Patents by Inventor Joannes Theodoor De Smit
Joannes Theodoor De Smit has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8472002Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.Type: GrantFiled: February 2, 2010Date of Patent: June 25, 2013Assignee: ASML Netherlands B.V.Inventors: Joeri Lof, Erik Theodorus Maria Bijlaart, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
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Publication number: 20130128256Abstract: A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.Type: ApplicationFiled: December 3, 2012Publication date: May 23, 2013Applicant: ASML NETHERLANDS B.V.Inventors: Joeri LOF, Joannes Theodoor De Smit, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Hendricus Johannes Maria Meijer, Erik Roelof Loopstra
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Patent number: 8363208Abstract: A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.Type: GrantFiled: February 4, 2010Date of Patent: January 29, 2013Assignee: ASML Netherlands B.V.Inventors: Joannes Theodoor De Smit, Vadim Yevgenyevich Banine, Theodorus Hubertus Josephus Bisschops, Theodorus Marinus Modderman, Marcel Mathijs Theodore Marie Dierichs
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Patent number: 8344341Abstract: A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.Type: GrantFiled: August 9, 2010Date of Patent: January 1, 2013Assignee: ASML Netherlands B.V.Inventors: Joeri Lof, Joannes Theodoor De Smit, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Hendricus Johannes Maria Meijer, Erik Roelof Loopstra
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Publication number: 20120274911Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.Type: ApplicationFiled: November 29, 2011Publication date: November 1, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Joeri LOF, Erik Theodorus Maria Bijlaart, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Arie Jeffrey Maria Den Boef, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Marcus Adrianus Van De Kerkhof, Aleksey Yurievich Kolesnychenko, Mark Kroon, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Joannes Theodoor De Smit, Johannes Catherinus Hubertus Mulkens, Joost Jeroen Ottens, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
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Patent number: 8208120Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.Type: GrantFiled: April 9, 2008Date of Patent: June 26, 2012Assignee: ASML Netherlands B.V.Inventors: Joeri Lof, Antonius Theodorus Anna Maria Derksen, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen, Sjoerd Nicolaas Lambertus Donders
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Patent number: 8169593Abstract: A system and method use a substrate with a pattern of individual, indiscrete alignment marks, i.e., the marks are separate and distinct from each other, and each mark is not divided into component parts. The pattern of marks is distributed over an area of the substrate, and the method also comprises the steps of providing a beam of radiation using an illumination system and an array of individually controllable elements to impart the beam with a pattern in its cross-section, providing a projection system to project the patterned beam onto the substrate, and providing a movement system to effect relative movement between the substrate and the projection system.Type: GrantFiled: October 30, 2008Date of Patent: May 1, 2012Assignee: ASML Netherlands B.V.Inventors: Franciscus Godefridus Casper Bijnen, Joannes Theodoor De Smit
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Patent number: 8154708Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.Type: GrantFiled: July 7, 2006Date of Patent: April 10, 2012Assignee: ASML Netherlands B.V.Inventors: Joeri Lof, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Erik Theodorus Maria Bijlaart, Christiaan Alexander Hoogendam, Helmar Van Santen, Marcus Adrianus Van De Kerhof, Mark Kroon, Arie Jeffrey Den Boef, Joost Jeroen Ottens, Jeroen Johannes Sophia Maria Mertens
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Publication number: 20120013872Abstract: A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.Type: ApplicationFiled: September 23, 2011Publication date: January 19, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Joannes Theodoor DE SMIT, Vadim Yevgenyevich BANINE, Theodorus Hubertus Josephus BISSCHOPS, Marcel Mathijs Theodore Marie DIERICHS, Theodorus Marinus MODDERMAN
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Publication number: 20120008117Abstract: A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.Type: ApplicationFiled: September 22, 2011Publication date: January 12, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Joannes Theodoor DE SMIT, Vadim Yevgenyevich Banine, Theodorus Hubertus Josephus Bisschops, Marcel Mathijs Theodore Marie Dierichs, Theodorus Marinus Modderman
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Publication number: 20110285977Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.Type: ApplicationFiled: August 1, 2011Publication date: November 24, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Joeri LOF, Erik Theodorus Maria Bijlaart, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Arie Jeffrey Maria Den Boef, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Marcus Adrianus Van De Kerkhof, Aleksey Yurievich Kolesnychenko, Mark Kroon, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Joost Jeroen Ottens, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
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Publication number: 20110279800Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.Type: ApplicationFiled: July 29, 2011Publication date: November 17, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Joeri Lof, Erik Theodorus Maria Bijlaart, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Arie Jeffrey Maria Den Boef, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Marcus Adrianus Van De Kerkhof, Aleksey Yurievich Kolesnychenko, Mark Kroon, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Joost Jeroen Ottens, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
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Publication number: 20110228241Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.Type: ApplicationFiled: May 31, 2011Publication date: September 22, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Joeri LOF, Antonius Theodorus Anna Maria Derksen, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
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Patent number: 7982850Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.Type: GrantFiled: May 15, 2008Date of Patent: July 19, 2011Assignee: ASML Netherlands B.V.Inventors: Joeri Lof, Antonius Theodorus Anna Maria Derksen, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
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Publication number: 20110170077Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.Type: ApplicationFiled: August 4, 2010Publication date: July 14, 2011Applicant: ASML Netherlands B.V.Inventors: Joeri LOF, Erik Theodorus Maria Bijlaart, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
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Publication number: 20110027721Abstract: A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.Type: ApplicationFiled: August 9, 2010Publication date: February 3, 2011Inventors: JOERI LOF, JOANNES THEODOOR DE SMIT, ROELOF AEILKO SIEBRAND RITSEMA, KLAUS SIMON, THEODORUS MARINUS MODDERMAN, JOHANNES CATHARINUS HUBERTUS MULKENS, HENDRICUS JOHANNES MARIA MEIJER, ERIK ROELOF LOOPSTRA
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Publication number: 20110007285Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.Type: ApplicationFiled: February 2, 2010Publication date: January 13, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Joeri Lof, Erik Theodorus Maria Bijlaart, Roelof Aeiko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Arie Jeffrey Maria Den Boef, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Marcus Adrianus Van De Kerkhof, Aleksey Yurievich Kolesnychenko, Mark Kroon, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Joost Jeroen Ottens, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
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Publication number: 20110001942Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.Type: ApplicationFiled: February 2, 2010Publication date: January 6, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Joeri Lof, Erik Theodorus Maria Butler, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Staaijer, Bob Streefkerk, Helmar Van Santen
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Patent number: 7795603Abstract: A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.Type: GrantFiled: December 19, 2008Date of Patent: September 14, 2010Assignee: ASML Netherlands B.V.Inventors: Joeri Lof, Joannes Theodoor De Smit, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Hendricus Johannes Maria Meijer, Erik Roelof Loopstra
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Publication number: 20100128235Abstract: A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.Type: ApplicationFiled: February 4, 2010Publication date: May 27, 2010Applicant: ASML NETHERLANDS B.V.Inventors: Joannes Theodoor De Smit, Vadim Yevgenyevich Banine, Theodorus Hubertus Josephus Bisschops, Marcel Mathijs Theodore Marie Dierichs, Theodorus Marinus Modderman