Patents by Inventor Jinrong Liu
Jinrong Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20250101402Abstract: Disclosed herein are novel selectable markers and uses thereof. Specifically, provided herein are uses of nucleotide sequences encoding a glutamine synthetase (GS) derived from platypus, turtle, rat, opossum, wombat, or zebra finch as selectable markers for identifying genomic loci with high transcriptional activity or host cells having high productivity of a protein of interest, and/or allowing accelerated cell isolation expressing a protein of interest. Related methods of screening, methods of production, and expression systems are also included.Type: ApplicationFiled: August 2, 2022Publication date: March 27, 2025Inventors: Wei Shao, Jinggong Chen, Ying Xu, Yu Long, Jing Zhang, Xingxing Liu, Jinrong Liu, Wei Wu, Weidong Hao, Jianxin Chen
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Publication number: 20250066491Abstract: Provided are novel selectable markers and uses thereof. Specifically, provided are uses of nucleotide sequences encoding a glutamine synthetase (GS) derived from Alligator, green anole, or spotted gar as selectable markers for identifying genomic loci with high transcriptional activity or host cells having high productivity of a protein of interest, and/or for accelerating the identification process. Related methods of screening, methods of production, and expression systems are also included.Type: ApplicationFiled: December 26, 2022Publication date: February 27, 2025Inventors: Wei Shao, Jinggong Chen, Ying Xu, Yu Long, Jing Zhang, Xingxing Liu, Honghui Yuan, Yali Wei, Jinrong Liu, Wei Wu, Weidong Hao, Jianxin Chen
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Patent number: 11434889Abstract: A piston-cylinder structure includes a cylinder, an end cap, a tapered portion for extruding dead space, an upper bowl-shaped seal portion, a columnar seal portion, a lower bowl-shaped seal portion and a piston push rod. The upper bowl-shaped seal portion is configured to form sealing between the piston push rod and the cylinder when the piston push rod moves toward the end cap and to remove crystals on an inner wall of the cylinder. The columnar seal portion is configured to enable the piston push rod to be coaxial with the cylinder, and to provide a mechanical support for the piston push rod. The lower bowl-shaped seal portion is configured to provide sealing between the piston push rod and the cylinder and remove the crystals on the inner wall of the cylinder when the piston push rod moves toward the end cap.Type: GrantFiled: June 24, 2020Date of Patent: September 6, 2022Assignees: BEIJING BEIFEN-RUILI ANALYTICAL INSTRUMENT (GROUP) CO., LTD., MAITUOWEI PRECISION INSTRUMENT MANUFACTURING HEBEI CO., LTD.Inventors: Lu Chen, Jiaxiang Deng, Rongbing Tian, Sainan Li, Jinrong Liu, Hongxiang Shu
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Publication number: 20210025378Abstract: A piston-cylinder structure includes a cylinder, an end cap, a tapered portion for extruding dead space, an upper bowl-shaped seal portion, a columnar seal portion, a lower bowl-shaped seal portion and a piston push rod. The upper bowl-shaped seal portion is configured to form sealing between the piston push rod and the cylinder when the piston push rod moves toward the end cap and to remove crystals on an inner wall of the cylinder. The columnar seal portion is configured to enable the piston push rod to be coaxial with the cylinder, and to provide a mechanical support for the piston push rod. The lower bowl-shaped seal portion is configured to provide sealing between the piston push rod and the cylinder and remove the crystals on the inner wall of the cylinder when the piston push rod moves toward the end cap.Type: ApplicationFiled: June 24, 2020Publication date: January 28, 2021Inventors: Lu CHEN, Jiaxiang DENG, Rongbing TIAN, Sainan LI, Jinrong LIU, Hongxiang SHU
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Patent number: 10322132Abstract: The present invention relates to the use of a compound of formula (I), a pharmaceutically acceptable salt thereof, a solvate thereof, or a pharmaceutical composition containing the same in reducing uric acid level, preventing or reducing inflammations, and preventing or treating uratic or gouty diseases. In particular, the present invention relates to the use of a compound of formula (I), a pharmaceutically acceptable salt thereof, a solvate thereof, or a pharmaceutical composition containing the same in the manufacture of a medicament for the treatment or prevention of hyperuricemia, gout, gouty inflammations, pain and uric acid nephropathy. R1 represents hydrogen, C1-4 alkyl or the like. R2 represents C1-10 alkyl or the like. R3 represents halogen or the like.Type: GrantFiled: January 28, 2016Date of Patent: June 18, 2019Assignee: SHANTON PHARMA CO., LTDInventors: Qian Zhang, Zhenhua Huang, Jinrong Liu, Shuangshuang Chi
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Publication number: 20170326148Abstract: The present invention relates to the use of a compound of formula (I), a pharmaceutically acceptable salt thereof, a solvate thereof, or a pharmaceutical composition containing the same in reducing uric acid level, preventing or reducing inflammations, and preventing or treating uratic or gouty diseases. In particular, the present invention relates to the use of a compound of formula (I), a pharmaceutically acceptable salt thereof, a solvate thereof, or a pharmaceutical composition containing the same in the manufacture of a medicament for the treatment or prevention of hyperuricemia, gout, gouty inflammations, pain and uric acid nephropathy. R1 represents hydrogen, C1-4alkyl or the like. R2 represents C1-10alkyl or the like. R3 represents halogen or the like.Type: ApplicationFiled: January 28, 2016Publication date: November 16, 2017Inventors: Qian ZHANG, Zhenhua HUANG, Jinrong LIU, Shuangshuang CHI
