Patents by Inventor Ji Yup KIM

Ji Yup KIM has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PHOTORESIST COMPOSITIONS FOR EUV AND METHODS FOR MANUFACTURING SEMICONDUCTOR DEVICES USING THE SAME
    Publication number: 20230229083
    Abstract: Provided are photoresist compositions for EUV and methods for manufacturing a semiconductor device using the same. The photoresist compositions for EUV include a photosensitive resin, a photoacid generator, and an additive, wherein the additive comprises a copolymer including a first repeating unit that includes a fluoroalkyl group or hydrocarbon group substituted with one or more fluoroalkyl group(s), and a second repeating unit that includes a sulfonic acid group and an amide group.
    Type: Application
    Filed: December 30, 2022
    Publication date: July 20, 2023
    Inventors: JUHYEON PARK, JI YUP KIM, JINJOO KIM, HYUNWOO KIM, SUNG HWAN PARK
  • ADDITIVE FOR PHOTORESIST, PHOTORESIST COMPOSITION FOR EUV INCLUDING THE SAME, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME
    Publication number: 20230097135
    Abstract: An additive for a photoresist, a photoresist composition for a EUV including the same, and a method for manufacturing a semiconductor device using the same, the additive including a copolymer that includes a first repeating unit represented by the following Chemical Formula 1-1, and a second repeating unit represented by the following Chemical Formula 2, wherein a molar ratio of the first repeating unit to the second repeating unit is 7:3 to 2:8,
    Type: Application
    Filed: September 7, 2022
    Publication date: March 30, 2023
    Inventors: Jin Joo KIM, Ye Chan KIM, Ju-Young KIM, Ji Yup KIM, Hyun Woo KIM, Ju Hyeon PARK, Ji Cheol PARK, Hyun Ji SONG, Hong Gu IM, Suk Koo HONG