Patents by Inventor Jochem Sebastiaan Wildenberg
Jochem Sebastiaan Wildenberg has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240118629Abstract: A method of processing measurement data relating to a substrate processed by a manufacturing process. The method includes obtaining measurement data relating to a performance parameter for at least a portion of the substrate; and fitting the measurement data to a model by minimizing a complexity metric applied to fitting parameters of the model while not allowing the deviation between the measurement data and the fitted model to exceed a threshold value.Type: ApplicationFiled: October 5, 2020Publication date: April 11, 2024Applicant: ASML NETHERLANDS B.V.Inventors: Aliasghar KEYVANI JANBAHAN, Frans Reinier SPIERING, Jochem Sebastiaan WILDENBERG, Everhardus Cornelis MOS
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Patent number: 11940740Abstract: In a lithographic process, product units such as semiconductor wafers are subjected to lithographic patterning operations and chemical and physical processing operations. Alignment data or other measurements are made at stages during the performance of the process to obtain object data representing positional deviation or other parameters measured at points spatially distributed across each unit. This object data is used to obtain diagnostic information by performing a multivariate analysis to decompose a set of vectors representing the units in the multidimensional space into one or more component vectors. Diagnostic information about the industrial process is extracted using the component vectors. The performance of the industrial process for subsequent product units can be controlled based on the extracted diagnostic information.Type: GrantFiled: June 9, 2022Date of Patent: March 26, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Alexander Ypma, Jasper Menger, David Deckers, David Han, Adrianus Cornelis Matheus Koopman, Irina Lyulina, Scott Anderson Middlebrooks, Richard Johannes Franciscus Van Haren, Jochem Sebastiaan Wildenberg
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Publication number: 20240061346Abstract: Disclosed is a method of determining a performance parameter or a parameter derived therefrom, the performance parameter being associated with a performance of a lithographic process for forming one or more structures on a substrate subject to the lithographic process. The method comprises obtaining a probability description distribution comprising a plurality of probability descriptions of the performance parameter, each probability description corresponding to a different position on the substrate and decomposing each probability description into a plurality of component probability descriptions to obtain a plurality of component probability description distributions.Type: ApplicationFiled: December 23, 2021Publication date: February 22, 2024Inventors: Thomas THEEUWES, Jochem Sebastiaan WILDENBERG, Lei ZHANG, Ronald VAN ITHERSUM
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Publication number: 20240036479Abstract: A method of optimizing a target layout for a patterning device and a sampling scheme for measuring the targets of the target layout exposed on a substrate, the method including co-optimizing the target layout and the sampling scheme to obtain an optimized target layout for the patterning device and an optimized sampling scheme for measuring the targets of the optimized target layout exposed on a substrate.Type: ApplicationFiled: March 8, 2022Publication date: February 1, 2024Applicant: ASML NETHERLANDS B.V.Inventors: Roy WERKMAN, Jochem Sebastiaan WILDENBERG, Manouk RIJPSTRA
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Publication number: 20240019788Abstract: In a lithographic process, product units such as semiconductor wafers are subjected to lithographic patterning operations and chemical and physical processing operations. Alignment data or other measurements are made at stages during the performance of the process to obtain object data representing positional deviation or other parameters measured at points spatially distributed across each unit. This object data is used to obtain diagnostic information by performing a multivariate analysis to decompose a set of vectors representing the units in the multidimensional space into one or more component vectors. Diagnostic information about the industrial process is extracted using the component vectors. The performance of the industrial process for subsequent product units can be controlled based on the extracted diagnostic information.Type: ApplicationFiled: August 10, 2023Publication date: January 18, 2024Applicant: ASML Netherlands B.V.Inventors: Alexander Ypma, Jasper Menger, David Deckers, David Han, Adrianus Cornelis Matheus Koopman, Irina Lyulina, Scott Anderson Middlebrooks, Richard Johannes Franciscus Van Haren, Jochem Sebastiaan Wildenberg
