apparatus allows obtaining an X-ray diffraction image of a very small area, and a fluorescent X-ray analysis apparatus allows making the fluorescent X-ray analysis of a minute area.

Abstract: Disclosed are an X-ray target having a micro focus size and capable of producing X-rays of high intensity, and apparatuses using such an X-ray target. The X-ray target (1) has a structure in which a first cap layer (21), a target layer (22), and a second cap layer (23) are successively laminated, wherein the first and second cap layers (21and 23) are each composed of a material which is lower in electron beam absorptivity than that of which the target layer (22) is composed. An X-ray generator using the X-ray target (1) can generate highly intense and nanofocus (several nm) X-rays (17). Using the X-ray generator, an X-ray microscope allows obtaining a high resolution transmission image, an X-ray diffraction apparatus allows obtaining an X-ray diffraction image of a very small area, and a fluorescent X-ray analysis apparatus allows making the fluorescent X-ray analysis of a minute area.

Abstract: The invention relates to a method for forming a multilayer thin film and an apparatus thereof, which are able to form a thin layer at an accuracy of 0.5 nanometers or less on at least a specified layer during formation on a substrate (W) and to increase the yield of multilayer thin film products. X-rays are irradiated from X-ray irradiating means (6) onto the surface of a multilayer thin film during formation on the substrate (W) at angles from 0 to 1.5 degrees, and the obtained reflected X-rays are measured by X-ray measuring means (7) while varying the incident angle &thgr;, wherein reflectivity curve depicting the intensities of the reflected X-rays are obtained with respect to the scattering angle 2&thgr;, and the reflectivity curve, whose scattering angles exist in a range of 0 to 1 degree, of the reflectivity curve is analyzed.