Patents by Inventor Jinxin FU

Jinxin FU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12229940
    Abstract: Embodiments of the present disclosure relate to optical devices for augmented, virtual, and/or mixed reality applications. In one or more embodiments, an optical device metrology system is configured to measure a plurality of first metrics and one or more second metrics for optical devices, the one or more second metrics including a display leakage metric.
    Type: Grant
    Filed: October 4, 2021
    Date of Patent: February 18, 2025
    Assignee: Applied Materials, Inc.
    Inventors: Yangyang Sun, Jinxin Fu, Kazuya Daito, Ludovic Godet
  • Publication number: 20250053082
    Abstract: The present disclosure generally relates to methods of forming optical devices comprising nanostructures disposed on transparent substrates. A first process of forming the nanostructures comprises depositing a first layer of a first material on a glass substrate, forming one or more trenches in the first layer, and depositing a second layer of a second material in the one or more holes to trenches a first alternating layer of alternating first portions of the first material and second portions of the second material. The first process is repeated one or more times to form additional alternating layers over the first alternating layer. Each first portion of each alternating layer is disposed in contact with and offset a distance from an adjacent first portion in adjacent alternating layers. A second process comprises removing either the first or the second portions from each alternating layer to form the plurality of nanostructures.
    Type: Application
    Filed: October 31, 2024
    Publication date: February 13, 2025
    Inventors: Yongan XU, Jinxin FU, Jhenghan YANG, Ludovic GODET
  • Publication number: 20250053099
    Abstract: Embodiments described herein provide an asymmetric optical metrology system for evaluating and inspecting the performance of optical devices, such as augmented reality (AR) waveguide combiners. The system utilizes an asymmetric optical configuration and fly-eye illumination to enhance the detection limit of image sharpness and the accuracy of luminance uniformity. By employing different lenses with various focal lengths, the system increases the sampling rate in the angular space, addressing the challenges of form factor limitations and pixel density inherent in conventional metrology tools. Embodiments described herein offer improved contrast and sharp image details, as well as a compact design, making it suitable for the development, optimization, and quality control of optical devices, such as AR waveguide combiners.
    Type: Application
    Filed: August 8, 2024
    Publication date: February 13, 2025
    Inventors: Yangyang SUN, Jinxin FU, Sihui HE, Ludovic GODET
  • Publication number: 20250054171
    Abstract: Embodiments herein provide for a method of determining an optical device modulation transfer function (MTF). The method described herein includes projecting a first instance of an image from a light engine to a detector. The first instance of the image is analyzed to determine a first function. A first fast Fourier transform (FFT) or a first MTF of the first function is obtained. The method further includes projecting a second instance of the image from the light engine to detector via one or more optical devices. The second instance of the image is analyzed to determine a second function. A second FFT or a second MTF is obtained of the second function. An optical device MTF of the one or more optical devices is determined by comparing the first FFT and the second FFT or by comparing the first MTF and the second MTF.
    Type: Application
    Filed: October 29, 2024
    Publication date: February 13, 2025
    Inventors: Jinxin FU, Yangyang SUN, Ludovic GODET
  • Publication number: 20250046026
    Abstract: The present disclosure relates to augmented reality devices and related methods. The augmented reality devices include a projection system. The projection system includes a projector including a major axis. The projected is configured to project an image along the major axis. A prism is configured to refract the image. The image includes a first spectrum, a second spectrum, and a third spectrum. A waveguide is disposed at a wrap angle from a plane formed from the major axis of the projector. The waveguide includes an input coupler, and an output coupler.
    Type: Application
    Filed: August 2, 2024
    Publication date: February 6, 2025
    Inventors: David Alexander SELL, Sihui HE, Kevin MESSER, Kunal SHASTRI, Jinxin FU, Samarth BHARGAVA
  • Patent number: 12203747
    Abstract: Embodiments described herein provide for devices and methods of measuring a pitch P of optical device structures and an orientation angle ? of the optical device structures. One embodiment of the system includes an optical arm coupled to an arm actuator. The optical arm includes a light source. The light source emits a light path operable to be diffracted to the stage. The optical arm further includes a first beam splitter and a second beam splitter positioned in the light path. The first beam splitter directs the light path through a first lens and the second beam splitter directs the light path through a first dove prism and a second lens. The optical arm further includes a first detector operable to detect the light path from the first lens and second detector operable to detect the light path from the second lens.
    Type: Grant
    Filed: January 9, 2024
    Date of Patent: January 21, 2025
    Assignee: Applied Materials, Inc.
    Inventors: Yangyang Sun, Jinxin Fu, Ludovic Godet
  • Publication number: 20250020921
    Abstract: Embodiments described herein relate to an augmented reality (AR) system. The AR system includes a projection system and an optical device. The projection system includes a backlight, a lens, and an illumination system. The illumination system is configured to receive light from the backlight and emit light having a first color trend. The light having a first color trend is emitted through the lens towards the optical device. The optical device is configured to form a second color trend. The second color trend is opposite the first color trend.