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Publication number: 20230400778Abstract: A method to infer a current sampling scheme for one or more current substrates is provided, the method including: obtaining a first model trained to infer an optimal sampling scheme based on inputting context and/or pre-exposure data associated with one or more previous substrates, wherein the first model is trained in dependency of an outcome of a second model configured to discriminate between the inferred optimal sampling scheme and a pre-determined optimal sampling scheme; and using the obtained first model to infer the current sampling scheme based on inputting context and/or pre-exposure data associated with the one or more current substrate.Type: ApplicationFiled: October 26, 2021Publication date: December 14, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Roy WERKMAN, Jochem Sebastiaan WILDENBERG, Reza SAHRAEIAN
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Patent number: 11796920Abstract: A method and associated apparatuses for controlling a process of manufacturing semiconductor devices on a substrate. The method includes obtaining process data relating to the process and determining a correction for the process based on the process data and a first control objective associated with the devices on the substrate. A first probability of the first control objective being achievable is determined and the correction adjusted based on the probability and at least a second control objective having a second probability of being achievable compared to the first control objective.Type: GrantFiled: January 14, 2021Date of Patent: October 24, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Jochem Sebastiaan Wildenberg, Hermanus Adrianus Dillen, Fan Feng, Ronald Van Ittersum, Willem Louis Van Mierlo, Koen Thuijs
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Patent number: 11681231Abstract: A method for selecting an optimal set of locations for a measurement or feature on a substrate, the method includes: defining a first candidate solution of locations, defining a second candidate solution with locations based on modification of a coordinate in a solution domain of the first candidate solution, and selecting the first and/or second candidate solution as the optimal solution according to a constraint associated with the substrate.Type: GrantFiled: March 4, 2022Date of Patent: June 20, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Pierluigi Frisco, Svetla Petrova Matova, Jochem Sebastiaan Wildenberg
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Patent number: 11669017Abstract: A method for determining a plurality of corrections for control of at least one manufacturing apparatus used in a manufacturing process for providing product structures to a substrate in a plurality of layers, the method including: determining the plurality of corrections including a correction for each layer, based on an actuation potential of the applicable manufacturing apparatus used in the formation of each layer, wherein the determining includes determining corrections for each layer simultaneously in terms of a matching parameter.Type: GrantFiled: November 9, 2018Date of Patent: June 6, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Roy Werkman, Bijoy Rajasekharan, Lydia Marianna Vergaij-Huizer, Jochem Sebastiaan Wildenberg, Ronald Van Ittersum, Pieter Gerardus Jacobus Smorenberg, Robertus Wilhelmus Van Der Heijden, Xiuhong Wei, Hadi Yagubizade
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Publication number: 20230141495Abstract: Disclosed is a method of determining a sampling scheme. The method comprises obtaining a parallel sensor description and identifying a plurality of candidate acquisition configurations based on said parallel sensor description and potential metrology locations. Each of said candidate acquisition configurations is evaluated in terms of an evaluation metric and a candidate acquisition configuration is selected based on said evaluation. The corresponding metrology locations for the selected acquisition configuration is added to the sampling scheme.Type: ApplicationFiled: March 10, 2021Publication date: May 11, 2023Applicant: ASML Netherlands B.V.Inventors: Hugo Augustinus Joseph CRAMER, Patricius Aloysius Jacobus TINNEMANS, Jeroen Arnoldus Leonardus Johannes RAAYMAKERS, Jochem Sebastiaan WILDENBERG
