Patents by Inventor Jiqun Shao

Jiqun Shao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Optical recording article
    Patent number: 7161894
    Abstract: Optical recording articles, such as tapes, and methods of making and using such articles are disclosed.
    Type: Grant
    Filed: June 21, 2001
    Date of Patent: January 9, 2007
    Assignee: Quantum Corporation
    Inventors: John S. Judge, Jiqun Shao, Warren W. Goller
  • Optical recording article
    Publication number: 20030016619
    Abstract: Optical recording articles, such as tapes, and methods of making and using such articles are disclosed.
    Type: Application
    Filed: June 21, 2001
    Publication date: January 23, 2003
    Inventors: John S. Judge, Jiqun Shao, Warren W. Goller
  • Plasma immersion implantation with pulsed anode
    Patent number: 5911832
    Abstract: Method and apparatus for treating a workpiece implantation surface by causing ions to impact the workpiece implantation surface. An implantation chamber defines a chamber interior into which one or more workpieces can be inserted and includes a conductive inner wall portion in proximity to the chamber interior. A conductive workpiece support extends into an interior region of the implantation chamber. A conductive electrode is disposed within said implantation chamber relative to said conductive workpiece support to allow workpieces to be placed on the workpiece support in a region between the support and the conductive electrode. Gas molecules are injected into the implantation chamber to cause the gas molecules to occupy a region of the implantation chamber in close proximity to the one or more workpieces. The gas molecules are ionized near an implant surface of the workpieces.
    Type: Grant
    Filed: January 9, 1997
    Date of Patent: June 15, 1999
    Assignee: Eaton Corporation
    Inventors: A. Stuart Denholm, Jiqun Shao
  • Pulsed plate plasma implantation system and method
    Patent number: 5654043
    Abstract: Method and apparatus for treating a workpiece implantation surface by causing ions to impact the workpiece implantation surface. An implantation chamber defines a chamber interior into which one or more workpieces can be inserted. A support positions one or more workpieces within an interior region of the implantation chamber so that implantation surfaces of the workpieces are facing the interior region. A dopant material in the form of a gas is injected into the implantation chamber to cause the gas to occupy a region of the implantation chamber in close proximity to the one or more workpieces. A plasma of implantation material is created within the interior region of the implantation chamber. First and second conductive electrodes positioned within the implantation chamber include conductive surfaces in proximity to the chamber interior occupied by the one or more workpieces. A voltage source outside the chamber relatively biases the first and second conductive electrodes.
    Type: Grant
    Filed: October 10, 1996
    Date of Patent: August 5, 1997
    Assignee: Eaton Corporation
    Inventors: Jiqun Shao, A. Stuart Denholm