Patents by Inventor Joachim Mattes

Joachim Mattes has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Packaging for polysilicon and method for packaging polysilicon
    Patent number: 10442596
    Abstract: Reduction of contamination and the proportion of fines fractions in the packaging of rod form polysilicon is achieved by directly filling a plastic bag with polysilicon from a cleaning bowl by a rotating motion which causes polysilicon chunks to slide into the bag.
    Type: Grant
    Filed: April 15, 2016
    Date of Patent: October 15, 2019
    Assignee: WACKER CHEMIE AG
    Inventors: Matthias Vietz, Martin Brixel, Joachim Mattes, Peter Wimmer
  • Packing of polycrystalline silicon
    Patent number: 10221002
    Abstract: A method for packing polycrystalline silicon in the form of fragments or round rods, wherein at least one film in each case is inserted into a cuboidal cardboard box matched to the dimensions of the polycrystalline silicon to be packed, the polycrystalline silicon is introduced into the at least one film, the at least one film of thickness 10 to 1000 ?m subsequently being welded and enclosing the polycrystalline silicon, and this at least one film being surrounded by a further film having a reinforcing structure or by a shaping element.
    Type: Grant
    Filed: April 12, 2013
    Date of Patent: March 5, 2019
    Assignee: Wacker Chemie AG
    Inventors: Joachim Mattes, Bruno Lichtenegger, Matthias Vietz
  • PACKAGING FOR POLYSILICON AND METHOD FOR PACKAGING POLYSILICON
    Publication number: 20180099800
    Abstract: Reduction of contamination and the proportion of fines fractions in the packaging of rod form polysilicon is achieved by directly filling a plastic bag with polysilicon from a cleaning bowl by a rotating motion which causes polysilicon chunks to slide into the bag.
    Type: Application
    Filed: April 15, 2016
    Publication date: April 12, 2018
    Applicant: Wacker Chemie AG
    Inventors: Matthias VIETZ, Martin BRIXEL, Joachim MATTES, Peter WIMMER
  • Apparatus and method for comminuting a polycrystalline silicon rod
    Patent number: 9586210
    Abstract: An apparatus is disclosed for comminuting a polycrystalline silicon rod, which apparatus includes a base, at least one movable comminuting tool and optionally at least one immovable anvil. A silicon rod to be comminuted lies on a longitudinal axis oriented parallel or virtually parallel to the surface of the base and can be adjusted between the comminuting tool and anvil. Also disclosed is a method for comminuting a polycrystalline silicon rod.
    Type: Grant
    Filed: July 8, 2013
    Date of Patent: March 7, 2017
    Assignee: Wacker Chemie AG
    Inventors: Joachim Mattes, Peter Gruebl, Siegfried Riess
  • APPARATUS AND METHOD FOR COMMINUTING A POLYCRYSTALLINE SILICON ROD
    Publication number: 20140034763
    Abstract: An apparatus is disclosed for comminuting a polycrystalline silicon rod, which apparatus includes a base, at least one movable comminuting tool and optionally at least one immovable anvil. A silicon rod to be comminuted lies on a longitudinal axis oriented parallel or virtually parallel to the surface of the base and can be adjusted between the comminuting tool and anvil. Also disclosed is a method for comminuting a polycrystalline silicon rod.
    Type: Application
    Filed: July 8, 2013
    Publication date: February 6, 2014
    Inventors: Joachim MATTES, Peter GRUEBL, Siegfried RIESS
  • PACKING OF POLYCRYSTALLINE SILICON
    Publication number: 20130269295
    Abstract: A method for packing polycrystalline silicon in the form of fragments or round rods, wherein at least one film in each case is inserted into a cuboidal cardboard box matched to the dimensions of the polycrystalline silicon to be packed, the polycrystalline silicon is introduced into the at least one film, the at least one film of thickness 10 to 1000 ?m subsequently being welded and enclosing the polycrystalline silicon, and this at least one film being surrounded by a further film having a reinforcing structure or by a shaping element.
    Type: Application
    Filed: April 12, 2013
    Publication date: October 17, 2013
    Applicant: WACKER CHEMIE AG
    Inventors: Joachim MATTES, Bruno LICHTENEGGER, Matthias VIETZ
  • Method for producing a semiconductor wafer with profiled edge
    Patent number: 7704126
    Abstract: Semiconductor wafers with profiled edges, are produced with decreased losses due to edge or other damage by separating a semiconductor wafer from a crystal; profiling the edge in a profile producing step wherein the edge is mechanically machined to a profile that is true to scale with respect to a predefined target profile; mechanically machining the wafer to reduce the a thickness of the semiconductor wafer; and machining the edge profile to acquire the target profile.
    Type: Grant
    Filed: May 4, 2007
    Date of Patent: April 27, 2010
    Assignee: Siltronic AG
    Inventors: Joachim Mattes, Anton Huber, Joerg Moser
  • Method For Producing A Semiconductor Wafer With Profiled Edge
    Publication number: 20070264911
    Abstract: Semiconductor wafers with profiled edges, are produced with decreased losses due to edge or other damage by separating a semiconductor wafer from a crystal; profiling the edge in a profile producing step wherein the edge is mechanically machined to a profile that is true to scale with respect to a predefined target profile; mechanically machining the wafer to reduce the a thickness of the semiconductor wafer; and machining the edge profile to acquire the target profile.
    Type: Application
    Filed: May 4, 2007
    Publication date: November 15, 2007
    Applicant: SILTRONIC AG
    Inventors: Joachim Mattes, Anton Huber, Jorg Moser