Patents by Inventor Jiun-Rng Pai

Jiun-Rng Pai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHODS FOR PREPARING VOID-FREE COATINGS FOR PLASMA TREATMENT COMPONENTS
    Publication number: 20230367339
    Abstract: Methods for preparing a void-free protective coating are disclosed herein. The void-free protective coating is used on a dielectric window having a central hole, which is used in a plasma treatment tool. A first protective coating layer is applied to the window, leaving an uncoated annular retreat area around the central hole. The first protective coating layer is polished to produce a flat surface and fill in any voids on the window. A second protective coating layer is then applied upon the flat surface of the first protective coating layer to obtain the void-free coating. This increases process uptime and service lifetime of the dielectric window and the plasma treatment tool.
    Type: Application
    Filed: July 26, 2023
    Publication date: November 16, 2023
    Inventors: Shih-Tsung Chen, Yeh-Chieh Wang, Yen-Shih Wang, Chien-Yu Wang, Jiun-Rng Pai, Tsung-Cheng Ho