Patents by Inventor Jo ITO

Jo ITO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURING DAMASCENE WIRING STRUCTURE, SEMICONDUCTOR SUBSTRATE, AND DAMASCENE WIRING STRUCTURE
    Publication number: 20210403320
    Abstract: A method of manufacturing a semiconductor substrate according to an embodiment includes a first step of forming a groove having a bottom surface and a side surface on which scallops are formed by performing a process including isotropic etching on a main surface of a substrate, a second step of performing at least one of a hydrophilic treatment on the side surface of the groove and a degassing treatment on the groove, and a third step of removing the scallops formed on the side surface of the groove and planarizing the side surface by performing anisotropic wet etching in a state where the bottom surface of the recess is present.
    Type: Application
    Filed: October 30, 2019
    Publication date: December 30, 2021
    Applicant: HAMAMATSU PHOTONICS K.K.
    Inventors: Nao INOUE, Jo ITO, Go TANAKA, Atsuya IIMA, Daiki SUZUKI, Katsumi SHIBAYAMA
  • Method for manufacturing optical interferometer
    Patent number: 9618323
    Abstract: A method of manufacturing an optical interferometer includes a first step of forming a first semiconductor portion for a beam splitter and a second semiconductor portion for a movable mirror on a main surface of a support substrate and a first insulating layer formed on the main surface, a second step of disposing a first wall portion between a first side surface of the first semiconductor portion and a second side surface in the second semiconductor portion, and a third step of forming a mirror surface in the second semiconductor portion by forming a first metal film on the second side surface using a shadow mask. In the third step, the first side surface is masked by the mask portion and the first wall portion and the first metal film is formed in a state in which the second side portion is exposed from an opening portion.
    Type: Grant
    Filed: July 31, 2014
    Date of Patent: April 11, 2017
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Tomofumi Suzuki, Yoshihisa Warashina, Kohei Kasamori, Tatsuya Sugimoto, Jo Ito
  • METHOD FOR MANUFACTURING OPTICAL INTERFEROMETER
    Publication number: 20160202037
    Abstract: A method of manufacturing an optical interferometer includes a first step of forming a first semiconductor portion for a beam splitter and a second semiconductor portion for a movable mirror on a main surface of a support substrate and a first insulating layer formed on the main surface, a second step of disposing a first wall portion between a first side surface of the first semiconductor portion and a second side surface in the second semiconductor portion, and a third step of forming a mirror surface in the second semiconductor portion by forming a first metal film on the second side surface using a shadow mask. In the third step, the first side surface is masked by the mask portion and the first wall portion and the first metal film is formed in a state in which the second side portion is exposed from an opening portion.
    Type: Application
    Filed: July 31, 2014
    Publication date: July 14, 2016
    Inventors: Tomofumi SUZUKI, Yoshihisa WARASHINA, Kohei KASAMORI, Tatsuya SUGIMOTO, Jo ITO