Patents by Inventor Jiri Hykl

Jiri Hykl has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PROCESS FOR MAKING ANASTROZOLE
    Publication number: 20080076933
    Abstract: A process for making anastrozole using a 1-substituted triazole can reduce formation of the undesired iso-anastrozole. A typical process is represented by wherein compound (10) is a 1-substituted triazole and compound (1) is anastrozole.
    Type: Application
    Filed: September 21, 2007
    Publication date: March 27, 2008
    Inventors: Michal Benes, Zdenek Prosek, Jiri Hykl, Jaroslav Pis
  • Process for making ondansetron and intermediates thereof
    Patent number: 7041834
    Abstract: A process useful for making ondansetron that comprises reacting a carbazolone in a reaction mixture comprising a carbazolone of formula (2), a formaldehyde or precursor thereof, and an amine of formula (3) in a non-aqueous polar solvent and in the presence of a water binding agent. The reaction product(s) can be reacted with an amine of formula (5) to form ondansetron.
    Type: Grant
    Filed: January 23, 2004
    Date of Patent: May 9, 2006
    Assignee: Synthon IP Inc.
    Inventors: Dusan Hesoun, Jiri Hykl
  • Process for making ondansetron and intermediates thereof
    Publication number: 20040181076
    Abstract: A process useful for making ondansetron that comprises reacting a carbazolone in a reaction mixture comprising a carbazolone of formula (2), a formaldehyde or precursor thereof, and an amine of formula (3) in a non-aqueous polar solvent and in the presence of a water binding agent. The reaction product(s) can be reacted with an amine of formula (5) to form ondansetron. The water binding agent can improve the yield and/or speed of the reaction.
    Type: Application
    Filed: January 23, 2004
    Publication date: September 16, 2004
    Inventors: Dusan Hesoun, Jiri Hykl