Patents by Inventor Joachim Welker

Joachim Welker has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for adjusting and visualizing parameters for focusing an objective lens on an object and system for implementing the method
    Patent number: 11210861
    Abstract: The disclosure relates to a method for setting and visualizing parameters of an objective lens of a camera, in particular for focusing on a moving object, and to a system for per-forming the method. The camera is, for example, embodied as a film camera, in particular as a film camera used in cinematography. The method includes the following steps: calcu-lating a relative position and an alignment of a depth of field of the objective lens in the 3D space, observing the 3D space and/or the object with an AR display and observation de-vice, displaying the relative position and the alignment of the depth of field of the objective lens as an image in the AR display and observation device and/or displaying a focal plane as an image in the AR display and observation device, and setting the objective lens to ob-tain a desired depth of field of the objective lens.
    Type: Grant
    Filed: April 28, 2020
    Date of Patent: December 28, 2021
    Assignee: Carl Zeiss AG
    Inventors: Benedikt Hartmann, Joachim Welker, Christoph Stark
  • Objective lens main body, objective lens, and objective lens system
    Patent number: 11175567
    Abstract: An objective lens main body and an objective lens system formed by the objective lens are provided. The objective lens main body includes a main frame for retaining optical functional elements and at least one adjustable, optical functional element that is retained adjustably thereon. The objective lens main body furthermore includes at least one adjustment drive arranged on the main frame for adjusting the adjustable functional element or at least one of the adjustable functional elements. In addition, the objective lens main body includes an electronics board attached indirectly or directly to the main frame that has at least one plug-in location for reversibly receiving a plug-in card, and a first controller that is configured as a plug-in card and inserted into the plug-in location or one of the plug-in locations and is set up for exchanging signals with an electrical module of the objective lens or an external unit.
    Type: Grant
    Filed: July 21, 2019
    Date of Patent: November 16, 2021
    Assignee: Carl Zeiss AG
    Inventors: Jochen Franke, Joachim Welker
  • Method for producing an illumination system for an EUV projection exposure system, and illumination system
    Patent number: 11048172
    Abstract: The disclosure relates to a method for producing an illumination system for an EUV apparatus in and to an illumination system for an EUV apparatus.
    Type: Grant
    Filed: December 5, 2019
    Date of Patent: June 29, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Juergen Baier, Daniel Runde, Matthias Manger, Ulrich Mueller, Joerg Lichtenthaeler, André Orthen, Joachim Welker, Markus Holz, Hubert Holderer
  • METHOD FOR ADJUSTING AND VISUALIZING PARAMETERS FOR FOCUSING AN OBJECTIVE LENS ON AN OBJECT AND SYSTEM FOR IMPLEMENTING THE METHOD
    Publication number: 20200357181
    Abstract: The disclosure relates to a method for setting and visualizing parameters of an objective lens of a camera, in particular for focusing on a moving object, and to a system for performing the method. The camera is, for example, embodied as a film camera, in particular as a film camera used in cinematography. The method includes the following steps: calculating a relative position and an alignment of a depth of field of the objective lens in the 3D space, observing the 3D space and/or the object with an AR display and observation device, displaying the relative position and the alignment of the depth of field of the objective lens as an image in the AR display and observation device and/or displaying a focal plane as an image in the AR display and observation device, and setting the objective lens to obtain a desired depth of field of the objective lens.
    Type: Application
    Filed: April 28, 2020
    Publication date: November 12, 2020
    Inventors: Benedikt Hartmann, Joachim Welker, Christoph Stark
  • METHOD FOR PRODUCING AN ILLUMINATION SYSTEM FOR AN EUV PROJECTION EXPOSURE SYSTEM, AND ILLUMINATION SYSTEM
    Publication number: 20200110340
    Abstract: The disclosure relates to a method for producing an illumination system for an EUV apparatus in and to an illumination system for an EUV apparatus
    Type: Application
    Filed: December 5, 2019
    Publication date: April 9, 2020
    Inventors: Juergen Baier, Daniel Runde, Matthias Manger, Ulrich Mueller, Joerg Lichtenthaeler, André Orthen, Joachim Welker, Markus Holz, Hubert Holderer
  • OBJECTIVE LENS MAIN BODY, OBJECTIVE LENS, AND OBJECTIVE LENS SYSTEM
    Publication number: 20200026159
    Abstract: An objective lens main body and an objective lens system formed by the objective lens are provided. The objective lens main body includes a main frame for retaining optical functional elements and at least one adjustable, optical functional element that is retained adjustably thereon. The objective lens main body furthermore includes at least one adjustment drive arranged on the main frame for adjusting the adjustable functional element or at least one of the adjustable functional elements. In addition, the objective lens main body includes an electronics board attached indirectly or directly to the main frame that has at least one plug-in location for reversibly receiving a plug-in card, and a first controller that is configured as a plug-in card and inserted into the plug-in location or one of the plug-in locations and is set up for exchanging signals with an electrical module of the objective lens or an external unit.
    Type: Application
    Filed: July 21, 2019
    Publication date: January 23, 2020
    Inventors: Jochen Franke, Joachim Welker
  • Method for producing an illumination system for an EUV projection exposure system, and illumination system
    Patent number: 10514608
    Abstract: The disclosure relates to a method for producing an illumination system for an EUV apparatus in and to an illumination system for an EUV apparatus.
    Type: Grant
    Filed: August 28, 2018
    Date of Patent: December 24, 2019
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Juergen Baier, Daniel Runde, Matthias Manger, Ulrich Mueller, Joerg Lichtenthaeler, André Orthen, Joachim Welker, Markus Holz, Hubert Holderer
  • METHOD FOR PRODUCING AN ILLUMINATION SYSTEM FOR AN EUV PROJECTION EXPOSURE SYSTEM, AND ILLUMINATION SYSTEM
    Publication number: 20180373158
    Abstract: The disclosure relates to a method for producing an illumination system for an EUV apparatus in and to an illumination system for an EUV apparatus
    Type: Application
    Filed: August 28, 2018
    Publication date: December 27, 2018
    Inventors: Juergen Baier, Daniel Runde, Matthias Manger, Ulrich Mueller, Joerg Lichtenthaeler, André Orthen, Joachim Welker, Markus Holz, Hubert Holderer