Abstract: An auxiliary assessment method for cardiac function performed by a computing unit includes collecting a number of heartbeats and an amount of movement of a subject in a period of time; and calculating a distance per beat to assess cardiac function of the subject. The distance per beat is defined by dividing the amount of movement by the number of heartbeats. A length of the period of time is defined between at least two adjacent heartbeats. The amount of movement corresponds to a cumulative amount of movement in the period of time.

Abstract: A method of fabricating a plastic part having a three-dimensional image and visual effect. A plastic part having a three-dimensional graphical surface and a flat plane is formed. Subsequently, a thin film layer is formed on the plastic part to provide three-dimensional image and visual effect to the plastic part, where the three-dimensional graphical surface provides the three-dimensional image and the thin film layer provides the visual effect.

Abstract: A method of manufacturing a plastic biochip or a biosensor test strip, which is compatible with standard CD/DVD making processes. The method includes substrate injection press molding, followed by seamless magnetic biosensor sputtering. If necessary, the sputtered biosensor is cut off from the substrate.

Abstract: First, a substrate is provided, and a half-tone mask is employed to perform an exposing and developing process for forming a plurality of photoresist patterns having different thickness. Then, a flow process is performed to heat the photoresist patterns so that each photoresist pattern has a microlens surface. Following that, a metal plate is formed on the substrate for obtaining a plurality of patterns, which are opposite to the plurality of photoresist patterns, on the bottom surface. Finally, the metal plate is removed from the substrate, and combined with an insert mold.

Abstract: First, a substrate is provided and a photoresist layer is coated thereon. Then, a film having a pattern is used as a mask to perform an exposing and developing process for patterning the photoresist layer. Following that, LIGA technology is employed to form a thin film having a pattern corresponding to the pattern of the film.