Patents by Inventor Jitendra Singh Rathore

Jitendra Singh Rathore has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Hydrosilylation synthesis of haloalkylorganosilanes using peroxide promoters
    Patent number: 9556208
    Abstract: This invention is directed to a process for producing a haloorganoalkoxysilane product comprising reacting an olefinic halide, an alkoxysilane, a catalytically effective amount of ruthenium-containing catalyst; and a reaction-promoting effective amount of a peroxy compound, optionally in the presence of an electron-deficient aromatic compound.
    Type: Grant
    Filed: October 12, 2012
    Date of Patent: January 31, 2017
    Assignee: Momentive Performance Materials Inc.
    Inventors: Kenrick Martin Lewis, Jitendra Singh Rathore, Andrea Trotto, Giuseppe D'Agostino
  • Hydrosilylation Synthesis of Haloalkylorganosilanes Using Peroxide Promoters
    Publication number: 20140107366
    Abstract: This invention is directed to a process for producing a haloorganoalkoxysilane product comprising reacting an olefinic halide, an alkoxysilane, a catalytically effective amount of ruthenium-containing catalyst; and a reaction-promoting effective amount of a peroxy compound, optionally in the presence of an electron-deficient aromatic compound.
    Type: Application
    Filed: October 12, 2012
    Publication date: April 17, 2014
    Applicant: Momentive Performance Materials Inc.
    Inventors: Kenrick Martin Lewis, Jitendra Singh Rathore, Andrea Trotto, Giuseppe D'Agostino
  • Chemically amplified silsesquioxane resist compositions
    Patent number: 8426113
    Abstract: The present invention provides chemically amplified silsesquioxane polymers for preparing masks using e-beam lithography. The silsesquioxane polymers have reactive sidechains that in the presence of an acid undergo acid catalyzed rearrangement to generate reactive functionalities that crosslink to form Si—O—Si bonds. The reactive side-chains comprise ?- and ?-substituted alkyl groups bound to the silicon of the silsesquioxane polymer. The substituent of the ?- and ?-substituted alkyl group is an electron withdrawing group. Resists generated with the chemically amplified silsesquioxane polymers of the present invention and imaged with e-beams have resolution of ?60 nm line/space.
    Type: Grant
    Filed: August 13, 2010
    Date of Patent: April 23, 2013
    Assignee: International Business Machines Corporation
    Inventors: Luisa Dominica Bozano, Blake W. Davis, Alshakim Nelson, Jitendra Singh Rathore, Linda Karin Sundberg
  • Photo-patternable dielectric materials curable to porous dielectric materials, formulations, precursors and methods of use thereof
    Patent number: 8389663
    Abstract: Silsesquioxane polymers that cure to porous silsesquioxane polymers, silsesquioxane polymers that cure to porous silsesquioxane polymers in negative tone photo-patternable dielectric formulations, methods of forming structures using negative tone photo-patternable dielectric formulations containing silsesquioxane polymers that cure to porous silsesquioxane polymers, structures containing porous silsesquioxane polymers and monomers and method of preparing monomers for silsesquioxane polymers that cure to porous silsesquioxane polymers.
    Type: Grant
    Filed: October 8, 2009
    Date of Patent: March 5, 2013
    Assignee: International Business Machines Corporation
    Inventors: Phillip Joe Brock, Qinghuang Lin, Robert Dennis Miller, Alshakim Nelson, Jitendra Singh Rathore, Ratnam Sooriyakumaran
  • CHEMICALLY AMPLIFIED SILSESQUIOXANE RESIST COMPOSITIONS
    Publication number: 20120040289
    Abstract: The present invention provides chemically amplified silsesquioxane polymers for preparing masks using e-beam lithography. The silsesquioxane polymers have reactive sidechains that in the presence of an acid undergo acid catalyzed rearrangement to generate reactive functionalities that crosslink to form Si—O—Si bonds. The reactive side-chains comprise ?- and ?-substituted alkyl groups bound to the silicon of the silsesquioxane polymer. The substituent of the ?- and ?-substituted alkyl group is an electron withdrawing group. Resists generated with the chemically amplified silsesquioxane polymers of the present invention and imaged with e-beams have resolution of ?60 nm line/space.
    Type: Application
    Filed: August 13, 2010
    Publication date: February 16, 2012
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Luisa Dominica Bozano, Blake W. Davis, Alshakim Nelson, Jitendra Singh Rathore, Linda Karin Sundberg
  • PHOTO-PATTERNABLE DIELECTRIC MATERIALS CURABLE TO POROUS DIELECTRIC MATERIALS, FORMULATIONS, PRECURSORS AND METHODS OF USE THEREOF
    Publication number: 20110083887
    Abstract: Silsesquioxane polymers that cure to porous silsesquioxane polymers, silsesquioxane polymers that cure to porous silsesquioxane polymers in negative tone photo-patternable dielectric formulations, methods of forming structures using negative tone photo-patternable dielectric formulations containing silsesquioxane polymers that cure to porous silsesquioxane polymers, structures containing porous silsesquioxane polymers and monomers and method of preparing monomers for silsesquioxane polymers that cure to porous silsesquioxane polymers.
    Type: Application
    Filed: October 8, 2009
    Publication date: April 14, 2011
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Phillip Joe Brock, Blake W. Davis, Qinghuang Lin, Robert Dennis Miller, Alshakim Nelson, Jitendra Singh Rathore, Ratnam Sooriyakumaran