    Type: Application
    Filed: July 10, 2024
    Publication date: January 16, 2025
    Inventors: Jinxin FU, Sihui HE
  • Patent number: 12165341
    Abstract: Embodiments herein provide for a method of determining an optical device modulation transfer function (MTF). The method described herein includes projecting a baseline image of a pattern from a light engine to a detector. The baseline image is analyzed to determine a baseline function. A baseline fast Fourier transform (FFT) or a baseline MTF of the baseline function is obtained. The method further includes projecting an image of the pattern from the light engine to one or more optical devices. The pattern is outcoupled from the one or more optical devices to the detector. The image is analyzed to determine a function. A function FFT or a function MTF is obtained corresponding to the image. An optical device MTF of the one or more optical devices is determined by comparing the baseline FFT and the function FFT determined by analyzing the image or by comparing the baseline MTF and the function MTF determined by analyzing the image.
    Type: Grant
    Filed: November 23, 2021
    Date of Patent: December 10, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Jinxin Fu, Yangyang Sun, Ludovic Godet
  • Patent number: 12159392
    Abstract: Embodiments of the present disclosure include a die system and a method of comparing alignment vectors. The die system includes a plurality of dies arranged in a desired pattern. An alignment vector, such as a die vector, can be determined from edge features of the die. The alignment vectors can be compared to other dies or die patterns in the same system. A method of comparing dies and die patterns includes comparing die vectors and/or pattern vectors. The comparison between alignment vectors allows for fixing the die patterns for the next round of processing. The methods provided allow accurate comparisons between as-deposited edge features, such that accurate stitching of dies can be achieved.
    Type: Grant
    Filed: September 14, 2020
    Date of Patent: December 3, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Yongan Xu, Chan Juan Xing, Jinxin Fu, Yifei Wang, Ludovic Godet
  • Patent number: 12153344
    Abstract: The present disclosure generally relates to methods of forming optical devices comprising nanostructures disposed on transparent substrates. A first process of forming the nanostructures comprises depositing a first layer of a first material on a glass substrate, forming one or more trenches in the first layer, and depositing a second layer of a second material in the one or more holes to trenches a first alternating layer of alternating first portions of the first material and second portions of the second material. The first process is repeated one or more times to form additional alternating layers over the first alternating layer. Each first portion of each alternating layer is disposed in contact with and offset a distance from an adjacent first portion in adjacent alternating layers. A second process comprises removing either the first or the second portions from each alternating layer to form the plurality of nanostructures.
    Type: Grant
    Filed: September 1, 2023
    Date of Patent: November 26, 2024
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Yongan Xu, Jinxin Fu, Jhenghan Yang, Ludovic Godet
  • Publication number: 20240385075
    Abstract: Embodiments described herein provide for light engines of a measurement system and methods of using the light engines. The measurement system includes a light engine operable to illuminate a first grating of an optical device. The light engine projects a pattern with a light from a light engine. The light engine projects a pattern to the first grating such that a metrology metric may be extracted from one or more images captured by a detector of the measurement system. The metrology metrics are extracted by processing the image. The metrology metrics determine if the optical device meets image quality standards.
    Type: Application
    Filed: May 17, 2024
    Publication date: November 21, 2024
    Inventors: Yangyang SUN, Jinxin FU, Kazuya DAITO, Ludovic GODET
  • Patent number: 12140494
    Abstract: A method of optical device metrology is provided. The method includes introducing a first type of light into a first optical device during a first time period, the first optical device including an optical substrate and an optical film disposed on the optical substrate, the first optical device further including a first surface, a second surface, and one or more sides connecting the first surface with the second surface; and measuring, during the first time period, a quantity of the first type of light transmitted from a plurality of locations on the first surface or the second surface during the first time period, wherein the measuring is performed by a detector coupled to one or more fiber heads positioned to collect the light transmitted from the plurality of locations.
    Type: Grant
    Filed: December 27, 2023
    Date of Patent: November 12, 2024
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Jinxin Fu, Kang Luo, Fariah Hayee, Ludovic Godet
  • Publication number: 20240329322
    Abstract: Embodiments described herein relate to improved waveguides with materials layers improving the optical properties of one or more surface regions of waveguides and methods of forming the same. In one embodiment, a waveguide is provided. The waveguide including a substrate, a grating disposed in or on the substrate, the grating comprising a plurality of structures defined by a plurality of trenches, a layer of silicon oxide or aluminum oxide disposed over the structures on the substrate. The layer is disposed over sidewalls and top surfaces of the structures, and a bottom surface of the trenches. The waveguide further includes a high index layer disposed over the layer. The high index layer is disposed over the sidewalls and the top surfaces of the structures, and the bottom surface of the trenches with the layer disposed in between the structures and the high index layer.
