Patents by Inventor Jiunn-Kae Chiang

Jiunn-Kae Chiang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Self-aligning PVD mark shield
    Publication number: 20040065257
    Abstract: A new and improved, self-aligning mark shield for PVD chambers. The mark shield of the present invention comprises an annular body having a retainer flange for engaging and retaining a substrate on a substrate support of a process chamber. An annular locating pin is provided on the bottom surface of the body for engaging the substrate support and preventing excessive X- and Y-axis movement of the substrate on the substrate support. The mark shield obviates the need for a standard ceramic isolation assembly to maintain the mark shield in position in the chamber.
    Type: Application
    Filed: October 7, 2002
    Publication date: April 8, 2004
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Jen-Hung Huang, Wu-Xing Lin, Jiunn-Kae Chiang