Abstract: The optical elements for ultraviolet radiation, especially for microlithography, are made from cubic granatite, cubic spinel, cubic perovskite and/or cubic M(II)- as well as M(IV)-oxides. The optical elements are made from suitable crystals of Y3Al5O12, Lu3Al5O12, Ca3Al2Si3O12, K2NaAlF6, K2NaScF6, K2LiAlF6 and/or Na3Al2Li3F12, (Mg, Zn)Al2O4, CaAl2O4, CaB2O4 and/or LiAl5O8, BaZrO3 and/or CaCeO3. A front lens used in immersion optics for microlithography at wavelengths under 200 nm is an example of a preferred optical element of the present invention.

Abstract: The present invention relates to a substrate in particular of EUV microlithography, to the production of a substrate of this type and to the use of this substrate as a substrate for mirrors and/or masks or mask blanks in particular in EUV microlithography.

Abstract: The method tests the suitability of an optical material having a radiation-induced absorption, especially of an alkali or alkaline earth halide, for production of an optical element exposed to high-energy irradiation. The method includes pre-irradiating the optical material with laser radiation until rapid damage induced in the optical material with the laser radiation is saturated; subsequently measuring fluorescence of the optical material during and/or immediately after irradiating the optical material with excitation radiation and determining the non-intrinsic fluorescence and intrinsic fluorescence present in the measured fluorescence. Suitability may be preferably determined according to a ratio of the amount of non-intrinsic fluorescence to intrinsic fluorescence. A device for performing the method including a barrier device for blocking scattered excitation radiation is also provided.

Abstract: The invention discloses an SiO2—TiO2 glass, which is preferably made by flame-hydrolysis and which distinguishes itself by increased resistance to radiation, especially in connection with EUV lithography. By purposefully reducing the hydrogen content, clearly improved resistance to radiation and reduced shrinking is achieved.

Abstract: The present invention relates to a novel glass ceramic having a low or small average thermal expansion together with good polishability and processability, to the use of the glass ceramic according to the invention, and to optical components made of the glass ceramic. In particular, a glass ceramic is provided which comprises the following composition (in % by weight based on oxide): SiO2 50-70 Al2O3 17-32 P2O5 ?3-12 Li2O 2.5-5?? Na2O 0-2 K2O 0-2 MgO 0-2 CaO 0.1-4?? BaO ??0-<1 SrO 0-2 ZnO 0-4 TiO2 1.5-5?? ZrO2 ??0-2.

Abstract: A fluorine-doped at least ternary silicate glass is disclosed which contains in particular TiO2. It can advantageously be used as a material having a low thermal expansion, wherein the slope of the coefficient of thermal expansion dCTE/T is ±2·109/K2 in the temperature range from ?50° C. to 100° C. This material is particularly suited for micro-lithography, in particular for EUV-lithography.

Abstract: The invention relates to the manufacture of a substrate which is particularly suitable for EUV micro-lithography and comprises a base layer of low coefficient of thermal expansion (CTE) onto which at least one cover layer made of a semiconductor material is applied. Preferably, the cover layer is a silicon layer, preferably applied by ion beam sputtering. By an additional ion beam figuring treatment substrates of extremely accurate shape and extremely low roughness can be prepared.

Abstract: The present invention relates to a substrate in particular of EUV microlithography, to the production of a substrate of this type and to the use of this substrate as a substrate for mirrors and/or masks or mask blanks in particular in EUV microlithography.

Abstract: Dental composites containing hybrid fillers and process for their production. Dental compounds are disclosed which contain two- or multi-phase inorganic fillers in an organic polymer matrix. These are characterized by improved abrasion resistance.

Abstract: Dental composites containing hybrid fillers and process for their production. Dental compounds are disclosed which contain two- or multi-phase inorganic fillers in an organic polymer matrix. These are characterized by improved abrasion resistance.

Abstract: Dental material based on polymerizable (for example ethylenically unsaturated) monomers, epoxides, ormocers, liquid crystal monomers, oxethanes, spiro-orthoesters or spiro-carbonates as binders, a catalyst for cold, hot and/or photo-polymerization, and fillers, and a process for its preparation. Porous glass ceramics, a process for their preparation and uses thereof are also described. Dental materials according to the invention are suitable as alternative materials to the use of amalgam fillings.