Patents by Inventor Jiro Mizuya

Jiro Mizuya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6034183
    Abstract: A process for preparing polymers having quaternary ammonium groups comprising polymerizing a vinyl monomer component containing a vinyl monomer having a tertiary amino group in the presence of a specific solvent, while quaternizing the tertiary amino group with a quaternizing agent, to produce the vinyl polymers having quaternary ammonium groups in the form of particles dispersed in the solvent, which is possible to easily separate the produced polymers having quaternary ammonium groups from the solvent without requiring a heating step for removing the solvent, and which can produce quaternary ammonium group-containing copolymers having a high content of a hydrophobic vinyl monomer. The quaternary ammonium group-containing copolymers obtained by this process are useful as modifier for plastics, permanent antistatic agent, bactericide or fungicide, chemicals for paper making and water treating agent.
    Type: Grant
    Filed: June 8, 1998
    Date of Patent: March 7, 2000
    Assignee: Arakawa Chemical Industries, Ltd.
    Inventors: Tatsuya Okumura, Jiro Mizuya, Junji Shiigi
  • Patent number: 5330582
    Abstract: A cleaning method for removing a rosin-base solder flux, the method including bringing a cleaning agent into contact with the flux on a printed wiring board, the cleaning agent including a mixture of(A) at least one glycol ether compound represented by the formula ##STR1## wherein R.sup.1 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, R.sup.2 is an alkyl group having 1 to 5 carbon atoms, R.sup.3 is a hydrogen atom or a methyl group and n is an integer of 2 to 4, and(B) at least one nonionic surfactant.
    Type: Grant
    Filed: July 19, 1993
    Date of Patent: July 19, 1994
    Assignee: Arakawa Chemical Industries, Ltd.
    Inventors: Machio Chihara, Jiro Mizuya, Tatsuya Okumura, Takashi Tanaka
  • Patent number: 5256209
    Abstract: The invention provides a cleaning method for removing a rosin-base solder flux, using essentially a mixture of(A) a compound of the formula (1) ##STR1## wherein R.sup.1 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, R.sup.2 is an alkyl group having 1 to 5 carbon atoms, R.sup.3 is a hydrogen atom or a methyl group and k is an integer of 2 to 4,(B) a compound represented by the formula (2)R.sup.4 --O--(CH.sub.2 CH.sub.2 O).sub.m --H (2)wherein R.sup.4 is a straight- or branched-chain alkyl group having 6 to 20 carbon atoms, phenyl group or a phenyl group substituted with a straight- or branched- chain alkyl group having 7 to 12 carbon atoms and m is an integer 2 to 20,(C) a compound represented by the formula (3) ##STR2## wherein R.sup.
    Type: Grant
    Filed: June 24, 1991
    Date of Patent: October 26, 1993
    Assignee: Arakawa Chemical Industries, Ltd.
    Inventors: Machio Chihara, Jiro Mizuya, Tatsuya Okumura, Takashi Tanaka
  • Patent number: 5096504
    Abstract: The invention provides a cleaning agent for removal of a rosin-base flux, the cleaning agent consisting essentially of a surfactant represented by the formulaR--O--(CH.sub.2 CH.sub.2 O).sub.n --H (I)wherein R is a straight or branched chain alkyl or alkenyl group having 5 to 18 carbon atoms and n is an integer of 2 to 12, and a cleaning method for removing a rosin-base flux, the method comprising bringing the cleaning agent into contact with a flux on a printed wiring board.
    Type: Grant
    Filed: June 15, 1990
    Date of Patent: March 17, 1992
    Assignee: Arakawa Chemical Industries, Ltd.
    Inventors: Machio Chihara, Jiro Mizuya, Tatsuya Okumura, Takashi Tanaka