Patents by Inventor Joachim Zach

Joachim Zach has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6858844
    Abstract: The invention relates to a method for determining geometrical-optical aberrations up to and including 3rd order in particle-optical, probe-forming systems, in particular scanning electron microscopes, comprising an essentially punctiform source, lenses, an object, and a detector, the image being recorded, the process being repeated with an overfocussed and an underfocussed beam, the images being transformed in Fourier space, the transformation of the overfocussed image, and the underfocussed image is divided by the transformed focussed image. The results are reverse transformed, and the brightness profiles of the probes, the images of the source, are determined in overfocus and underfocus. The asymmetry, the width and/or the curvature of the profile being determined in the center, and the image aberration being determined from the differences.
    Type: Grant
    Filed: December 20, 2000
    Date of Patent: February 22, 2005
    Inventor: Joachim Zach
  • Publication number: 20050029466
    Abstract: A multipole lens producing less magnetic field variations is offered. Also, a charged-particle beam instrument fitted with such multipole lenses is offered. The multipole lens has plural polar elements, an annular holding member, and an annular yoke disposed outside the holding member. Each polar element has a held portion and a base-end portion. The held portions of the polar elements are held by the holding member. The yoke is magnetically coupled to the base-end portions of the polar elements. The yoke is provided with openings extending circumferentially. The base-end portions of the polar elements are positioned in the openings.
    Type: Application
    Filed: June 23, 2004
    Publication date: February 10, 2005
    Applicant: JEOL Ltd.
    Inventors: Eiji Kawai, Joachim Zach, Klaus Hessenauer
  • Publication number: 20030001102
    Abstract: The invention relates to a method for determining geometrical-optical aberrations up to and including 3rd order in particle-optical, probe-forming systems, in particular scanning electron microscopes, comprising an essentially punctiform source, lenses, an object, and a detector, the image being recorded (6), the process being repeated with an overfocussed and an overfocussed beam, the images (6, 6a, 6b) being transformed in Fourier space, the transformation of the overfocussed image (7a) and the underfocussed image being divided (8) by that of the transformed focussed image (7), and the result being reverse transformed, and the brightness profiles of the probes (5, 5a), that is to say the images of the source (1) being determined in overfocus and underfocus, the asymmetry, the width and/or the curvature of the profile (9, 9a) being determined in the center, and the image aberration being determined from the differences.
    Type: Application
    Filed: July 22, 2002
    Publication date: January 2, 2003
    Inventor: Joachim Zach
  • Patent number: 4896036
    Abstract: In a high resolution imaging system for close inspection of sub-micrometer structures, a scanning electron microscope includes a detector objective essentially composed of an immersion lens and an annular detector which is arranged between a source side electrode lying at a positive potential and a middle electrode of the immersion lens which likewise lies at a variable positive potential and is arranged concentrically relative to a beam axis of a scanning microscope. The middle electrode and the source side electrode are preferrably formed as truncated cones. The two-stage deflection element for positioning the primary electron beam on the specimen is preferrably integrated into the source side electrode of the immersion lens, the source side electrode being composed of an annular diaphragm and a hollow cylinder.
    Type: Grant
    Filed: January 29, 1988
    Date of Patent: January 23, 1990
    Assignee: Siemens Aktiengesellschaft
    Inventors: Harald Rose, Joachim Zach
  • Patent number: 4714833
    Abstract: An electron beam apparatus has a primary beam directed onto a point of a specimen to generate emerging secondary electrons that proceed to a detector after traversing an electrical extraction field. The extraction field is provided between electrodes arranged in a plane perpendicular to the optical axis of the electron beam device and a magnetic field is provided perpendicular to the electrical extraction field to compensate for the forces of the extraction field exerted on the primary beam yet to promote extraction of the secondary electrons.
    Type: Grant
    Filed: August 11, 1986
    Date of Patent: December 22, 1987
    Assignee: Siemens Aktiengesellschaft
    Inventors: Harald Rose, Joachim Zach, Burkhard Lischke
  • Patent number: 4623794
    Abstract: In a corpuscular-optical beam path, the generation of short electron pulses with steep leading edges is to be effected without a probe movement in the probe plane taking place. For this purpose, the particle beam blanking system comprises at least two deflection systems and a knife edge arranged between two deflection systems in an intermediate image plane, the operating parameters of the deflection systems and the knife edge being matched to the energy distribution of the particles in such a fashion that shifting of the particle beam in the probe plane disappears.
    Type: Grant
    Filed: May 22, 1984
    Date of Patent: November 18, 1986
    Assignee: Harald Rose
    Inventors: Harald Rose, Joachim Zach