Patents by Inventor Jiro Naito

Jiro Naito has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5127058
    Abstract: An improved gain controller for use in an audio equipment for controlling a gain of an audio signal without causing any clipping distortion and keeping a good S/N ratio.
    Type: Grant
    Filed: December 20, 1989
    Date of Patent: June 30, 1992
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Hidenori Yamasaki, Jiro Naito
  • Patent number: 5060185
    Abstract: A file backup system for POS data includes a master terminal and a backup terminal along with a master file and a backup file, all of which are coupled to a plurality of satellite terminals. A file controller is provided for each of the files. When one of the files is down, the master file is capable of copying the contents of the down file while simultaneously responding to a request from any terminal and controlling the transfer of data without stopping the operation of the system.
    Type: Grant
    Filed: February 27, 1989
    Date of Patent: October 22, 1991
    Assignee: NCR Corporation
    Inventors: Jiro Naito, Fumio Ito
  • Patent number: 4481279
    Abstract: A dry-developing positive resist composition consisting of (a) a polymeric material containing, in the molecular structure, unsaturated hydrocarbon bonds inclusive of vinyl, allyl, cinnamoyl, or acryl double bonds or epoxy groups or halogen atoms and (b) 1% to 70% by weight, based on the weight of the composition, of a silicon compound. A positive resist pattern is formed on a substrate by a process comprising coating the substrate with said resist composition, exposing the resist layer to radiation, and developing a resist pattern on the substrate by treatment with gas plasma.
    Type: Grant
    Filed: June 7, 1982
    Date of Patent: November 6, 1984
    Assignee: Fujitsu Limited
    Inventors: Jiro Naito, Yasuhiro Yoneda, Kenroh Kitamura
  • Patent number: 4464455
    Abstract: A dry-developing negative resist composition consisting of (a) a polymer of a monomer of the following formula I or II or a copolymer of a monomer of the following formula I with a monomer of the following formula II, ##STR1## in which R represents alkyl of 1 to 6 carbon atoms, benzyl, phenyl, or cyclohexyl and (b) 1% to 70% by weight, based on the weight of the composition, of a silicone compound. A negative resist pattern can be formed on a substrate by a process comprising coating the substrate with the resist composition, exposing the resist layer to an ionizing radiation, subjecting the resist layer to a relief treatment, and developing a resist pattern on the substrate by treatment with gas plasma.
    Type: Grant
    Filed: June 7, 1982
    Date of Patent: August 7, 1984
    Assignee: Fujitsu Limited
    Inventors: Yasuhiro Yoneda, Kenroh Kitamura, Jiro Naito, Toshisuke Kitakohji
  • Patent number: 4267258
    Abstract: A negative type resist is provided for deep ultraviolet light lithography. This resist comprises a polymer of a diallyl ester of a dicarboxylic acid having a degree of dispersion of 3 or less, which is given by the ratio of a weight-average molecular weight Mw to a number-average molecular weight Mn. This deep UV resist can produce a fine detail resist pattern having a high resolution, and it has a high sensitivity to irradiating the coated film of the polymer on a substrate with deep UV light followed by development.
    Type: Grant
    Filed: December 10, 1979
    Date of Patent: May 12, 1981
    Assignee: Fujitsu Limited
    Inventors: Yasuhiro Yoneda, Kenro Kitamura, Jiro Naito, Toshisuke Kitakohji