Abstract: The present disclosure relates to targeted genome editing in eukaryotic cells or organisms. More particularly, the present disclosure provides for compositions and methods that may induce modifications in target endogenous nucleic acid sequences in nucleuses of eukaryotic cells. For example, disclosed herein is a system for inducing targeted disruption of endogenous genes in a eukaryotic cell, the system comprising: an extracellular Cas9/RNA complex; cell-free and a buffer; wherein the extracellular Cas9/RNA complex comprises: a recombinant Cas9; and a guide RNA having a CRISPR RNA (crRNA) and a transactivating crRNA (tracrRNA); wherein the extracellular Cas9/RNA complex is disposed in the cell-free buffer and wherein the extracellular Cas9/RNA complex is complexed prior to being introduced into the eukaryotic cell; and wherein the Cas9/RNA complex functions as an endonuclease that induces targeted disruption of the target DNA upon introduction into the eukaryotic cell.

Abstract: The present disclosure relates to targeted genome editing in eukaryotic cells or organisms. More particularly, the present disclosure provides for compositions and methods that may induce modifications in target endogenous nucleic acid sequences in nucleuses of eukaryotic cells.

Abstract: A display device includes a first electrode disposed on a substrate; a light emitting element disposed on the first electrode, the light emitting element being electrically connected to the first electrode; a second electrode disposed on the light emitting element, the second electrode being electrically connected to the light emitting element; a meta structure disposed on the second electrode, the meta structure overlapping the light emitting element; and a bank pattern disposed on the substrate, the bank pattern being spaced apart from the light emitting element.

Abstract: The present invention relates to an image encoding/decoding method and device. The image decoding method according to the present invention comprises the steps of: decoding a prediction mode index; determining whether the prediction mode index indicates function-based intra prediction; inducing a parameter(s) for generating a function, when the prediction mode index indicates the function-based intra prediction; generating the function on the basis of the induced parameter(s); and performing intra prediction by using the generated function.

Abstract: A method of designing a silencer by using an acoustic metamaterial according to the present disclosure includes distributing design variables through an experimental design method, performing optimal design on initial design proposals, obtaining an insertion loss of an optimal unit cell, and selecting a unit cell to be used first for effective noise reduction.

Abstract: This application relates to a pellicle for extreme ultraviolet lithography and a manufacturing method thereof using the low-temperature direct growth method of multilayer graphene. In one aspect, the method includes forming an etch stopper on a substrate, forming a seed layer on the etch stopper, the seed layer including at least one of amorphous boron, BN, BCN, B4C, or Me-X (Me is at least one of Si, Ti, Mo, or Zr, and X is at least one of B, C, or N). The method may also include forming a metal catalyst layer on the seed layer; forming an amorphous carbon layer on the metal catalyst layer, and directly growing multilayer graphene on the seed layer through interlayer exchange between the metal catalyst layer and the amorphous carbon layer by performing a low-temperature heat treatment at 450° C. to 600° C.

Abstract: In accordance with an embodiment, a noise reduction device includes a housing; and a slit located inside the housing and having a unit cell located therein, the unit cell comprising a sound absorbing layer configured to absorb noise generated from a sound source inside the housing, and a meta-material panel layer located on one surface of the sound absorbing layer, the meta-material panel layer comprising a sound meta-material.

Abstract: An electronic device and a method of making an electronic device. As non-limiting examples, various aspects of this disclosure provide various methods of making electronic devices, and electronic devices manufactured thereby, that comprise utilizing a compressed interconnection structure (e.g., a compressed solder ball, etc.) in an encapsulating process to form an aperture in an encapsulant. The compressed interconnection structure may then be reformed in the aperture.

Abstract: The present invention relates to a method and apparatus for encoding and decoding a video image based on transform. The method for decoding a video includes: determining a transform mode of a current block; inverse-transforming residual data of the current block according to the transform mode of the current block; and rearranging the inverse-transformed residual data of the current block according to the transform mode of the current block, wherein the transform mode includes at least one of SDST (Shuffling Discrete Sine Transform), SDCT (Shuffling Discrete cosine Transform), DST (Discrete Sine Transform) or DCT (Discrete Cosine Transform).

Abstract: The present invention relates to an image encoding/decoding method and apparatus. An image encoding method according to the present invention may comprise generating a transform block by performing at least one of transform and quantization; grouping at least one coefficient included in the transform block into at least one coefficient group (CG); scanning at least one coefficient included in the coefficient group; and encoding the at least one coefficient.

Abstract: Disclosed are a method of manufacturing a carbon support for a fuel cell catalyst, a carbon support for a fuel cell catalyst manufactured according to the method, and a catalyst for a fuel cell including the same. The method may include using various organic materials containing N and various carbon supports and thus provide excellent economic feasibility. In addition, pyridinic N and pyrrolic N of doped N can be adjusted at an optimal content ratio so that the carbon support for a fuel cell catalyst manufactured and the catalyst for a fuel cell including the same have excellent electrochemical resistance and excellent electrochemical characteristic due to an increase in an electrochemically active surface area, and excellent durability due to an increase in thermal durability.

