Patents by Inventor Jiuyi Cheng

Jiuyi Cheng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10401202
    Abstract: An apparatus for controlling the flow of a gas, containing a controllable valve, wherein the position of the valve and the gas pressure upstream of the valve are measured and used in conjunction with a first lookup table to determine the flow rate of the gas through the valve; and a flow restrictor upstream of the controllable valve, wherein the temperature of the flow restrictor and the gas pressure upstream and downstream of the flow restrictor are measured and used in conjunction with a second lookup table to determine the flow rate of the gas through the flow restrictor.
    Type: Grant
    Filed: July 8, 2016
    Date of Patent: September 3, 2019
    Assignee: PIVOTAL SYSTEMS CORPORATION
    Inventors: Joseph R. Monkowski, James Franklin, Jiuyi Cheng, Tao Ding, Andrey Shmakov, Travis Owens
  • Publication number: 20170010625
    Abstract: An apparatus for controlling the flow of a gas, containing a controllable valve, wherein the position of the valve and the gas pressure upstream of the valve are measured and used in conjunction with a first lookup table to determine the flow rate of the gas through the valve; and a flow restrictor upstream of the controllable valve, wherein the temperature of the flow restrictor and the gas pressure upstream and downstream of the flow restrictor are measured and used in conjunction with a second lookup table to determine the flow rate of the gas through the flow restrictor.
    Type: Application
    Filed: July 8, 2016
    Publication date: January 12, 2017
    Inventors: Joseph R. Monkowski, James Franklin, Jiuyi Cheng, Tao Ding, Andrey Shmakov, Travis Owens
  • Patent number: 7590498
    Abstract: Leaks in a processing chamber, including “virtual leaks” resulting from outgassing of material present within the chamber, may be detected utilizing an optical emission spectroscopy (OES) sensor configured to monitor light emitted from plasma of a sample from the chamber. According to certain embodiments, gas introduced into the chamber by the leak may be detected directly on the basis of its optical spectrum. Alternatively, gas introduced by the leak may be detected indirectly, based upon an optical spectrum of a material resulting from reaction of the gas attributable to the leak. According to one embodiment, data from the OES sensor is received by a processor that is configured to compute a leak detection index. The value of the leak detection index is compared against a threshold to determine if a leak is detected. If the value of the index crosses the threshold, a notification of the existence of a leak is sent.
    Type: Grant
    Filed: November 30, 2007
    Date of Patent: September 15, 2009
    Assignee: Pivotal Systems Corporation
    Inventors: Sherk Chung, Mukund Chakravarthy Venkatesh, Paxton Ming Kai Chow, Jiuyi Cheng, Paul Tran, Joseph Raymond Monkowski