Patents by Inventor Joanne Deval

Joanne Deval has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090136667
    Abstract: Method of forming a low dielectric k porous film on a substrate, comprising reacting at least a film matrix precursor compound having silicon, carbon, oxygen and hydrogen atoms, and either at least a pore-forming compound, of the formula (I) wherein R represents: either a linear or branched, saturated or non saturated hydrocarbon radical, or a cyclic saturated or unsaturated hydrocarbon radical, or at least one of the following pore-forming compounds: 1-methyl-4-(1-methyl ethyl)-7-oxabicyclo[2.2.1.]heptane, 1,3,3-trimethyl-2-oxabicyclo[2.2.1.]octane or 1,8-cineole, or 1-methyl-4-(1-methyl ethenyl)-7-oxabicyclo[4.1.0.]heptane; New precursor precursor mixture, and the use of a compound of formula (I), as a pore-forming compound in a chemical vapor deposition of a low dielectric k film on a substrate.
    Type: Application
    Filed: March 20, 2007
    Publication date: May 28, 2009
    Inventors: Joanne Deval, Manon Vautier