Patents by Inventor Jnn Ho Ban

Jnn Ho Ban has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Conditioner of chemical mechanical polishing apparatus
    Patent number: 8662956
    Abstract: Provided are a conditioner of a chemical mechanical polishing apparatus for polishing a substrate over a platen pad that rotates and a method thereof. The conditioner includes a disk holder, a piston rod, a housing, and a load sensor. The disk holder secures a conditioning disk that finely cuts a surface of the platen pad. The piston rod delivers a normal force to the disk holder. The housing covers at least a portion of the piston rod. The load sensor is installed to receive the normal force that the piston rod delivers to the piston rod and measuring the normal force.
    Type: Grant
    Filed: May 3, 2011
    Date of Patent: March 4, 2014
    Assignees: Samsung Electronics Co., Ltd., K.C. Tech Co., Ltd.
    Inventors: Keon Sik Seo, Jae Phil Boo, Dong Soo Kim, Ja Cheul Goo, Chan Woon Jeon, Jnn Ho Ban