Abstract: This application relates to a pellicle for extreme ultraviolet lithography based on yttrium (Y) and used in a lithography process using extreme ultraviolet rays. In one aspect, the pellicle includes a pellicle layer including a core layer formed of an yttrium-based material expressed as Y-M (M is one of B, Si, O, or F).

Abstract: The present disclosure relates to targeted genome editing in eukaryotic cells or organisms. More particularly, the present disclosure provides for compositions and methods that may induce modifications in target endogenous nucleic acid sequences in nucleuses of eukaryotic cells.

Abstract: Provided is a dehumidifying kit installed on a drying apparatus that operates an inside drying function when a door is closed and an outside dehumidifying function when the door is open through a suction port and an exhaust port that are provided inside, wherein an opening part of the drying apparatus is partitioned as an opening inlet and an opening outlet, an inner space of the drying apparatus is partitioned as an external air suction flow path from the opening inlet to the suction port and a dry air discharge flow path from the exhaust port to the opening outlet.

Abstract: A method of fabricating a deposition mask includes forming a wrinkle pattern in a mask rib region and including grooves by partially etching a front surface of a silicon substrate, forming a first photoresist pattern including first openings on a front surface of the silicon substrate in each of cell areas, growing a first plating film covering the grooves of the wrinkle pattern and a second plating film covering first openings of the first photoresist pattern, removing the first photoresist pattern, forming a second photoresist pattern in outer frame areas on a rear surface of the silicon substrate, and exposing a rear surface of metal mask ribs formed with the first plating film and a rear surface of a mask membrane formed with the second plating film by partially etching the rear surface of the silicon substrate using the second photoresist pattern.

Abstract: A substrate processing apparatus is provided and includes: a support unit including a spin chuck and a centering jig that is on the spin chuck, the spin chuck configured to support and rotate a substrate; a spraying unit configured to spray processing liquid onto the substrate; a swing arm including a correction unit that includes a sensor and an emitter, the swing arm configured to move such that the correction unit moves to a target point on the substrate, and the emitter configured to irradiate a beam towards the substrate; and a controller configured to: control the spin chuck and the swing arm; and determine whether a movement trajectory of the swing arm is aligned with a rotation center of the spin chuck based on information acquired by the sensor about the centering jig.

Abstract: Provided is a control device and a substrate processing apparatus including the same. The substrate processing apparatus includes a support unit configured to support and rotate a first substrate, the support unit including a spin chuck, a spray unit configured to spray a processing fluid on the first substrate, a correction unit on a swing arm and configured to irradiate a beam onto the first substrate when the processing fluid is provided on the first substrate, wherein the swing arm is adjacent to the spin chuck and is configured to move the correction unit to a target point on the first substrate, and a controller configured to control the spin chuck and the swing arm, and correct a position error of the swing arm using a second substrate, wherein a plurality of anchor patterns are on the second substrate.

Abstract: A method for manufacturing a deposition mask includes depositing a seed metal layer on a front surface of a silicon substrate, forming a first photoresist pattern defining first openings on the seed metal layer, growing a plating layer in the first openings of the first photoresist pattern, forming a mask membrane by removing the first photoresist pattern and leaving the plating layer, depositing a protection layer to cover a front surface of the mask membrane, forming a second photoresist pattern defining cell opening corresponding to unit masks, respectively, on a back surface of the silicon substrate, exposing the seed metal layer by etching the back surface of the silicon substrate using the second photoresist pattern as a mask, exposing a back surface of the mask membrane by etching the seed metal layer using the second photoresist pattern as a mask, and removing the protection layer.

Abstract: A control device and a substrate processing apparatus including the same are provided. The substrate processing apparatus includes: a support unit including a spin head and configured to support and to rotate a substrate; a spraying unit configured to spray processing liquid onto the substrate; a correction unit in a swing arm, the correction unit configured to move to a target point on the substrate and to irradiate a beam when the processing liquid is sprayed onto the substrate; and a control unit configured to calculate the target point, wherein the control unit is configured to convert image coordinates associated with a first coordinate system and then to calculate the target point by converting the image coordinates associated with the first coordinate system into image coordinates associated with a second coordinate system, and the second coordinate system is based on rotation angles of the spin head and the swing arm.

Abstract: The present disclosure relates to targeted genome editing in eukaryotic cells or organisms. More particularly, the present disclosure provides for compositions that may induce modifications in target endogenous nucleic acid sequences in nucleuses of eukaryotic cells. The composition may comprise a single-chain guide RNA (sgRNA) and a Streptococcus pyogenes Cas9 protein. In some embodiments, the sgRNA and the Cas9 protein may be present in a molar ratio ranging from 29:14.0 to 29:1.4.