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Publication number: 20230082858Abstract: A method and associated apparatuses for controlling a process of manufacturing semiconductor devices on a substrate. The method includes obtaining process data relating to the process and determining a correction for the process based on the process data and a first control objective associated with the devices on the substrate. A first probability of the first control objective being achievable is determined and the correction adjusted based on the probability and at least a second control objective having a second probability of being achievable compared to the first control objective.Type: ApplicationFiled: January 14, 2021Publication date: March 16, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Jochem Sebastiaan WILDENBERG, Hermanus Adrianus DILLEN, Fan FENG, Ronald VAN ITTERSUM, Willem Louis VAN MIERLO, Koen THUIJS
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Publication number: 20220413391Abstract: A method for determining an input to a lens model to determine a setpoint for manipulation of a lens of a lithographic apparatus when addressing at least one of a plurality of fields of a substrate, the method including: receiving parameter data for the at least one field, the parameter data relating to one or more parameters of the substrate within the at least one field, the one or more parameters being at least partially sensitive to manipulation of the lens as part of an exposure performed by the lithographic apparatus; receiving lens model data relating to the lens; and determining the input based on the parameter data and on the lens model data.Type: ApplicationFiled: October 15, 2020Publication date: December 29, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Michel Alphons Theodorus VAN HINSBERG, James Robert DOWNES, Erwin Josef Maria VERDURMEN, Jacob Fredrik Friso KLINKHAMER, Roy WERKMAN, Jochem Sebastiaan WILDENBERG, Adam Jan URBANCZYK, Lucas Jan Joppe VISSER
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Patent number: 11480884Abstract: A method for improving the yield of a lithographic process, the method including: determining a parameter fingerprint of a performance parameter across a substrate, the parameter fingerprint including information relating to uncertainty in the performance parameter; determining a process window fingerprint of the performance parameter across the substrate, the process window being associated with an allowable range of the performance parameter; and determining a probability metric associated with the probability of the performance parameter being outside an allowable range. Optionally a correction to the lithographic process is determined based on the probability metric.Type: GrantFiled: July 23, 2020Date of Patent: October 25, 2022Assignee: ASML Netherlands B.V.Inventors: Everhardus Cornelis Mos, Jochem Sebastiaan Wildenberg, Erik Johannes Maria Wallerbos, Maurits Van Der Schaar, Frank Staals, Franciscus Hendricus Arnoldus Elich
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Publication number: 20220326623Abstract: In a lithographic process, product units such as semiconductor wafers are subjected to lithographic patterning operations and chemical and physical processing operations. Alignment data or other measurements are made at stages during the performance of the process to obtain object data representing positional deviation or other parameters measured at points spatially distributed across each unit. This object data is used to obtain diagnostic information by performing a multivariate analysis to decompose a set of vectors representing the units in the multidimensional space into one or more component vectors. Diagnostic information about the industrial process is extracted using the component vectors. The performance of the industrial process for subsequent product units can be controlled based on the extracted diagnostic information.Type: ApplicationFiled: June 9, 2022Publication date: October 13, 2022Applicant: ASML Netherlands B.V.Inventors: Alexander YPMA, Jasper MENGER, David DECKERS, David HAN, Adrianus Cornelis Matheus KOOPMAN, Irina LYULINA, Scott Anderson MIDDLEBROOKS, Richard Johannes Franciscus VAN HAREN, Jochem Sebastiaan WILDENBERG
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Patent number: 11442367Abstract: A method for optimizing a sequence of processes for manufacturing of product units, includes: associating measurement results of performance parameters (e.g., fingerprints) with the recorded process characteristics (e.g., context); obtaining a characteristic (e.g., context) of a previous process (e.g. deposition) in the sequence already performed on a product unit; obtaining a characteristic (e.g., context) of a subsequent process (e.g., exposure) in the sequence to be performed on the product unit; determining a predicted performance parameter (e.g., fingerprint) of the product unit associated with the sequence of previous and subsequent processes by using the obtained characteristics to retrieve measurement results of the performance parameters (e.g., fingerprints) corresponding to the recorded characteristics; and determining corrections to be applied to future processes (e.g. exposure, etch) in the sequence to be performed on the product unit, based on the determined predicted performance parameter.Type: GrantFiled: August 25, 2021Date of Patent: September 13, 2022Assignee: ASML Netherlands B.V.Inventors: Jochem Sebastiaan Wildenberg, Marinus Jochemsen, Erik Jensen, Erik Johannes Maria Wallerbos, Cornelis Johannes Rijnierse, Bijoy Rajasekharan, Roy Werkman, Jurgen Johannes Henderikus Maria Schoonus
