Abstract: A light-emitting device with high luminance which has high uniformity in color and intensity can be provided. The light-emitting device includes a mounting substrate, a plurality of light-emitting elements disposed on the mounting substrate side by side, a wavelength conversion plate provided over the plurality of light-emitting elements and having a side surface, and a plurality of bumps disposed on the mounting substrate to abut against the side surface of the wavelength conversion plate, so as to determine a position of the wavelength conversion plate.

Abstract: A light-emitting device with high luminance which has high uniformity in color and intensity can be provided. The light-emitting device includes a mounting substrate, a plurality of light-emitting elements disposed on the mounting substrate side by side, a wavelength conversion plate provided over the plurality of light-emitting elements and having a side surface, and a plurality of bumps disposed on the mounting substrate to abut against the side surface of the wavelength conversion plate, so as to determine a position of the wavelength conversion plate.

Abstract: A semiconductor light-emitting device includes a support body multiple, multiple light-emitting elements arranged in a matrix on the support body, a transparent resin layer provided on the light-emitting elements, multiple transparent plates provided on the transparent resin layer, each of the transparent plates being provided over one of the multiple light-emitting elements, and multiple optical shield layers each provided at one of a first side face of a first one of the transparent plates and a second the face of a second one of the transparent plates opposing the first the face of the first transparent plate.

Abstract: A semiconductor light-emitting device includes a support body multiple, multiple light-emitting elements arranged in a matrix on the support body, a transparent resin layer provided on the light-emitting elements, multiple transparent plates provided on the transparent resin layer, each of the transparent plates being provided over one of the multiple light-emitting elements, and multiple optical shield layers each provided at one of a first side face of a first one of the transparent plates and a second the face of a second one of the transparent plates opposing the first the face of the first transparent plate.

Abstract: A manufacturing method of a semiconductor light emitting element, includes forming sacrifice portions within the width of street portions in a semiconductor laminated body, and performing wet etching to remove the sacrifice portions together with their neighboring portions, thereby removing etching residuals in the streets.

Abstract: A semiconductor light emitting element wherein the heat radiation-ability of the entire element and heat concentration in the element surface are improved and wherein thus element characteristics such as luminous efficiency, in-plane uniformity of the luminous efficiency, and reliability are improved. Its support substrate, on which a semiconductor film having a first electrode formed thereon is placed, has a highly thermal conductive portion of higher thermal conductivity than the support substrate embedded extending from the back surface of the support substrate into the inside, and the highly thermal conductive portion has a cross-sectional shape corresponding to the shape of the first electrode in a plane parallel to the semiconductor film and is provided aligned with the first electrode along a direction parallel to and a direction perpendicular to the semiconductor film.

Abstract: A semiconductor light emitting element comprising a light-reflecting layer formed on a support substrate, the light-reflecting layer having light reflectivity and including a bank portion having a particular plane pattern, a first electrode formed on the light-reflecting layer so as to surround the bank portion of the light-reflecting layer, the first electrode having light transparency, a stacked semiconductor layer formed on the first electrode, the stacked semiconductor layer, and a second electrode selectively formed on the stacked semiconductor layer, wherein the bank portion of the light-reflecting layer has a portion that overlaps the second electrode when viewed in plan, a portion that rises up from the first electrode when viewed in cross section, and a side wall surface that reflects light emitted from the active layer to a region of the second semiconductor layer in which the second electrode is not formed.

Abstract: A manufacturing method of a semiconductor light emitting element, includes forming sacrifice portions within the width of street portions in a semiconductor laminated body, and performing wet etching to remove the sacrifice portions together with their neighboring portions, thereby removing etching residuals in the streets.

Abstract: A cavity-containing layer having a plurality of cavities is formed on a growth substrate by carrying out in alternating fashion a plurality of cycles of a first and second growth steps of growing a group III nitride at growth rates different from each other. The semiconductor epitaxial layer is subsequently formed on the cavity-containing layer, after which a support substrate is bonded to the semiconductor epitaxial layer. The growth substrate is separated from the cavity-containing layer.

Abstract: A plurality of protrusions is formed on the C-plane substrate with a corundum structure. A base film made of a III-V compound semiconductor including Ga and N is formed on the surface of the substrate. The surface of the base film is flatter than the surface of the substrate. A light emitting structure including Ga and N is disposed on the base film. The protrusions are regularly arranged in a first direction that is tilted by less than 15 degrees with respect to the a-axis of the base film and in a second direction that is orthogonal to the first direction. Each protrusion has two first parallel sides tilted by less than 15 degrees relative to an m-axis and two second parallel sides tilted by less than 15 degrees relative to the a-axis. An interval between the two second sides is wider than an interval between the two first sides.

Abstract: There is provided a method for manufacturing a semiconductor device in which a selective growth mask for partially covering a growth substrate is formed on a growth substrate; a buffer layer that is thicker than the mask is formed on a non-mask part not covered by the mask on the growth substrate, and a predetermined facet is exposed on the surface of the buffer layer; a semiconductor film is laterally grown using the buffer layer as a starting point, and a lateral growth layer for covering the mask is formed while cavities are formed on the upper part of the mask; and a device function layer is epitaxially grown on the lateral growth layer. The cavity formation step includes a first step for growing a semiconductor film at a growth rate and a second step for growing another semiconductor film at another growth rate mutually different from the first growth rate, wherein the first and second steps are carried out a plurality of times in alternating fashion.

Abstract: A plurality of protrusions is formed on the C-plane substrate with a corundum structure. A base film made of a III-V compound semiconductor including Ga and N is formed on the surface of the substrate. The surface of the base film is flatter than the surface of the substrate. A light emitting structure including Ga and N is disposed on the base film. The protrusions are regularly arranged in a first direction that is tilted by less than 15 degrees with respect to the a-axis of the base film and in a second direction that is orthogonal to the first direction. Each protrusion has two first parallel sides tilted by less than 15 degrees relative to an m-axis and two second parallel sides tilted by less than 15 degrees relative to the a-axis. An interval between the two second sides is wider than an interval between the two first sides.

Abstract: A cavity-containing layer having a plurality of cavities is formed on a growth substrate by carrying out in alternating fashion a plurality of cycles of a first and second growth steps of growing a group III nitride at growth rates different from each other. The semiconductor epitaxial layer is subsequently formed on the cavity-containing layer, after which a support substrate is bonded to the semiconductor epitaxial layer. The growth substrate is separated from the cavity-containing layer.

Abstract: There is provided a method for manufacturing a semiconductor device in which a selective growth mask for partially covering a growth substrate is formed on a growth substrate; a buffer layer that is thicker than the mask is formed on a non-mask part not covered by the mask on the growth substrate, and a predetermined facet is exposed on the surface of the buffer layer; a semiconductor film is laterally grown using the buffer layer as a starting point, and a lateral growth layer for covering the mask is formed while cavities are formed on the upper part of the mask; and a device function layer is epitaxially grown on the lateral growth layer. The cavity formation step includes a first step for growing a semiconductor film at a growth rate and a second step for growing another semiconductor film at another growth rate mutually different from the first growth rate, wherein the first and second steps are carried out a plurality of times in alternating fashion.