Abstract: The present invention describes a method for manufacturing a low dielectric constant coating, which coating comprises an inorganic and an organic component, wherein precursors for these components are activated in at least two plasma sources for plasma activated deposition of a chemical vapor phase and wherein said activated precursors are combined before they are deposited from the chemical vapor phase on the substrate to form the coating, characterized in that said inorganic component comprises porous nanoparticles. The invention also describes a device for the manufacture of a low dielectric constant coating.

Abstract: The invention provides a method for preparing a flexible organic electronic device comprising at least a first electrode comprising a transparent conductive oxide layer, an organic active layer, a second electrode and a polymeric substrate layer, whereby the transparent conductive layer is applied on a removable substrate layer or one or more transparent layers previously applied onto the removable substrate layer at a temperature of at least 250 C, and the removal carrier is removed when the polymeric substrate layer has been applied. The invention further provides a flexible organic electronic device obtainable by said method.

Abstract: The present invention describes a method for applying a hybrid coating to a substrate. A coating according to the invention is formed by aan inorganic component and an organic component. As a result, this coating has the hybrid character whereby the advantages of inter alia hardness are combined with the flexibility. The invention also describes a device for the manufacture of a hybrid coating.