Patents by Inventor Jisheng Pan

Jisheng Pan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10118269
    Abstract: Provided is a self-sharpening polishing device with magnetorheological flexible polishing pad formed by dynamic magnetic field and polishing method thereof. The device includes a polishing disc revolution mechanism and a multi-magnetic-pole synchronous rotary drive mechanism, the polishing disc revolution mechanism including a transmission shaft motor, a transmission shaft, a transfer disc, an eccentric shaft fixing disc, a cup-shaped polishing disc and a transmission shaft transmission mechanism, the multi-magnetic-pole synchronous rotary drive mechanism including an eccentric spindle, a synchronous rotary drive disc, flexible eccentric rotating shafts, eccentric sleeves, magnetic poles, the eccentric shaft fixing disc, and a spindle motor, etc. The device does not need a circulating device to renew magnetorheological fluid and does not need to renew the magnetorheological fluid during the finishing process; in fact the entire process from rough polishing to precise polishing can be done at one time.
    Type: Grant
    Filed: January 27, 2016
    Date of Patent: November 6, 2018
    Assignee: GUANGDONG UNIVERSITY OF TECHNOLOGY
    Inventors: Jisheng Pan, Qiusheng Yan, Weiqiang Gao, Peng Yu
  • Publication number: 20180243877
    Abstract: A double-face polishing device and a method capable of controlling rigidity of a polishing pad through a cluster dynamic magnetic field are provided. A whole process from double-face rough polishing to precision polishing of a workpiece is implemented by adjusting a rigidity of a flexible polishing pad. The double-face polishing device capable of controlling rigidity of a polishing pad through a cluster dynamic magnetic field includes a variable-rigidity cluster magnetically-controlled polishing pad generating mechanism, a workpiece fast clamping mechanism and a workpiece movement driving mechanism.
    Type: Application
    Filed: January 6, 2017
    Publication date: August 30, 2018
    Applicant: GUANGDONG UNIVERSITY OF TECHNOLOGY
    Inventors: Jisheng PAN, Qiusheng YAN, Weihua LI
  • Publication number: 20180021910
    Abstract: Provided is a self-sharpening polishing device with magnetorheological flexible polishing pad formed by dynamic magnetic field and polishing method thereof. The device includes a polishing disc revolution mechanism and a multi-magnetic-pole synchronous rotary drive mechanism, the polishing disc revolution mechanism including a transmission shaft motor, a transmission shaft, a transfer disc, an eccentric shaft fixing disc, a cup-shaped polishing disc and a transmission shaft transmission mechanism, the multi-magnetic-pole synchronous rotary drive mechanism including an eccentric spindle, a synchronous rotary drive disc, flexible eccentric rotating shafts, eccentric sleeves, magnetic poles, the eccentric shaft fixing disc, and a spindle motor, etc. The device does not need a circulating device to renew magnetorheological fluid and does not need to renew the magnetorheological fluid during the finishing process; in fact the entire process from rough polishing to precise polishing can be done at one time.
    Type: Application
    Filed: January 27, 2016
    Publication date: January 25, 2018
    Inventors: Jisheng PAN, Qiusheng YAN, Weiqiang GAO, Peng YU
  • Publication number: 20110164253
    Abstract: A method of modifying a substrate for deposition of charged particles thereon, the method comprising the steps of: providing a substrate that is incapable of bonding to a polyelectrolyte coating that has a charge that is opposite to the charge of the particles that are to be deposited thereon; modifying the surface of the substrate to provide a layer of silicon thereon or therein; and coating the silicon layered surface of the substrate with the polyelectrolyte coating, the polyelectrolyte coating containing functional groups that are capable of forming bonds with said silicon layer and wherein said polyelectrolyte coating enables a substantially even distribution of said charged particles to be deposited thereon.
    Type: Application
    Filed: August 3, 2009
    Publication date: July 7, 2011
    Inventors: Xiaodong Zhou, Nan Zhang, Kai Yu Liu, Su Yin Oh, Jisheng Pan