    Type: Application
    Filed: April 3, 2024
    Publication date: October 3, 2024
    Inventors: Jinyu LU, Ludovic Godet, Jinxin FU, Kenichi OHNO, Shangyi Chen, Takashi KURATOMI, Erica CHEN, Rami HURARNI, Yangyang SUN
  • Publication number: 20240310639
    Abstract: Metrology tools and methods of obtaining a full-field optical field of an optical device to determine multiple metrology metrics of the optical device are provided. A metrology tool is utilized to split a light beam into a first light path and a second light path. The first light path and the second light path are combined into a combined light beam and delivered to the detector. The detector measures the intensity of the combined light beam. A first equation and second equation are utilized in combination with the intensity measurements to determine an amplitude and phase ? at a reference point directly adjacent to a second surface of the at least one optical device.
    Type: Application
    Filed: May 28, 2024
    Publication date: September 19, 2024
    Inventors: Yangyang SUN, Jinxin FU, Ludovic GODET
  • Patent number: 12085475
    Abstract: A method and apparatus for determining a line angle and a line angle rotation of a grating or line feature is disclosed. An aspect of the present disclosure involves, measuring coordinate points of a first line feature using a measurement tool, determining a first slope of the first line feature from the coordinate points, and determining a first line angle from the slope of the first line feature. This process can be repeated to find a second slope of a second line feature that is adjacent to the first line feature. The slope of the first and second line features can be compared to find a line angle rotation. The line angle rotation is compared to a design specification and a stitch quality is determined.
    Type: Grant
    Filed: December 14, 2020
    Date of Patent: September 10, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Yongan Xu, Chan Juan Xing, Jinxin Fu, Ludovic Godet
  • Patent number: 12050327
    Abstract: An imaging system and a method of manufacturing a metalens array is provided. The imaging system includes a metalens array, and light scattered from an object is split by the metalens array, such that an image is formed in front of an observer. The metalens array is at least partially transparent to visible light, so that the observer can also see the environment. The method of manufacturing the metalens array includes bonding together a plurality of substrates, and dicing the plurality of substrates into metalens arrays. The metalens arrays can be used in the imaging system.
    Type: Grant
    Filed: August 9, 2019
    Date of Patent: July 30, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Jinxin Fu, Tapashree Roy, Ludovic Godet, Wayne McMillan, Robert J Visser
  • Patent number: 12021102
    Abstract: An imaging system and a method of creating composite images are provided. The imaging system includes one or more lens assemblies coupled to a sensor. When reflected light from an object enters the imaging system, incident light on the metalens filter systems creates filtered light, which is turned into composite images by the corresponding sensors. Each metalens filter system focuses the light into a specific wavelength, creating the metalens images. The metalens images are sent to the processor, wherein the processor combines the metalens images into one or more composite images. The metalens images are combined into a composite image, and the composite image has reduced chromatic aberrations.
    Type: Grant
    Filed: March 17, 2023
    Date of Patent: June 25, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Jinxin Fu, Yongan Xu, Ludovic Godet, Naamah Argaman, Robert Jan Visser
  • Patent number: 12019242
    Abstract: Embodiments described herein provide for metrology tools and methods of obtaining a full-field optical field of an optical device to determine multiple metrology metrics of the optical device. A metrology tool is utilized to split a light beam into a first light path and a second light path. The first light path and the second light path are combined into a combined light beam and delivered to the detector. The detector measures the intensity of the combined light beam. A first equation and second equation are utilized in combination with the intensity measurements to determine an amplitude and phase ? at a reference point directly adjacent to a second surface of the at least one optical device.
    Type: Grant
    Filed: July 28, 2022
    Date of Patent: June 25, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Yangyang Sun, Jinxin Fu, Ludovic Godet
  • Patent number: 12003841
    Abstract: Embodiments described herein relate to an inspection system for illumination of optical devices. The inspection system includes a stage, a focusing lens, a light source, a reflective surface, and a camera. The inspection system is operable to provide a light to a substrate. The substrate is positioned on the inspection system such that an edge of the substrate is exposed. The inspection system focuses light to the edge such that the light propagates through the substrate. The light is coupled out of the substrate, illuminating one or more optical devices disposed on the substrate. The illumination allows the camera to capture images to be inspected. The images are inspected to detect defects of the substrate.
    Type: Grant
    Filed: May 4, 2022
    Date of Patent: June 4, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Michael David-Scott Kemp, Jinxin Fu
  • Patent number: 11988574
    Abstract: Embodiments described herein provide for light engines of a measurement system and methods of using the light engines. The measurement system includes a light engine operable to illuminate a first grating of an optical device. The light engine projects a pattern with a light from a light engine. The light engine projects a pattern to the first grating such that a metrology metric may be extracted from one or more images captured by a detector of the measurement system. The metrology metrics are extracted by processing the image. The metrology metrics determine if the optical device meets image quality standards.
    Type: Grant
    Filed: November 23, 2021
    Date of Patent: May 21, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Yangyang Sun, Jinxin Fu, Kazuya Daito, Ludovic Godet