Abstract: To provide a vacuum processing apparatus applicable to various manufacturing processes, by efficiently and highly reliably stacking films of various types and thicknesses and by downsizing the manufacturing apparatus by suppressing size increase of the apparatus due to increase of the number of film forming chambers caused by increase and complexity of process steps. A vacuum processing apparatus is provided with a plurality of film forming process parts which are provided with rotating transfer tables and film forming chambers. The rotating transfer tables form a transfer path for a work to be processed, in chambers which can be vacuum-exhausted. The film forming chambers are provided for depositing a film on the work to be processed which is arranged and transferred along a circumference which has a rotating shaft of the rotating transfer table as a center.

Abstract: To provide a vacuum treatment device capable of reducing the occurrence of the tilt and deformation of treated materials by suppressing the heating of a substrate by continuous spattering in a vacuum.

Abstract: To provide a vacuum processing apparatus applicable to various manufacturing processes, by efficiently and highly reliably stacking films of various types and thicknesses and by downsizing the manufacturing apparatus by suppressing size increase of the apparatus due to increase of the number of film forming chambers caused by increase and complexity of process steps. A vacuum processing apparatus is provided with a plurality of film forming process parts which are provided with rotating transfer tables and film forming chambers. The rotating transfer tables form a transfer path for a work to be processed, in chambers which can be vacuum-exhausted. The film forming chambers are provided for depositing a film on the work to be processed which is arranged and transferred along a circumference which has a rotating shaft of the rotating transfer table as a center.

Abstract: The invention provides a vacuum apparatus, which is equipped with a drive mechanism of small size and does not need a special mechanism for vacuum seals. This drive mechanism includes an air bag container 41 which is provided fixedly in an airtight vessel with one end open, an air bag 42 stored in the container, and a source for supplying high pressure gas penetrating through the air bag container 41. A part of the air bag 42 is projected from the open end of the air bag container 41 by supplying air bag 42 with a high pressure gas with a high pressure gas supply source 43, thereby moving objects in the vacuum vessel.

Abstract: The purpose of this invention is to provide a magnetron sputtering apparatus capable of attaching masks on disk substrates and capable of conducting sputtering while disk substrates are being rotated on a central axis without complicated mechanisms or complicated processes. For this purpose, in the sputtering apparatus of this invention, a magnetic field generating means is provided above a sputtering chamber 11 so as to apply magnetic field in the sputtering chamber 11 providing discharge space. A target 21 is arranged at an upper portion of sputtering chamber 11 so that the magnetic field by generated the magnetic field generating means is applied to the target. A disk transport chamber 12 is provided which is connected to the sputtering chamber 11 through an opening 32 formed in a bottom wall 30. In disk transport chamber 12, a disk pusher 34 is provided on which a disk substrate 31 is placed for depositing sputter film.

Abstract: An optical disc for use as a compact disc, an optical video disc, or the like has a disc substrate of a light-transmissive material such as polycarbonate, PMMA, or the like. The disc substrate has a pattern of pits and lands formed as representing an information signal on at least one surface thereof. A thin reflective layer of a-corrosion-resistant metallic material such as an alloy of Fe, Ni, and Co is deposited on the disc substrate over the pattern of pits and lands. The optical disc is relatively inexpensive to manufacture as no protective layer needs to be deposited on the reflective layer and is also highly resistant to loss of performance with aging because the reflective layer is made of a corrosion-resistant metallic material.

Abstract: An improved sputtering apparatus is provided which can judge whether or not a normal thin film has been satisfactorily deposited on the surface of a substrate to be processed in a film deposition apparatus. The judgment is made immediately after the sputtering process on the basis of the detection results of the pressure in a vacuum chamber and the waveform of discharge output power supplied from a discharge power source.

Abstract: A suction head having plural suction pads on both surfaces thereof is used to transfer a substrate of a compack disk and the like from one position to another for loading. The suction head is connected to a rotating shaft rotatable and movable in a vertical direction. The rotating shaft causes the suction head to turn over and move in an up-and-down direction. The suction pads on both surfaces of the suction head are connected to a pair of flexible pipes which are wound around the shaft and connected respectively to exhaust systems. Thus, the suction pads capture and release the substrate by suction control so as to load the same at a prescribed position. Further, a shock absorber is provided to relieve a shock upon the stoppage of the suction head in vertical and rotational reciprocating motions.

Abstract: A sucked substrate detecting apparatus is provided which comprises sucking pads for sucking disk substrates, a main pipe connected to the sucking pads, a vacuum pump connected through a first valve to the main pipe, first and second branch pipes connected respectively to the main pipe, a second valve connected to the first branch pipe, for opening and closing with respect to the atmosphere, a pressure sensor connected to the second branch pipe, for substantially detecting the pressure in the main pipe, and a controller connected to the first and second valves. The sucked substrate detecting apparatus can judge on the basis of the output levels produced from the pressure sensor, the presence or absence of a disk substrate sucked by the sucking pads and whether or not the disk substrate has been satisfactorily sucked by the sucking pads.

Abstract: In a sputtering apparatus comprising a film-deposition chamber having a gas-supplying pipe connected thereto, for depositing a film on the surface of a substrate to be processed, a target provided in the film-deposition chamber, a mask having an opening portion and a masking portion, the mask being provided opposing to the target in the film-deposition chamber, and holding means for holding the substrate against the mask in such a manner that the film-depositing surface of the substrate is in close contact with the mask, the improvement according to the present invention comprises a mask having exhaust passages formed in the masking portion thereof, each of exhaust passages having one end exposed to the inside of the film-deposition chamber and the other end exposed to the outside of the film-deposition chamber, the one end of each of the exhaust passages and the other end thereof being communicated with each other, but not seen through each other.