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Patent number: 11435673Abstract: A method of determining a set of metrology point locations, the set including a subset of potential metrology point locations on a substrate, the method including: determining a relation between noise distributions associated with a plurality of the potential metrology point locations using existing knowledge; and using the determined relation and a model associated with the substrate to determine the set.Type: GrantFiled: March 19, 2020Date of Patent: September 6, 2022Assignee: ASML Netherlands B.V.Inventors: Kevin Van De Ruit, Roy Werkman, Jochem Sebastiaan Wildenberg
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Patent number: 11385550Abstract: In a lithographic process, product units such as semiconductor wafers are subjected to lithographic patterning operations and chemical and physical processing operations. Alignment data or other measurements are made at stages during the performance of the process to obtain object data representing positional deviation or other parameters measured at points spatially distributed across each unit. This object data is used to obtain diagnostic information by performing a multivariate analysis to decompose a set of vectors representing the units in the multidimensional space into one or more component vectors. Diagnostic information about the industrial process is extracted using the component vectors. The performance of the industrial process for subsequent product units can be controlled based on the extracted diagnostic information.Type: GrantFiled: May 1, 2020Date of Patent: July 12, 2022Assignee: ASML Netherlands B.V.Inventors: Alexander Ypma, Jasper Menger, David Deckers, David Han, Adrianus Cornelis Matheus Koopman, Irina Lyulina, Scott Anderson Middlebrooks, Richard Johannes Franciscus Van Haren, Jochem Sebastiaan Wildenberg
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Patent number: 11378891Abstract: A method, system and program for determining a fingerprint of a parameter. The method includes determining a contribution from a device out of a plurality of devices to a fingerprint of a parameter. The method includes obtaining parameter data and usage data, wherein the parameter data is based on measurements for multiple substrates having been processed by the plurality of devices, and the usage data indicates which of the devices out of the plurality of the devices were used in the processing of each substrate; and determining the contribution using the usage data and parameter data.Type: GrantFiled: September 17, 2020Date of Patent: July 5, 2022Assignee: ASML Netherlands B.V.Inventors: Davit Harutyunyan, Fei Jia, Frank Staals, Fuming Wang, Hugo Thomas Looijestijn, Cornelis Johannes Rijnierse, Maxim Pisarenco, Roy Werkman, Thomas Theeuwes, Tom Van Hemert, Vahid Bastani, Jochem Sebastiaan Wildenberg, Everhardus Cornelis Mos, Erik Johannes Maria Wallerbos
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Publication number: 20220187714Abstract: A method for selecting an optimal set of locations for a measurement or feature on a substrate, the method includes: defining a first candidate solution of locations, defining a second candidate solution with locations based on modification of a coordinate in a solution domain of the first candidate solution, and selecting the first and/or second candidate solution as the optimal solution according to a constraint associated with the substrate.Type: ApplicationFiled: March 4, 2022Publication date: June 16, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Pierluigi FRISCO, Svetla Petrova MATOVA, Jochem Sebastiaan WILDENBERG
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Publication number: 20220155698Abstract: A method of determining a set of metrology point locations, the set including a subset of potential metrology point locations on a substrate, the method including: determining a relation between noise distributions associated with a plurality of the potential metrology point locations using existing knowledge; and using the determined relation and a model associated with the substrate to determine the set.Type: ApplicationFiled: March 19, 2020Publication date: May 19, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Kevin VAN DE RUIT, Roy WERKMAN, Jochem Sebastiaan WILDENBERG