Patents by Inventor Jltendra S. Goela

Jltendra S. Goela has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of producing high aspect ratio domes by vapor deposition
    Publication number: 20030209197
    Abstract: An apparatus and method for preparing high aspect ratio domes employed to enhance aerodynamic performance in missiles and aircraft. The apparatus and method of the present invention also provide transmissive domes for infrared sensors used for navigation, targeting and guidance systems. The apparatus is employed in chemical vapor deposition furnaces for chemical deposition of materials on mandrels to form domes. The mandrels of the apparatus are arranged in the deposition chamber such that the flow of gaseous reactants does not impinge on the mandrels. The reactants diffuse onto the mandrels to form domes with high aspect ratios.
    Type: Application
    Filed: April 24, 2003
    Publication date: November 13, 2003
    Applicant: Shipley Company, L.L.C.
    Inventors: Jltendra S. Goela, Zlatko Salihbegovic