Patents by Inventor Jinqing JIAO

Jinqing JIAO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Dendritic mesoporous silica nanoparticles synthesized via a facile one-pot surfactant-free process
    Patent number: 11959921
    Abstract: A method for forming dendritic mesoporous nanoparticles comprising preparing a mixture containing one or more polymer precursors, a silica precursor, and a compound that reacts with silica and reacts with the polymer or oligomer formed from the one or more polymer precursors, and stirring the mixture whereby nanoparticles are formed, and subsequently treating the nanoparticles to form dendritic mesoporous silica nanoparticles or dendritic mesoporous carbon nanoparticles. The silica precursor may comprise tetraethyl orthosilicate (TEOS), the one or more polymer precursors may comprise 3-aminophenol and formaldehyde and the compound may be ethylene diamine (EDA). There is a window of amount of EDA present that will result in asymmetric particles being formed. If a greater amount of EDA is present, symmetrical particles will be formed.
    Type: Grant
    Filed: June 12, 2018
    Date of Patent: April 16, 2024
    Assignee: THE UNIVERSITY OF QUEENSLAND
    Inventors: Chengzhong (Michael) Yu, Jianye Fu, Jinqing Jiao, Yang Liu
  • DENDRITIC MESOPOROUS SILICA NANOPARTICLES SYNTHESIZED VIA A FACILE ONE-POT SURFACTANT-FREE PROCESS
    Publication number: 20210292177
    Abstract: A method for forming dendritic mesoporous nanoparticles comprising preparing a mixture containing one or more polymer precursors, a silica precursor, and a compound that reacts with silica and reacts with the polymer or oligomer formed from the one or more polymer precursors, and stirring the mixture whereby nanoparticles are formed, and subsequently treating the nanoparticles to form dendritic mesoporous silica nanoparticles or dendritic mesoporous carbon nanoparticles. The silica precursor may comprise tetraethyl orthosilicate (TEOS), the one or more polymer precursors may comprise 3-aminophenol and formaldehyde and the compound may be ethylene diamine (EDA). There is a window of amount of EDA present that will result in asymmetric particles being formed. If a greater amount of EDA is present, symmetrical particles will be formed.
    Type: Application
    Filed: June 12, 2018
    Publication date: September 23, 2021
    Inventors: Chengzhong (Michael) YU, Jianye FU, Jinqing JIAO, Yang LIU