Patents by Inventor Jo-Hyun Park

Jo-Hyun Park has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240162113
    Abstract: In one example, an electronic device comprises a substrate comprising a conductive structure and an inner side and an outer side, a first electronic component over the inner side of the substrate and coupled with the conductive structure, a lid over the substrate and the first electronic component and comprising a first hole in the lid, and a thermal interface material between the first electronic component and the lid. The thermal interface material is in the first hole. Other examples and related methods are also disclosed herein.
    Type: Application
    Filed: November 11, 2022
    Publication date: May 16, 2024
    Applicants: Amkor Technology Singapore Holding Pte. Ltd., Amkor Technology Singapore Holding Pte. Ltd.
    Inventors: Dong Hyeon Park, Yun Ah Kim, Seok Ho Na, Won Ho Choi, Dong Su Ryu, Jo Hyun Bae, Min Jae Kong, Jin Young Khim, Jae Yeong Bae, Dong Hee Kang
  • Publication number: 20230191609
    Abstract: A multiple hydraulic robot system for precisely installing a girder according to the present disclosure may comprise: four hydraulic robots connected to both sides of two connection plates which are coupled to both ends of the top surface of a girder installed between bridge piers and to which cables of a crane are connected, wherein the robots move the girder horizontally and vertically; a hydraulic system for operating actuators of the four hydraulic robots; and a controller which controls the remotely operated four hydraulic robots by means of a synchronization control algorithm to precisely adjust the installing position of the girder.
    Type: Application
    Filed: January 11, 2021
    Publication date: June 22, 2023
    Inventors: Jeong Woo PARK, Hyogon KIM, Hyojun LEE, Jong Chan KIM, Kyoungseok NOH, Young Ho CHOI, Jeong Hwan HWANG, Jo Hyun PARK
  • Patent number: 6387573
    Abstract: A phase shift mask formed by depositing on a transparent substrate a phase shifter material containing chromium (Cr), aluminum (Al), oxygen (O) and nitrogen (N). The transmissivity of a phase shifting layer of the phase shift mask, which is a CrAION layer, is increases, and the phase of exposure light is shifted by 180° at a predetermined thickness, so that a fine photoresist pattern can be formed. Also, the transmissivity of the phase shifting layer with respect to inspection light, which has a longer wavelength than exposure light, is relatively low, which permits accurate inspection of the mask. The phase shift mask can be useful in photolithography using a short wavelength of exposure light, and in an inspection apparatus using an inspection light source having a longer wavelength than exposure light.
    Type: Grant
    Filed: July 18, 2000
    Date of Patent: May 14, 2002
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jo-Hyun Park, Eun-ah Kim, Kwang-soo No