Patents by Inventor Jinyan Song

Jinyan Song has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System and method for tilt calculation based on overlay metrology measurements
    Patent number: 11360398
    Abstract: A metrology system includes a controller communicatively coupled to one or more metrology tools. In another embodiment, the controller includes one or more processors configured to execute program instructions causing the one or more processors to receive one or more overlay metrology measurements of one or more metrology targets of the metrology sample from the one or more metrology tools; determine tilt from the one or more measurement overlay measurements; and determine one or more correctables for at least one of one or more lithography tools or the one or more metrology tools to adjust for the tilt, where the one or more correctables are configured to reduce an amount of tilt in the sample or overlay inaccuracy of the one or more overlay metrology measurements. The program instructions further cause the one or more processors to predict tilt with a simulator based on at least the determined tilt.
    Type: Grant
    Filed: November 2, 2020
    Date of Patent: June 14, 2022
    Assignee: KLA Corporation
    Inventors: Roie Volkovich, Paul MacDonald, Ady Levy, Jincheng Pei, Jinyan Song, Amnon Manassen
  • SYSTEM AND METHOD FOR TILT CALCULATION BASED ON OVERLAY METROLOGY MEASUREMENTS
    Publication number: 20210149313
    Abstract: A metrology system includes a controller communicatively coupled to one or more metrology tools. In another embodiment, the controller includes one or more processors configured to execute program instructions causing the one or more processors to receive one or more overlay metrology measurements of one or more metrology targets of the metrology sample from the one or more metrology tools; determine tilt from the one or more measurement overlay measurements; and determine one or more correctables for at least one of one or more lithography tools or the one or more metrology tools to adjust for the tilt, where the one or more correctables are configured to reduce an amount of tilt in the sample or overlay inaccuracy of the one or more overlay metrology measurements. The program instructions further cause the one or more processors to predict tilt with a simulator based on at least the determined tilt.
    Type: Application
    Filed: November 2, 2020
    Publication date: May 20, 2021
    Applicant: KLA Corporation
    Inventors: Roie Volkovich, Paul MacDonald, Ady Levy, Jincheng Pei, Jinyan Song, Amnon Manassen