Abstract: In an apparatus for the conversion of a continuous liquid stream into a stream of liquid droplets, which are discharged from a discharge nozzle of the capillary through which the liquid stream is conducted, a flow acceleration device is disposed on the capillary near the discharge nozzle thereof for accelerating the droplet stream depending on a first electrical signal, which is applied to the acceleration device, and a second electrical signal which is generated by a laser detection means provided for sensing laser light of a beam directed through the travel path of the droplets to the detection means for sensing the passage of a droplet and means for generating from the first and second electrical signals a time &Dgr;t which indicates the time needed for a liquid droplet to travel from the discharge nozzle to the laser light beam.

Abstract: A method and arrangement for analyzing specimens pursuant to the X-ray fluorescence analysis method utilizing a beam detector to detect a secondary beam that originates from the specimen that is to be analyzed and upon which is directed a primary X-ray beam, the path of which is adjustable in at least one axis of freedom. The surface of a specimen holder on which the specimen is placed is disposed parallel to, and at a defined distance from, a reference plane at which the primary beam is reflected under total reflection conditions. Subsequently, the path of the primary beam is adjusted relative to the reference plane while simultaneously detecting, with a detector, the radiation spectrum of the secondary beam of the specimen. At a predetermined energy level of the primary beam, a secondary beam intensity maximum, to which is assigned a specific reference angle, is determined.

Abstract: The present invention relates to an arrangement for the non-destructive measurement of metal traces in the surface of material samples in which the surface is irradiated with X-ray radiation and a detector, fastened above the material sample, spectrometrically examines the fluorescent radiation emanating from the material sample. Metal impurities are detected in the surface of, for example, silicon wafers down to about 10.sup.11 atoms/cm.sup.2, on-line, with the wafers being free from contamination by the measuring process. It is possible to sweep the entire surface area of wafers having a diameter up to about 150 mm at the locations fixed by the respective standards. The X-ray radiation directed onto the surface of the material sample by means of an adjustable X-ray source, the divergence of the exciting X-ray radiation being limited by two aperture members, the aperture members being disposed in a quartz body serving as an optical bench.

Abstract: A measuring apparatus for X-ray fluorescence analysis in which the specimen s stimulated by glancing incident radiation and is examined spectrometrically by a detector disposed above the specimen. In the path of rays of the stimulating X-radiation there is disposed a reflector which in operation deflects the X-radiation to the surface of the specimen.