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Patent number: 9696627Abstract: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that have base-reactive groups. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.Type: GrantFiled: December 13, 2010Date of Patent: July 4, 2017Assignee: Rohm and Haas Electronic Materials LLCInventors: Deyan Wang, Jinrong Liu, Cong Liu, Doris Kang, Anthony Zampini, Cheng-Bai Xu
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Publication number: 20150207139Abstract: A composition, method of its preparation, and zinc electrodes comprising the composition as the active mass, for use in rechargeable electrochemical cells with enhanced cycle life is described. The electrode active mass comprises a source of electrochemically active zinc and at least one fatty acid or a salt, ester or derivative thereof, or an alkyl sulfonic acid or a salt ester or derivative thereof. The zinc electrode is assumed to exhibit low shape change and decreased dendrite formation compared to known zinc electrodes, resulting in electrochemical cells which have improved capacity retention over a number of charge/discharge cycles.Type: ApplicationFiled: December 8, 2014Publication date: July 23, 2015Inventors: Simon Berners HALL, Jinrong Liu
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Patent number: 8361655Abstract: A composition, method of its preparation, and zinc electrodes comprising the composition as the active mass, for use in rechargeable electrochemical cells with enhanced cycle life is described. The electrode active mass comprises a source of electrochemically active zinc and at least one fatty acid or a salt, ester or derivative thereof, or an alkyl sulfonic acid or a salt ester or derivative thereof. The zinc electrode is assumed to exhibit low shape change and decreased dendrite formation compared to known zinc electrodes, resulting in electrochemical cells which have improved capacity retention over a number of charge/discharge cycles.Type: GrantFiled: September 21, 2010Date of Patent: January 29, 2013Assignee: Anzode, Inc.Inventors: Simon Berners Hall, Jinrong Liu
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Publication number: 20110255061Abstract: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that have base-reactive groups. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.Type: ApplicationFiled: December 13, 2010Publication date: October 20, 2011Applicant: Rohm and Haas Electronic Materials, L.L.C.Inventors: Deyan Wang, Jinrong Liu, Cong Liu, Doris Kang, Anthony Zampini, Cheng-Bai Xu
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Publication number: 20110012055Abstract: A composition, method of its preparation, and zinc electrodes comprising the composition as the active mass, for use in rechargeable electrochemical cells with enhanced cycle life is described. The electrode active mass comprises a source of electrochemically active zinc and at least one fatty acid or a salt, ester or derivative thereof, or an alkyl sulfonic acid or a salt ester or derivative thereof. The zinc electrode is assumed to exhibit low shape change and decreased dendrite formation compared to known zinc electrodes, resulting in electrochemical cells which have improved capacity retention over a number of charge/discharge cycles.Type: ApplicationFiled: September 21, 2010Publication date: January 20, 2011Applicant: Anzode, Inc.Inventors: Simon Berners Hall, Jinrong Liu
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Patent number: 7811704Abstract: A composition, method of its preparation, and zinc electrodes comprising the composition as the active mass, for use in rechargeable electrochemical cells with enhanced cycle life is described. The electrode active mass comprises a source of electrochemically active zinc and at least one fatty acid or a salt, ester or derivative thereof, or an alkyl sulfonic acid or a salt ester or derivative thereof. The zinc electrode is assumed to exhibit low shape change and decreased dendrite formation compared to known zinc electrodes, resulting in electrochemical cells which have improved capacity retention over a number of charge/discharge cycles.Type: GrantFiled: September 15, 2003Date of Patent: October 12, 2010Assignee: Massey UniversityInventors: Simon Berners Hall, Jinrong Liu
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Publication number: 20050026038Abstract: A composition, method of its preparation, and zinc electrodes comprising the composition as the active mass, for use in rechargeable electrochemical cells with enhanced cycle life is described. The electrode active mass comprises a source of electrochemically active zinc and at least one fatty acid or a salt, ester or derivative thereof, or an alkyl sulfonic acid or a salt ester or derivative thereof. The zinc electrode is assumed to exhibit low shape change and decreased dendrite formation compared to known zinc electrodes, resulting in electrochemical cells which have improved capacity retention over a number of charge/discharge cycles.Type: ApplicationFiled: September 15, 2003Publication date: February 3, 2005Inventors: Simon Hall, Jinrong Liu