Patents by Inventor Joachim Pokorny

Joachim Pokorny has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6805754
    Abstract: A device and method for processing substrates, whereby medium consumption and processing time are reduced. According to the inventive method, liquid is conducted to a surface of the substrate that is to be treated via at least one nozzle that is arranged in a substantially centric position with respect to said substrate and via a plurality of second nozzles that are controlled separately from the first nozzle.
    Type: Grant
    Filed: September 28, 2001
    Date of Patent: October 19, 2004
    Assignee: Steag Micro Tech GmbH
    Inventors: Joachim Pokorny, Andreas Steinrücke
  • Patent number: 6523552
    Abstract: A processing tank has at least one fluid distribution device for introducing a treatment fluid. The fluid distribution device has at least one porous hollow rod, at least one porous plate, at least one capillary plate, or at least one single-ply or multi-ply fabric.
    Type: Grant
    Filed: July 7, 1998
    Date of Patent: February 25, 2003
    Assignee: Steag MicroTech GmbH
    Inventor: Joachim Pokorny
  • Publication number: 20030019744
    Abstract: The invention relates to a substrate holder (1) for holding substrates (5), especially semiconductor wafers. The inventive holder comprises first and second components (3, 4). The substrate (5) can be received between said components. The invention is characterized in that the first component (3) is provided with a base body (7) and at least one support element (70) which can be moved in relation to said body and is elastically pre-stressed in the direction of the second component (4).
    Type: Application
    Filed: July 17, 2002
    Publication date: January 30, 2003
    Inventor: Joachim Pokorny
  • Patent number: 6488987
    Abstract: An apparatus and method for processing substrates are provided. The apparatus includes a first processing unit and a second processing unit. A substrate holder is vertically displaceable over the first processing unit, and is guided outside the first and second processing units. In a raised position of the substrate holder relative to the first processing unit, the second processing unit is movable between the substrate holder and the first processing unit.
    Type: Grant
    Filed: June 22, 2001
    Date of Patent: December 3, 2002
    Assignee: STEAG MicroTech GmbH
    Inventor: Joachim Pokorny
  • Publication number: 20010008142
    Abstract: A processing tank has at least one fluid distribution device for introducing a treatment fluid. The fluid distribution device has at least one porous hollow rod, at least one porous plate, at least one capillary plate, or at least one single-ply or multi-ply fabric.
    Type: Application
    Filed: July 7, 1998
    Publication date: July 19, 2001
    Inventor: JOACHIM POKORNY
  • Patent number: 6205292
    Abstract: A fluid heater has a fluid pipe through which a fluid flows. A radiant heating element is enclosed in a quartz mantle. The fluid pipe is concentrically arranged about the quartz mantle. A first temperature sensor is positioned at a section of the outer circumference of the fluid pipe opposite the heating element.
    Type: Grant
    Filed: October 2, 1998
    Date of Patent: March 20, 2001
    Assignee: STEAG MicroTech GmbH
    Inventors: Joachim Pokorny, Andreas Steinrücke